Method for improving the performance of a heterojunction solar cell

US11588071B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11588071-B2
Application numberUS-201917287966-A
CountryUS
Kind codeB2
Filing dateOct 24, 2019
Priority dateOct 24, 2018
Publication dateFeb 21, 2023
Grant dateFeb 21, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present disclosure provides a method for rapidly treating a heterojunction solar cell fabricated using a crystalline silicon wafer doped exclusively with n-type dopants to improve surface passivation and carrier transport properties using the following steps: providing a heterojunction solar cell; the solar cell having an n-type silicon substrate exclusively doped with n-type dopants with a concentration higher than 1×1014 cm−3 and a plurality of metallic contacts; illuminating a surface portion of the solar cell for a period of less than 5 minutes and at a temperature between 200° C. and 300° C. with light having an intensity of at least 2 kW/m2 and a wavelength such that the light is absorbed by the surface portion and generates electron-hole pairs in the solar cell. The step of illuminating a surface portion of the solar cell is such that less than 0.5 kWh/m2 of energy is transferred to the surface portion and a temperature of the surface portion increases at a rate of at least 10° C./s for a period of time during illumination.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for improving the performance of an n-type heterojunction solar cell comprising: providing a heterojunction solar cell; the solar cell having an n-type silicon substrate exclusively doped with n-type dopants with a concentration higher than 1×10 14 cm −3 and a plurality of metallic contacts; illuminating a surface portion of the solar cell for a period of less than 5 minutes and at a temperature between 200° C. and 300° C. with light having an intensity of at least 2 kW/m 2 and a wavelength such that the light is absorbed by the surface portion and generates electron-hole pairs in the solar cell; wherein the step of illuminating a surface portion of the solar cell is such that less than 0.5 kWh/m 2 of energy is transferred to the surface portion and a temperature of the surface portion increases at a rate of at least 10° C./s for a period of time during illumination. 2. The method of claim 1 , wherein the step of illuminating a surface portion of the solar cell with light is such that an excess carrier concentration within the solar cell is at least 1×10 16 cm −3 during illumination. 3. The method of claim 1 , wherein the wavelength of the light is such that absorption in the plurality of metallic contacts is higher than absorption in the silicon substrate. 4. The method of claim 1 , further comprising varying the intensity of illumination to modulate the temperature of the device. 5. The method of claim 1 , wherein the step of illuminating a surface portion of the solar cell is performed so that the exposed portion is rapidly heated to a pre-determined temperature by using a higher illumination intensity. 6. The method of claim 1 , wherein: the illumination intensity is higher than 5 kW/m 2 ; or the illumination intensity is higher than 20 kW/m 2 . 7. The method of claim 1 , wherein: the illumination intensity is higher than 5 kW/m 2 for less than 6 minutes; or the illumination intensity is higher than 20 kW/m2 for less than 90 seconds. 8. The method of claim 1 , wherein: the illumination intensity is higher than 100 kW/m 2 for less than 18 seconds; or the illumination intensity is higher than 200 kW/m 2 for less than 9 seconds. 9. The method of claim 1 , wherein the illumination intensity is higher than 50 kW/m 2 for a period of time between 0.1 seconds and 9 seconds. 10. The method of claim 1 , wherein: the wavelength of the light is between 700 nm and 1100 nm; or the wavelength of the light is between 800 nm and 1000 nm. 11. The method of claim 1 , further comprising actively cooling the solar cell during illumination when the illumination intensity is above 4 kW/m 2 . 12. The method of claim 1 , further comprising actively cooling the solar cell from a temperature in the range of 200° C.-300° C. to a temperature at least 50° C. lower with a cooling rate of at least 10° C./s. 13. The method of claim 12 , wherein the solar cell is cooled with a cooling rate of at least 20° C./s. 14. The method of claim 12 , wherein the solar cell is cooled to a temperature below 150° C. 15. The method of claim 1 , further comprising pre-heating the device to a temperature of at least 100° C. using infra-red light. 16. The method of claim 1 , wherein: the step of illuminating a surface portion of the solar cell is performed at a temperature of 210° C.-295° C.; or the step of illuminating a surface portion of the solar cell is performed at a temperature of 220° C.-290° C.; or the step of illuminating a surface portion of the solar cell is performed at a temperature of 230° C.-280° C.; or the step of illuminating a surface portion of the solar cell is performed at a temperature of 240° C.-270° C. 17. The method of claim 1 , wherein: the illuminated portion has an area of more than 10 cm 2 ; or the illuminated portion has an area of more than 100 cm 2 . 18. The method of claim 1 , wherein the illuminated portion comprises a rear surface of the device. 19. The method of claim 1 , wherein the illuminated portion comprises a rear and a front surface of the device. 20. The method of claim 1 , wherein: the step of illuminating a surface portion of the solar cell with light is performed at a temperature above 250° C. for a duration of less than 30 seconds; or the step of illuminating a surface portion of the solar cell with light is performed at a temperature above 250° C. for a duration of less than 10 seconds.

Assignees

Inventors

Classifications

  • mainly by radiation · CPC title

  • Thermal treatments, e.g. annealing or sintering · CPC title

  • Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices · CPC title

  • the heterojunctions being Group IV-IV heterojunctions, e.g. Si/Ge, SiGe/Si or Si/SiC photovoltaic cells · CPC title

  • Passivating · CPC title

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What does patent US11588071B2 cover?
The present disclosure provides a method for rapidly treating a heterojunction solar cell fabricated using a crystalline silicon wafer doped exclusively with n-type dopants to improve surface passivation and carrier transport properties using the following steps: providing a heterojunction solar cell; the solar cell having an n-type silicon substrate exclusively doped with n-type dopants with a…
Who is the assignee on this patent?
Newsouth Innovations Pty Ltd
What technology area does this patent fall under?
Primary CPC classification H10F71/10. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 21 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).