Magnetic housing systems

Patent metadata

Field	Value
Publication number	US-11587764-B2
Application number	US-201916671330-A
Country	US
Kind code	B2
Filing date	Nov 1, 2019
Priority date	Nov 5, 2018
Publication date	Feb 21, 2023
Grant date	Feb 21, 2023

Abstract

Embodiments described herein relate to magnetic and electromagnetic systems and a method for controlling the density profile of plasma generated in a process volume of a PECVD chamber to affect deposition profile of a film. In one embodiment, a plurality of retaining brackets is disposed in a rotational magnetic housing of the magnetic housing systems. Each retaining bracket of the plurality of retaining brackets is disposed in the rotational magnetic housing with a distance d between each retaining bracket. The plurality of retaining brackets has a plurality of magnets removably disposed therein. The plurality of magnets is configured to travel in a circular path when the rotational magnetic housing is rotated around the round central opening.

First claim

What is claimed is:

1. A system comprising:
a rotational magnetic housing, comprising:
an upper plate;
an outer sidewall;
an inner sidewall defining a round central opening; and
a lower plate; and

a plurality of retaining brackets disposed in the rotational magnetic housing, wherein:
each retaining bracket of the plurality of retaining brackets is disposed in the rotational magnetic housing with a distance d between each retaining bracket;
each retaining bracket has an upper surface coupled to the upper plate and a lower surface coupled to the lower plate of the rotational magnetic housing; and
the plurality of retaining brackets have a plurality of magnets removably disposed therein, each magnet of the plurality of magnets is retained in a respective retaining bracket with a pitch p between each magnet of the plurality of magnets, and the plurality of magnets are configured to travel in a circular path when the rotational magnetic housing is rotated around the round central opening.

2. The system of claim 1 , wherein the rotational magnetic housing is coupled to a drive system, the drive system comprising:
a motor coupled to a belt, wherein the belt is to be disposed around the rotational magnetic housing, the belt has a plurality of lugs, and each lug corresponds to a groove of a plurality of grooves of the outer sidewall of the rotational magnetic housing.

3. The system of claim 2 , wherein the drive system and the rotational magnetic housing are coupled to a housing lift system operable to raise and lower the rotational magnetic housing and the drive system.

4. The system of claim 3 , wherein the rotational magnetic housing is coupleable to an exterior sidewall of a chamber.

5. The system of claim 1 , wherein the retaining brackets are coupled to tracks and the retaining brackets are actuated to move on the tracks.

6. A chamber comprising:
a chamber body;
a chamber lid having a gas distribution assembly;
a substrate support positioned opposite the gas distribution assembly to define a process volume, the process volume having a center axis;
a radio frequency (RF) source operable to be coupled to an electrode disposed within substrate support; and
a rotational magnetic housing system having a rotational magnetic housing coupled to the chamber, wherein the rotational magnetic housing comprises:
an upper plate;
an outer sidewall;
an inner sidewall defining a round central opening;
a lower plate; and
a plurality of retaining brackets disposed in the rotational magnetic housing, wherein:
each retaining bracket of the plurality of retaining brackets is disposed in the rotational magnetic housing with a distance d between each retaining bracket;
each retaining bracket has an upper surface coupled to the upper plate and a lower surface coupled to the lower plate of the rotational magnetic housing; and
the plurality of retaining brackets have a plurality of magnets removably disposed therein, wherein each magnet of the plurality of magnets is retained in a respective retaining bracket with a pitch p between each magnet of the plurality of magnets, and the plurality of magnets are configured to travel in a circular path when the rotational magnetic housing is rotated around the round central opening.

7. The chamber of claim 6 , wherein the inner sidewall of the rotational magnetic housing is coupled to an exterior wall of a chamber spacer, the chamber spacer having:
a first flange coupled to a mounting plate of the chamber body; and
a second flange coupled to the chamber lid.

8. The chamber of claim 7 , wherein the rotational magnetic housing is coupled to a drive system, the drive system comprises a motor coupled to a belt, the belt is to be disposed around the rotational magnetic housing, the belt has a plurality of lugs, and each lug corresponds to a groove of a plurality of grooves of the outer sidewall of the rotational magnetic housing.

9. The chamber of claim 8 , wherein the drive system and the rotational magnetic housing are coupled to a housing lift system operable to raise and lower the rotational magnetic housing and the drive system.

10. The chamber of claim 7 , wherein the exterior wall of the chamber spacer includes a polymer material.

11. The chamber of claim 6 , wherein the substrate support is coupled to a substrate support drive system configured to rotate the substrate support about the center axis of the process volume.

12. The chamber of claim 6 , wherein the retaining brackets are coupled to tracks and the retaining brackets are actuated to move on the tracks.

Assignees

• Applied Materials Inc

Inventors

• Gandikota Srinivas
• Gung Tza-Jing
• Gottheim Samuel E
• Franklin Timothy Joseph
• Manna Pramit
• Venkatasubramanian Eswaranand
• Haywood Edward
• Garner Stephen C
• Fischbach Adam

Classifications

• H10P50/242

  of Group IV materials · CPC title

• H10P14/6336

  in the presence of a plasma [PECVD] · CPC title

• H01J37/32082 Primary

  Radio frequency generated discharge (H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence) · CPC title

• H01J37/32715

  Workpiece holder · CPC title

• C23C16/52

  Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)} · CPC title