Plasma-resistant member

Patent metadata

Field	Value
Publication number	US-11623898-B2
Application number	US-201916246852-A
Country	US
Kind code	B2
Filing date	Jan 14, 2019
Priority date	Dec 28, 2012
Publication date	Apr 11, 2023
Grant date	Apr 11, 2023

Abstract

According to an aspect of the invention, there is provided a plasma-resistant member including: a base member; and a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant, the layer structural component including a first uneven structure, and a second uneven structure formed to be superimposed onto the first uneven structure, the second uneven structure having an unevenness finer than an unevenness of the first uneven structure.

First claim

The invention claimed is:

1. A plasma-resistant member, comprising:
a base member; and
a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant,
in the case where a cut-off of surface analysis is 0.8 μm:
the arithmetic average Sa of a surface of the layer structural component being not less than 0.010 μm and not more than 0.035 μm;
the core material volume Vmc determined from a load curve of the surface of the layer structural component being not less than 0.01 μm 3 /μm 2 and not more than 0.035 μm 3 /μm 2 ;
the core void volume Vvc determined from the load curve of the surface of the layer structural component is not less than 0.012 μm 3 /μm 2 and not more than 0.05 μm 3 /μm 2 ;
the developed interfacial area ratio Sdr of the surface of the layer structural component is not less than 1 and not more than 17; and
the root mean square slope SΔq of the surface of the layer structural component is not less than 0.15 and not more than 0.6.

2. The plasma-resistant member according to claim 1 , wherein the layer structural component has a sparse and dense structure of the yttria polycrystalline body, wherein the sparse and dense structure includes sparse portions and a dense portion, and a density of the sparse portions is less than a density of the dense portion.

3. The plasma-resistant member according to claim 2 , wherein the sparse portions and the dense portion are distributed along a first direction, the first direction being a direction from the layer structural component to the base member, the sparse portions become smaller along the first direction.

4. The plasma-resistant member according to claim 2 , wherein the sparse and dense structure includes the sparse portions distributed three-dimensionally inside the dense portion.

5. The plasma-resistant member according to claim 1 , wherein the layer structural component is formed by aerosol deposition.

Assignees

• Toto Ltd

Inventors

• Iwasawa Junichi
• Aoshima Toshihiro

Classifications

• H10P72/7616

  characterised by a coating, a hardness or a material · CPC title

• H10P72/722

  Details of electrostatic chucks · CPC title

• C04B2237/066

  based on rare earth oxides · CPC title

• C23C24/04

  Impact or kinetic deposition of particles · CPC title

• C04B41/009

  characterised by the material treated · CPC title