Photosensitive composition, pattern-forming method using the composition, and resin used in the composition
US-9217919-B2 · Dec 22, 2015 · US
Phosphonium-based zwitterionic monomers and polymers, and compositions and methods thereof
US11603379B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11603379-B2 |
| Application number | US-202017015988-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 9, 2020 |
| Priority date | Sep 9, 2019 |
| Publication date | Mar 14, 2023 |
| Grant date | Mar 14, 2023 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
The invention provides novel zwitterionic monomers and polymers (including copolymers) with pendent phosphonium-based zwitterionic moieties, and compositions and products comprising same, as well as related methods and uses of the compositions, for example, as surfactants, coatings, and interlayer materials, biomedical materials or agents.
First claim
Opening claim text (preview).
The invention claimed is: 1. A compound having the structural formula: wherein R 1 is H or a methyl group, each R 2 is independently an alkyl or aryl group, L 1 is (CH 2 ) i , wherein i is an integer selected from 1 and 2, and L 2 is (CH 2 ) j , wherein j is an integer selected from 0-6. 2. The compound of claim 1 , wherein R 1 is H. 3. The compound of claim 1 , wherein R 1 is a methyl group. 4. The compound of claim 1 , wherein each R 2 is a C 1 -C 18 alkyl group. 5. The compound of claim 4 , wherein each R 2 is a C 1 -C 6 alkyl group. 6. The compound of claim 4 , wherein each R 2 is a C 7 -C 18 alkyl group. 7. The compound of claim 1 , wherein each R 2 is an aryl group. 8. The compound of claim 7 , wherein each R 2 is a phenyl group. 9. The compound of claim 1 , wherein the R 2 s are the same. 10. The compound of claim 1 , wherein the R 2 s are not the same. 11. The compound of claim 1 , wherein i is 1. 12. The compound of claim 11 , wherein j is an integer selected from 0-3.
Assignees
Inventors
Classifications
Aromatic phosphonium compounds (P-C aromatic linkage) · CPC title
Homopolymers or copolymers of aromatic monomers containing elements other than carbon and hydrogen · CPC title
- C08F12/30Primary
Sulfur · CPC title
- C07F9/5407Primary
Acyclic saturated phosphonium compounds · CPC title
Homopolymers or copolymers of aromatic monomers containing elements other than carbon and hydrogen · CPC title
Patent family
Related publications grouped by family.
External sources
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US11603379B2 cover?
- The invention provides novel zwitterionic monomers and polymers (including copolymers) with pendent phosphonium-based zwitterionic moieties, and compositions and products comprising same, as well as related methods and uses of the compositions, for example, as surfactants, coatings, and interlayer materials, biomedical materials or agents.
- Who is the assignee on this patent?
- Univ Massachusetts
- What technology area does this patent fall under?
- Primary CPC classification C08F12/30. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Mar 14 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).