Mask assembly, deposition apparatus including the same, and fabricating method of the mask assembly

US11624108B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11624108-B2
Application numberUS-201715663318-A
CountryUS
Kind codeB2
Filing dateJul 28, 2017
Priority dateSep 27, 2016
Publication dateApr 11, 2023
Grant dateApr 11, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A mask assembly includes: a mask frame; a mask supported by the mask frame, the mask including a plurality of pattern holes; and a magnetic part disposed on one surface of the mask. The magnetic part provides a magnetic force between the mask and a target substrate and improves an adhesion between the mask and the target substrate to prevent deposition defects.

First claim

Opening claim text (preview).

What is claimed is: 1. A mask assembly, comprising: a mask frame; a mask having a first surface facing the mask frame and a second surface opposite the first surface, the mask supported by the mask frame; a plurality of pattern holes disposed in the mask; and a magnetic part disposed on the first surface of the mask between the plurality of pattern holes, wherein the pattern holes are arranged in a matrix form, wherein the mask comprises a rib located between the pattern holes, and the rib comprises a first rib extending in a first direction, and a second rib extending in a second direction intersecting the first direction to form a plurality of intersection portions with the first rib, wherein the magnetic part is located at each of the plurality of intersection portions of the first rib and the second rib, and an outline of the magnetic part does not contact the pattern holes on a plane, wherein the magnetic part has a first pitch along the first direction and a second pitch along the second direction with reference to the pattern holes, wherein the magnetic part comprises a magnetic particle and a resin. 2. The mask assembly of claim 1 , wherein the magnetic particle comprises a ferromagnetic material. 3. The mask assembly of claim 1 , wherein the magnetic particle comprises a plastic particle and a ferromagnetic material coated on the plastic particle. 4. The mask assembly of claim 1 , wherein a size of the magnetic particle is 0.1 μm to 5 μm. 5. The mask assembly of claim 1 , wherein the resin comprises a thermosetting resin. 6. The mask assembly of claim 1 , wherein the mask frame and the mask are made of a material comprising a nickel-iron alloy having 36% nickel. 7. The mask assembly of claim 1 , wherein the mask is a fine metal mask (FMM). 8. The mask assembly of claim 1 , wherein the mask comprises a plurality of mask strips. 9. A deposition apparatus comprising: a chamber; a deposition source configured to provide a deposition material in the chamber; a target substrate opposite the deposition source; a mask assembly disposed on one surface of the target substrate facing the deposition source; and a magnet plate disposed on another surface of the target substrate opposite to the one surface, the magnet plate configured to closely adhere the mask assembly onto the target substrate by a magnetic force, wherein the mask assembly comprises: a mask frame; a mask having a first surface facing the mask frame and a second surface opposite the one surface, the mask supported by the mask frame, the mask including a plurality of pattern holes; and a magnetic part disposed on the first surface of the mask between the plurality of pattern holes, wherein the pattern holes are arranged in a matrix form, wherein the mask comprises a rib located between the pattern holes, and the rib comprises a first rib extending in a first direction, and a second rib extending in a second direction intersecting the first direction to form a plurality of intersection portions with the first rib, wherein the magnetic part is located at each of the plurality of intersection portions of the first rib and the second rib, and an outline of the magnetic part does not contact the pattern holes on a plane, wherein the magnetic part has a first pitch along the first direction and a second pitch along the second direction with reference to the pattern holes, wherein the magnetic part comprises a magnetic particle and a resin, wherein the resin has solventless ultraviolet curable properties. 10. The deposition apparatus of claim 9 , wherein the magnet plate comprises a plurality of magnets.

Assignees

Inventors

Classifications

  • Vacuum evaporation · CPC title

  • Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title

  • Coating on selected surface areas, e.g. using masks · CPC title

  • C23C14/042Primary

    using masks · CPC title

  • using selective deposition, e.g. using a mask · CPC title

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Frequently asked questions

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What does patent US11624108B2 cover?
A mask assembly includes: a mask frame; a mask supported by the mask frame, the mask including a plurality of pattern holes; and a magnetic part disposed on one surface of the mask. The magnetic part provides a magnetic force between the mask and a target substrate and improves an adhesion between the mask and the target substrate to prevent deposition defects.
Who is the assignee on this patent?
Samsung Display Co Ltd
What technology area does this patent fall under?
Primary CPC classification C23C14/042. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 11 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).