Method for fabricating at least one aperture with shaped sidewalls in a layer of a light sensitive photopolymer
US-2016062239-A1 · Mar 3, 2016 · US
US11607871B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11607871-B2 |
| Application number | US-201916960439-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 15, 2019 |
| Priority date | Jan 19, 2018 |
| Publication date | Mar 21, 2023 |
| Grant date | Mar 21, 2023 |
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Disclosed are a separator for lipid bilayer membrane formation capable of forming a lipid bilayer membrane with excellent properties, wherein the separator for lipid bilayer membrane formation has sufficient mechanical strength and can be easily manufactured in a large scale by using a general-purpose machine without need of using an expensive machine, and a method of producing the separator. The separator for lipid bilayer membrane formation includes a thin film having one or more through holes and made of a resin capable of being wet-etched, and reinforcing layers covering both surfaces of the thin film and made of a resin capable of being wet-etched. The reinforcing layers cover the whole area of the thin film, except for the through holes and the peripheries thereof, and each through hole has a tapered cross-sectional shape.
Opening claim text (preview).
The invention claimed is: 1. A method of producing a separator for forming a lipid bilayer membrane, said separator comprising a thin film having one or more through holes and made of a resin capable of being wet-etched, and reinforcing layers covering both surfaces of said thin film and made of a resin capable of being wet-etched, wherein said reinforcing layers cover a whole area of said thin film except for said through holes and peripheries thereof, and each of said through holes has a tapered cross-sectional shape; said method comprising the steps of: providing said thin film whose one surface is covered by a supporting film; forming said one or more through holes with a tapered cross-sectional shape by subjecting said thin film to selective etching; applying a photosensitive resin layer to cover the whole area of said thin film on the surface opposite to that covered by said supporting film; detaching said supporting film; applying a photosensitive resin layer to cover the whole area of said thin film on the surface exposed following the detachment of said supporting film; subjecting said photosensitive resin layers on the both surfaces of said thin film to selective photoetching for selective removal of said photosensitive resin that fills each of said through holes and of said photosensitive resin at the periphery of each of said through holes; and heating both said photosensitive resin layers to form said reinforcing layers. 2. The method according to claim 1 , wherein said thin film is composed of a polyimide resin. 3. The method according to claim 1 , wherein said reinforcing layers are composed of a polyimide resin. 4. The method according to claim 1 , wherein said photosensitive resin layers are heated under vacuum.
Heat treatment (for heating or cooling of layers during lamination B32B37/06, B32B37/08) · CPC title
with sensitive layers on both sides of the substrate · CPC title
Constructional details of laminating machines comprising rollers; Constructional features of the rollers · CPC title
Vacuum · CPC title
having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} · CPC title
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