Systems and methods for optimal source material deposition along hole edges

US11613805B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11613805-B2
Application numberUS-202016786228-A
CountryUS
Kind codeB2
Filing dateFeb 10, 2020
Priority dateFeb 26, 2015
Publication dateMar 28, 2023
Grant dateMar 28, 2023

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A method for depositing a coating of a source material onto a panel is disclosed. The method includes providing a cathodic arc, the cathodic arc including a target surface, the target surface disposed along a target deposition axis and able to emit the source material as a generally cloud of source material vapor and a generally conical stream of liquid particles of the source material. The method further includes positioning the panel relative to the target surface based on a deposition angle, the deposition angle being between the target surface and an outer limit of the generally conical stream of liquid particles o the source material. The method may further include emitting the source material from the target surface as the generally conical cloud of source material vapor and coating the edge with the cloud of source material vapor to provide an edge coating.

First claim

Opening claim text (preview).

What is claimed is: 1. A system for depositing a coating of a source material onto at least one panel, the at least one panel defining an edge and a front panel surface, the system comprising: a cathodic arc including a target surface, the target surface disposed along a target deposition axis, and able to emit the source material as both a cloud of source material vapor and a generally conical stream of liquid particles of the source material, the cloud of source material vapor used to coat the edge with the source material to provide an edge coating; and a coating deposition structure, the coating deposition structure configured and dimensioned to position one or both of the cathodic arc and the panel, such that the panel is positioned relative to the target surface based on a deposition plane, the deposition plane being defined by the target deposition axis, wherein the entire panel is positioned and maintained above or below the deposition plane and within the generally conical stream of liquid particles; and a cathodic arc positioning member, the cathodic arc positioning member configured and dimensioned to position the cathodic arc, such that the panel is positioned relative to the target surface based on the deposition plane and the entire panel is positioned and maintained above or below the deposition plane and within the generally conical stream of liquid particles. 2. The system of claim 1 , wherein the coating deposition structure is configured and dimensioned to position the panel substantially perpendicular to the target deposition axis. 3. The system of claim 1 , wherein the panel defines at least one hole, the edge is a hole edge of the at least one hole, and the edge coating is a hole edge coating. 4. The system of claim 1 , further comprising a controller, the controller configured to send signals to an actuator to align one or both of the cathodic arc and the panel. 5. The system of claim 1 , wherein the coating deposition structure further comprises a panel positioning member, the panel positioning member configured and dimensioned to position the panel, such that the panel is positioned relative to the target surface based on the deposition plane. 6. A system for depositing a coating of a source material onto at least one panel, the at least one panel defining an edge and a front panel surface, the system comprising: a cathodic arc including a target surface, the target surface disposed along a target deposition axis and the target deposition axis defines a deposition plane, and able to emit the source material as both a cloud of source material vapor and a generally conical stream of liquid particles of the source material, the cloud of source material vapor used to coat the edge with the source material to provide an edge coating; and a coating deposition structure, the coating deposition structure configured and dimensioned to position one or both of the cathodic arc and the panel, such that the panel is positioned relative to the target surface based on a deposition angle, the deposition angle being between the target surface and an outer limit of the generally conical stream of liquid particles of the source material; and a cathodic arc positioning member, the cathodic arc positioning member configured and dimensioned to position the cathodic arc, such that the panel is positioned relative to the target surface based on the deposition angle and the entire panel is positioned and maintained above or below the deposition plane and within the generally conical stream of liquid particles. 7. The system of claim 6 , wherein the coating deposition structure is configured and dimensioned to position the panel substantially perpendicular to the target deposition axis. 8. The system of claim 6 , wherein the panel defines at least one hole, the edge is a hole edge of the at least one hole, and the edge coating is a hole edge coating. 9. The system of claim 6 , further comprising a controller, the controller configured to send signals to an actuator to align one or both of the cathodic arc and the panel. 10. The system of claim 6 , wherein the coating deposition structure further comprises a panel positioning member, the panel positioning member configured and dimensioned to position the panel, such that the panel is positioned relative to the target surface based on the deposition angle. 11. A deposition system comprising: a cathodic arc including a target surface, the target surface disposed along a target deposition axis and the target deposition axis defines a deposition plane; a coating deposition structure; and a panel defining an edge and a front panel surface; wherein the cathodic arc is configured and dimensioned to emit a source material as both a cloud of source material vapor and a generally conical stream of liquid particles of the source material, the cloud of source material vapor used to coat the edge with the source material to provide an edge coating; wherein the coating deposition structure is configured and dimensioned to position one or both of the cathodic arc and the panel, such that the panel is positioned relative to the target surface based on a deposition angle, the deposition angle being between the target surface and an outer limit of the generally conical stream of liquid particles of the source material; and wherein the coating deposition structure further comprises a cathodic arc positioning member, the cathodic arc positioning member configured and dimensioned to position the cathodic arc, such that the panel is positioned relative to the target surface based on the deposition angle and the entire panel is positioned and maintained above or below the deposition plane and within the generally conical stream of liquid particles. 12. The system of claim 11 , wherein the coating deposition structure is configured and dimensioned to position the panel substantially perpendicular to the target deposition axis. 13. The system of claim 11 , wherein the panel defines at least one hole, the edge is a hole edge of the at least one hole, and the edge coating is a hole edge coating. 14. The system of claim 11 , further comprising a controller, the controller configured to send signals to an actuator to align one or both of the cathodic arc and the panel. 15. The system of claim 11 , wherein the coating deposition structure further comprises a panel positioning member, the panel positioning member configured and dimensioned to position the panel, such that the panel is positioned relative to the target surface based on the deposition angle.

Assignees

Inventors

Classifications

  • Wall structures (F23R3/02 and F23R3/007 take precedence) · CPC title

  • Arc discharge · CPC title

  • Special materials for walls or lining · CPC title

  • C23C14/325Primary

    Electric arc evaporation · CPC title

  • Consumable cathodes for arc discharge · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11613805B2 cover?
A method for depositing a coating of a source material onto a panel is disclosed. The method includes providing a cathodic arc, the cathodic arc including a target surface, the target surface disposed along a target deposition axis and able to emit the source material as a generally cloud of source material vapor and a generally conical stream of liquid particles of the source material. The met…
Who is the assignee on this patent?
United Technologies Corp, Raytheon Tech Corp
What technology area does this patent fall under?
Primary CPC classification C23C14/325. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 28 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).