Magnetic field application device and magnetic field application system including the same

US11610708B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11610708-B2
Application numberUS-202117244960-A
CountryUS
Kind codeB2
Filing dateApr 30, 2021
Priority dateMay 21, 2020
Publication dateMar 21, 2023
Grant dateMar 21, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A magnetic field application device according to an embodiment includes a first coil assembly and a second coil assembly spaced apart in parallel from each other, a power supply configured to apply respective currents to the first coil assembly and the second coil assembly, a controller, and a resonator accommodation unit disposed between the first coil assembly and the second coil assembly, wherein each of the first coil assembly and the second coil includes a coil configured to generate a magnetic field, a guide member connected to a terminal of the coil, a magnetic material mount connected to a terminal of the guide member, and a magnetic material fixed to the magnetic material mount, and wherein the controller is configured to control the currents applied from the power supply to the first coil assembly and the second coil assembly.

First claim

Opening claim text (preview).

What is claimed is: 1. A magnetic field application device comprising: a first coil assembly and a second coil assembly spaced apart in parallel from each other; a power supply configured to apply respective currents to the first coil assembly and the second coil assembly; a controller; and a resonator accommodation unit disposed between the first coil assembly and the second coil assembly, wherein the controller is configured to control the currents applied from the power supply to the first coil assembly and the second coil assembly, and wherein each of the first coil assembly and the second coil comprises: a coil configured to generate a magnetic field; a guide member connected to the coil; a magnetic material mount connected to the guide member; and a magnetic material fixed to the magnetic material mount. 2. The magnetic field application device according to claim 1 , further comprising: a base in which the resonator accommodation unit is formed; and a support unit disposed on a top portion of the base to support the first coil assembly and the second coil assembly, wherein respective coils of the first coil assembly and the second coil assembly are coaxial. 3. The magnetic field application device according to claim 1 , wherein the first coil assembly and the second coil assembly are symmetrically arranged with respect to resonator accommodation unit. 4. The magnetic field application device according to claim 1 , wherein the controller is configured to control the respective currents applied to the first coil assembly and the second coil assembly independently. 5. A magnetic field application system comprising: a magnetic field application device, wherein the magnetic field application device comprises a first coil assembly and a second coil assembly spaced apart in parallel from each other, a power supply configured to apply respective currents to the first coil assembly and the second coil assembly, a resonator accommodation unit disposed between the first coil assembly and the second coil assembly and a controller configured to control the currents applied from the power supply to the first coil assembly and the second coil assembly; and a resonator disposed in the resonator accommodation unit of the magnetic field application device, wherein the resonator comprises: a main body; a penetration opening formed in the main body; and an Yttrium Iron Garnet single crystal disposed in the penetration opening, wherein the penetration opening of the resonator is disposed between the first coil assembly and the second coil assembly of the magnetic field application device. 6. The magnetic field application system according to claim 5 , wherein the resonator receives inputs and outputs of a microwave and an optical wave, and causes frequency conversion between the microwave and the optical wave to occur by the magnetic field generated by the magnetic field application device. 7. The magnetic field application system according to claim 6 , wherein the resonator further comprises: a microwave input and output unit configured to receive the input and output of the microwave; an optical wave input unit configured to receive an input of the optical wave; and an optical wave output unit configured to output the frequency-converted optical wave. 8. The magnetic field application system according to claim 5 , wherein the resonator comprises a plurality of Yttrium Iron Garnet (YIG) single crystals, wherein the plurality of YIG single crystals are arranged in parallel in a direction from one between the first coil assembly and the second coil assembly toward another. 9. The magnetic field application system according to claim 5 , wherein, in the resonator, a frequency conversion band between a microwave and an optical wave is adjusted according to 3-D dimensions of the main body. 10. The magnetic field application system according to claim 5 , wherein the controller is configured to apply respective different currents to the first coil assembly and the second coil assembly to adjust a slope of the magnetic field applied to the resonator. 11. The magnetic field application system according to claim 5 , wherein the magnetic field application device further comprises: temperature sensors configured to sense temperatures of respective coils in the first coil assembly and the second coil assembly, wherein the controller is configured to adjust an amount of generation of the magnetic field on the basis of the temperatures sensed by the temperature sensors. 12. The magnetic field application system according to claim 11 , wherein the controller is configured to control the currents applied to the first coil assembly and the second coil assembly so that a resonant frequency of the resonator is constant.

Assignees

Inventors

Classifications

  • Hollow waveguides (H01P3/20 takes precedence) · CPC title

  • H01F7/20Primary

    without armatures (cores H01F3/00; coils H01F5/00 {; shaping metal by applying magnetic forces B21D26/14; electromagnets specially adapted for NMR applications G01R33/381}) · CPC title

  • wound on non-magnetic supports, e.g. formers · CPC title

  • the ferromagnetic material acting as a tuning element in resonators · CPC title

  • H01F13/00Primary

    Apparatus or processes for magnetising or demagnetising ({devices for holding workpieces using magnetic or electric force acting directly on the workpieces B23Q3/15} ; for degaussing ships B63G9/06; for clocks or watches G04D9/00; {recording or erasing of information on magnetic record carriers G11B5/00} ; demagnetising arrangements for colour television H04N9/29) · CPC title

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What does patent US11610708B2 cover?
A magnetic field application device according to an embodiment includes a first coil assembly and a second coil assembly spaced apart in parallel from each other, a power supply configured to apply respective currents to the first coil assembly and the second coil assembly, a controller, and a resonator accommodation unit disposed between the first coil assembly and the second coil assembly, wh…
Who is the assignee on this patent?
Agency Defense Dev
What technology area does this patent fall under?
Primary CPC classification H01F7/20. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 21 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).