Magnetic recording medium and method for producing same
US-2017206919-A1 · Jul 20, 2017 · US
Sputtering target, magnetic film, and perpendicular magnetic recording medium
US11618944B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11618944-B2 |
| Application number | US-201917266896-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 23, 2019 |
| Priority date | Aug 9, 2018 |
| Publication date | Apr 4, 2023 |
| Grant date | Apr 4, 2023 |
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- Title
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Abstract
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Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.
First claim
Opening claim text (preview).
The invention claimed is: 1. A sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt, wherein the sputtering target does not contain Mn. 2. The sputtering target according to claim 1 , wherein the sputtering target contains a part or all of Bi as a metal oxide. 3. The sputtering target according to claim 1 , wherein the sputtering target contains 0.5 at % or more of Bi. 4. The sputtering target according to claim 1 , wherein the metal oxide comprises an oxide of at least one element selected from the group consisting of Co, Cr, Si, Ti, and B. 5. The sputtering target according to claim 1 , wherein the sputtering target further contains from 0.5 at % to 30 at % of at least one selected from the group consisting of Au, Ag, B, Cu, Cr, Ge, Ir, Mo, Nb, Ni, Pd, Re, Rh, Ru, Ta, W, and V. 6. The sputtering target according to claim 1 , wherein the sputtering target contains 0.05 at % to 10 at % of Bi.
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Classifications
non-metallic substances, e.g. ferrites {, e.g. [(Ba,Sr)O(Fe2O3)6] ferrites with hexagonal structure} · CPC title
Oxides (C23C14/10 takes precedence) · CPC title
- C22C19/07Primary
based on cobalt · CPC title
metals or alloys · CPC title
Metallic material, boron or silicon · CPC title
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- What does patent US11618944B2 cover?
- Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.
- Who is the assignee on this patent?
- Jx Nippon Mining & Metals Corp
- What technology area does this patent fall under?
- Primary CPC classification C22C19/07. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Apr 04 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).