Method and apparatus for mass production of AR diffractive waveguides

US11577480B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11577480-B2
Application numberUS-202016930387-A
CountryUS
Kind codeB2
Filing dateJul 16, 2020
Priority dateDec 25, 2019
Publication dateFeb 14, 2023
Grant dateFeb 14, 2023

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  5. First independent claim

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Abstract

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A method and apparatus for mass production of AR diffractive waveguides. Low-cost mass production of large-area AR diffractive waveguides (slanted surface-relief gratings) of any shape. Uses two-photon polymerization micro-nano 3D printing to realize manufacturing of slanted grating large-area masters of any shape (thereby solving the problem about manufacturing of slanted grating masters of any shape on the one hand, realizing direct manufacturing of large-size wafer-level masters on the other hand, and also having the advantages of low manufacturing cost and high production efficiency). Composite nanoimprint lithography technology is employed (in combination with the peculiar imprint technique and the composite soft mold suitable for slanted gratings) to solve the problem that a large-slanting-angle large-slot-depth slanted grating cannot be demolded and thus cannot be manufactured, and realize the manufacturing of the slanted grating without constraints (geometric shape and size).

First claim

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What is claimed is: 1. A method for production of AR diffractive waveguides, comprising the following steps: (1) manufacturing a polymer master by using two-photon polymerization micro-nano 3D printing; (2) manufacturing a slanted grating metal nickel master mold by using the polymer master manufactured in step (1) in combination with precision micro electroforming technology; (3) manufacturing of a working soft mold by determining a support layer material and a pattern layer material, and using a working soft mold copying apparatus to perform copying of the working soft mold by using the slanted grating metal nickel master mold manufactured in step (2) as a mold; (4) manufacturing of a slanted surface-relief grating structure by composite nanoimprint lithography by selecting an imprinting material and an imprinting substrate, using the working soft mold prepared in step (3) as an imprinting mold, and using composite nanoimprint technology, wherein during mold covering, a rotation direction of a roller releasing the working soft mold being opposite to a direction of a slanted surface-relief grating on the working soft mold is ensured such that the slanted surface-relief grating structure is imprinted, transferred and copied onto the imprinting material forwardly; during imprinting, two-time imprinting is used, and a rotation direction of the roller during the two-time imprinting is opposite to the direction of the slanted surface-relief grating on the working soft mold; during demolding, “peeling” demolding is used, and a rotation direction of the roller grasping the working soft mold is the same as the direction of the slanted surface-relief grating on the working soft mold, thereby completing manufacturing of the slanted surface-relief grating structure on the imprinting substrate; and (5) cutting the slanted surface-relief grating structure that has been manufactured into a required slanted surface-relief grating required for AR glasses by laser scribing technology, thereby completing manufacturing of the AR diffractive waveguides, wherein in step (3), the copying of the working soft mold comprises: first applying a layer of a mold release agent to the slanted grating metal nickel metal master mold, then applying a liquid layer of the pattern layer material by using a precision coating manner, placing the slanted grating metal nickel metal master mold coated with the pattern layer material on a carrying table of the working soft mold copying apparatus, and fixing the slanted grating metal nickel metal master mold coated with the pattern layer material by vacuum adsorption; adsorbing and fixing the support layer material onto the outer surface of the roller by using the working soft mold copying apparatus, and laying the support layer material by progressive line contact to cover the slanted grating metal nickel metal master mold coated with the pattern layer material such that the support layer material and the pattern layer material are completely attached; by using the roller of the working soft mold copying apparatus, rotating the roller, moving the roller synchronously in cooperation with a working platform, and performing imprinting on the support layer by a line contact manner to complete first pressing; under a condition that the working platform does not move, performing dislocated rotation on the roller by a certain angle, then rotating the roller, moving the roller synchronously in cooperation with the working platform to complete subsequent pressing such that bonding between the support layer and the pattern layer is ensured and probability of producing bubble defects is reduced, and the pattern layer is thermocured and set; and by using the working soft mold copying apparatus, separating the support layer attached with the pattern layer from the slanted grating metal nickel metal master mold by using a peeling manner, thereby manufacturing the working soft mold in a form of double-layer composite. 2. The method according to claim 1 , wherein after a first production cycle is completed, step (1), step (2) and step (3), and step (4) and step (5) run in parallel; or/and, step (1), step (2) and step (3) are in serial production; and step (4) and step (5) are in serial production. 3. The method according to claim 1 , wherein step (1) comprises: converting a geometric shape and a size of a slanted grating into a processing file by using data processing software; subsequently, inputting the processing file to a two-photon polymerization micro-nano 3D printer; performing layer-by-layer printing according to design data until the printing of the slanted grating is completed; and taking the slanted grating that has been manufactured off a printing platform of the printer, removing a supporting structure, and further performing post-curing treatment to prepare the polymer master of the slanted grating. 4. The method according to claim 1 , wherein step (2) comprises: sputter-depositing a seed layer Cr/Cu on a surface of the polymer master by using a slanted sputtering manner; forming and copying the slanted grating metal nickel master mold by using a precision micro electroforming technique; and separating the slanted grating metal nickel master mold from the polymer master, completely removing residual structure and material of the polymer master attached to the slanted grating nickel master mold, and performing surface treatment on a slanted grating of the slanted grating nickel master mold to reduce surface roughness and improve surface quality of the slanted grating. 5. The method according to claim 1 , wherein in step (3) during the demolding, a direction relationship when the working soft mold is separated from the slanted grating metal nickel metal master mold is as follows: a rotation direction of the roller is the same as the a slanting direction of the slanted grating metal nickel master mold. 6. The method claim 1 , wherein the support layer material is PDMS, PET or PC; or the pattern layer material is h-PDMS, PDMS, a fluoropolymer-based material, or ETFE; or a thickness of the pattern layer is in a range of 10-100 m, and a thickness of the support layer is in a range of 100-3000 μm; or the support layer is subjected to surface modification treatment or coated with a layer of a transparent coupling agent material. 7. The method according to claim 1 , wherein in step (4) during the imprinting, the imprinting is performed on the working soft mold by a line contact manner to complete a first pressing; subsequently, dislocated rotation is performed on the roller, and the roller is rotated and synchronously moves in cooperation with a working platform to complete a second pressing imprinting; and during curing, the roller is lifted up by a certain height to ensure that the roller is detached from the working soft mold, the working platform performs one or more back-and-forth movements, and the imprinting material is completely cured. 8. A method for production of AR diffractive waveguides, comprising the following steps: (1) manufacturing a polymer master by using two-photon polymerization micro-nano 3D printing; (2) manufacturing a slanted grating metal nickel master mold by using the polymer master manufactured in step (1) in combination with precision micro electroforming technology; (3) manufacturing of a working soft mold by determining a support layer material and a pattern layer material, and using a working soft mold copying apparatus to perform copying of the working soft mold by using the slanted grating metal nickel master mold manufactured in step (2) as a mold; (4) manufacturing of a slanted surface-relief grating structure by composite nanoimprint lithography by selecting an imprinting material and an imprinting su

Assignees

Inventors

Classifications

  • Products made by additive manufacturing · CPC title

  • Geodesic lenses or integrated gratings · CPC title

  • Processes of additive manufacturing · CPC title

  • Eyeglass type (eyeglass details G02C) · CPC title

  • characterised by the material or the manufacturing process (B29C33/44 takes precedence) · CPC title

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What does patent US11577480B2 cover?
A method and apparatus for mass production of AR diffractive waveguides. Low-cost mass production of large-area AR diffractive waveguides (slanted surface-relief gratings) of any shape. Uses two-photon polymerization micro-nano 3D printing to realize manufacturing of slanted grating large-area masters of any shape (thereby solving the problem about manufacturing of slanted grating masters of an…
Who is the assignee on this patent?
Univ Qingdao Technology, Qingdao 5D Intelligent Additive Manufacturing Tech Co Ltd
What technology area does this patent fall under?
Primary CPC classification B29D11/00663. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Feb 14 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).