Perovskite optoelectronic device, preparation method therefor and perovskite material
US-2019036030-A1 · Jan 31, 2019 · US
US11581503B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11581503-B2 |
| Application number | US-202117212020-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 25, 2021 |
| Priority date | Aug 1, 2018 |
| Publication date | Feb 14, 2023 |
| Grant date | Feb 14, 2023 |
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Provided is a light-emitting diode and a method for preparing the same. The light-emitting diode includes an anode, a hole transport layer, a perovskite light-emitting layer, an electron transport layer and a cathode stacked in sequence, in which the perovskite light-emitting layer includes a first sublayer and a second sublayer stacked in sequence, with a material for forming the first sublayer including an inorganic perovskite material, and with a material for forming the second sublayer being an organic perovskite material.
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What is claimed is: 1. A method for preparing a light-emitting diode, comprising steps of: forming a hole transport layer on a side of an anode; forming a perovskite light-emitting layer on a side of the hole transport layer away from the anode; forming an electron transport layer on a side of the perovskite light-emitting layer away from the anode; and forming a cathode on a side of the electron transport layer away from the anode, wherein the step of forming the perovskite light-emitting layer comprises: forming a first sublayer on a side of the hole transport layer away from the anode, with a raw material for forming the first sublayer comprising an inorganic perovskite material; and forming a second sublayer on a side of the first sublayer away from the anode, with a raw material for forming the second sublayer being an organic perovskite material, wherein the step of forming the perovskite light-emitting layer further comprises annealing the first sublayer at 70 to 200° C. after the step of forming the first sublayer. 2. The method of claim 1 , wherein the first sublayer is formed by a solution process and the second sublayer is formed by a vacuum evaporation process. 3. The method of claim 2 , wherein a raw material for forming the first sublayer by the solution process further comprises a passivation material and a solvent, with the solvent comprising at least one selected from dimethyl sulfoxide and dimethylformamide. 4. The method of claim 3 , wherein the weight ratio of the inorganic perovskite material to the passivation material is from 19:1 to 4:1. 5. The method of claim 1 , wherein the method further comprises: forming a hole injection layer on the side of the anode before forming the hole transport layer. 6. The method of claim 1 , wherein the method further comprises: forming an exciton-blocking layer on the side of the perovskite light-emitting layer before forming the electron transport layer. 7. A method for preparing a light-emitting diode, comprising steps of: forming a hole transport layer on a side of an anode; forming a perovskite light-emitting layer on a side of the hole transport layer away from the anode; forming an electron transport layer on a side of the perovskite light-emitting layer away from the anode; and forming a cathode on a side of the electron transport layer away from the anode, wherein the step of forming the perovskite light-emitting layer comprises: forming a first sublayer on a side of the hole transport layer away from the anode, with a raw material for forming the first sublayer comprising an inorganic perovskite material; and forming a second sublayer on a side of the first sublayer away from the anode, with a raw material for forming the second sublayer being an organic perovskite material material, wherein the first sublayer is formed by a solution process and the second sublayer is formed by a vacuum evaporation process. 8. The method of claim 7 , wherein a raw material for forming the first sublayer by the solution process further comprises a passivation material and a solvent, with the solvent comprising at least one selected from dimethyl sulfoxide and dimethylformamide. 9. The method of claim 8 , wherein the weight ratio of the inorganic perovskite material to the passivation material is from 19:1 to 4:1. 10. The method of claim 7 , wherein the method further comprises: forming a hole injection layer on the side of the anode before forming the hole transport layer. 11. The method of claim 7 , wherein the method further comprises: forming an exciton-blocking layer on the side of the perovskite light-emitting layer before forming the electron transport layer.
Organic perovskites; Hybrid organic-inorganic perovskites [HOIP], e.g. CH3NH3PbI3 · CPC title
Thermal treatment, e.g. annealing in the presence of a solvent vapour · CPC title
in the presence of solvent vapors, e.g. solvent vapour annealing · CPC title
comprising mobile ions · CPC title
comprising stacked EL layers within one EL unit · CPC title
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