Silver electroplating compositions and methods for electroplating silver with low coefficients of friction

Patent metadata

Field	Value
Publication number	US-11578418-B2
Application number	US-202217592056-A
Country	US
Kind code	B2
Filing date	Feb 3, 2022
Priority date	Mar 29, 2021
Publication date	Feb 14, 2023
Grant date	Feb 14, 2023

Abstract

Silver electroplating compositions deposit silver with low coefficients of friction on substrates, such as nickel, copper and copper alloys. The silver deposits have coefficients of friction of less than or equal to 1 in contrast to many conventional silver deposits which typically have coefficients of friction greater than 1, such as 1.5. The silver deposits also have improved wear resistance in contrast to silver deposited from many conventional silver electroplating baths. The low coefficients of friction and improved wear resistance of silver deposited from the silver electroplating compositions is especially suitable for connectors and electronics finishes. Preferably, the silver electroplating compositions are cyanide-free silver electroplating compositions.

First claim

What is claimed is:

1. A silver electroplating composition consisting of water, a source of silver ions, counter anions, thiodiethanol, a compound selected from the group consisting of naphthalene sulfonic acid formaldehyde condensate, poly-acrylic-co-vinylsulfonic acid, salts thereof, and mixtures thereof, optionally an acid, optionally a base, optionally a brightening agent, optionally a grain refiner, optionally a surfactant selected from the group consisting of anionic surfactant, cationic surfactant, amphoteric surfactant and mixtures thereof, optionally a leveler, optionally a biocide, and a pH of less than 7.

2. The silver electroplating composition of claim 1 , wherein the compound is naphthalene sulfonic acid formaldehyde condensate or salt thereof.

3. The silver electroplating composition of claim 1 , wherein the acid is an alkane sulfonic acid.

4. The silver electroplating composition of claim 1 , wherein the grain refiner is a thiol compound.

5. A method of electroplating silver metal on a substrate comprising:
a) providing the substrate;
b) contacting the substrate with a silver electroplating composition, wherein the silver electroplating composition consists of water, a source of silver ions, counter anions, thiodiethanol, a compound selected from the group consisting of naphthalene sulfonic acid formaldehyde condensate, poly-acrylic-co-vinylsulfonic acid, salts thereof, and mixtures thereof, optionally an acid, optionally a base, optionally a brightening agent, optionally a grain refiner, optionally a surfactant selected from the group consisting of anionic surfactant, cationic surfactant, amphoteric surfactant and mixtures thereof, optionally a leveler, optionally a biocide, and a pH of less than 7; and
c) applying an electric current to the silver electroplating composition and substrate to electroplate a silver deposit on the substrate.

Assignees

• Rohm & Haas Elect Mat
• Rohm And Haas Electronic Mat Llc Rhem

Inventors

• Yoon Youngmin
• Rodriguez Miguel A
• Lipschutz Michael
• Chen Jamie Y C
• Griffin Kristen

Classifications

• C25D3/46 Primary

  of silver · CPC title

• C25D7/00

  Electroplating characterised by the article coated · CPC title

• C25D5/611

  Smooth layers · CPC title