Release layer-assisted selective embedding of magnetic material in cored and coreless organic substrates

US11610706B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11610706-B2
Application numberUS-201815870302-A
CountryUS
Kind codeB2
Filing dateJan 12, 2018
Priority dateJan 12, 2018
Publication dateMar 21, 2023
Grant dateMar 21, 2023

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A substrate for an integrated circuit package, the substrate comprising a dielectric, at least one conductor plane within the dielectric, and a planar magnetic structure comprising an organic magnetic laminate embedded within the dielectric, wherein the planar magnetic structure is integrated within the at least one conductor plane.

First claim

Opening claim text (preview).

What is claimed is: 1. A substrate for an integrated circuit package, the substrate comprising: a substrate core; a dielectric over a first side of the substrate core; at least one conductor plane within the dielectric; and a planar magnetic structure comprising a magnetic laminate embedded within the dielectric, wherein the magnetic laminate comprises an organic material, and wherein the planar magnetic structure overlaps one or more first metal features of the conductor plane and two opposing side edges of the magnetic laminate intersect the one or more first metal features, wherein the planar magnetic structure is a planar inductor core and wherein a second conductor plane comprises an inductor winding over the planar inductor core and on a second side of the substrate core. 2. The substrate of claim 1 , wherein the magnetic laminate includes magnetic particles embedded in a polymer matrix, and wherein the organic material includes the polymer matrix which comprises an epoxy resin. 3. The substrate of claim 2 , wherein the magnetic particles comprise one of: gamma-ferric oxide, magnetite, iron, nickel, cobalt, molybdenum, manganese, lanthanide series elements or a Heusler alloy. 4. The substrate of claim 1 , further comprising a core having a first side and a second side opposite the first side, wherein the planar magnetic structure is integrated over one of the first side of the core or the second side of the core. 5. The substrate of claim 1 , wherein the magnetic laminate has an interface with the first metal features. 6. The substrate of claim 5 , wherein a release film is between the magnetic laminate and the first metal features, and wherein an edge of the release film is also over the first metal features. 7. The substrate of claim 1 , wherein the magnetic laminate has a conformal interface with the first metal features. 8. The substrate of claim 1 , wherein the dielectric comprises an organic laminate, and wherein the magnetic laminate has an interface with the organic laminate. 9. The substrate of claim 1 , wherein the planar magnetic structure is interleaved between the first conductor plane and a second conductor plane that is over the magnetic laminate. 10. The substrate of claim 1 , wherein the planar magnetic structure has a relative magnetic permeability ranging between 5 and 20. 11. The substrate of claim 1 , wherein the planar magnetic structure has a thickness of at least 20 microns. 12. A system, comprising: a memory; a processor coupled to the memory; and a wireless transceiver to allow the processor to communicate wirelessly to an external device, wherein at least one of the processor, memory or wireless transceiver are within an integrated circuit package comprising the substrate of claim 1 .

Assignees

Inventors

Classifications

  • Manufacture or treatment · CPC title

  • Insulating or insulated package substrates; Interposers; Redistribution layers (leadframes H10W70/40) · CPC title

  • Through-vias · CPC title

  • comprising multiple insulating layers · CPC title

  • Inductive arrangements (H10W44/20 takes precedence) · CPC title

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Frequently asked questions

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What does patent US11610706B2 cover?
A substrate for an integrated circuit package, the substrate comprising a dielectric, at least one conductor plane within the dielectric, and a planar magnetic structure comprising an organic magnetic laminate embedded within the dielectric, wherein the planar magnetic structure is integrated within the at least one conductor plane.
Who is the assignee on this patent?
Intel Corp
What technology area does this patent fall under?
Primary CPC classification H01F1/42. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 21 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).