Devices and methods for holding a sample for multi-axial testing

Patent metadata

Field	Value
Publication number	US-11577296-B2
Application number	US-201916299746-A
Country	US
Kind code	B2
Filing date	Mar 12, 2019
Priority date	Mar 12, 2018
Publication date	Feb 14, 2023
Grant date	Feb 14, 2023

Abstract

Methods and devices are disclosed for tracking site-specific microstructure evolutions and local mechanical fields in metallic samples deformed along biaxial strain paths. The method is based on interrupted bulge tests carried out with a custom sample holder adapted for SEM-based analytical measurements. Embodiments include elliptical dies used to generate proportional and complex strain paths in material samples. One example holding device includes a base having a floor and walls that extend to form a chamber for a sample, the floor having apertures for receiving a pressure-supplying fluid, a cover having an opening and configured such that the cover and base can be coupled together to tightly clamp a sample in the chamber, and washers disposed between the base and the cover, each washer having openings extending therethrough change at least one of a shape and a size of the opening formed in the cover.

First claim

What is claimed is:

1. A device for holding a sample, comprising:
a base having a floor and one or more walls that extend above the floor to form a receiving chamber for receiving a sample, the floor having one or more apertures extending therethrough for receiving a pressure-supplying fluid;
a cover having a configuration that is complementary to at least a portion of the base such that the cover and base can be coupled together to tightly clamp a sample disposed in the receiving chamber, the cover having an opening extending therethrough; and
one or more washers configured to be disposed between the base and the cover when the base and the cover are coupled together, each washer of the one or more washers having one or more openings extending therethrough that are configured to change at least one of a shape and a size of the opening formed in the cover, wherein each washer of the one or more washers comprises one or more clamping ends extending radially outward from a main body of the washer, the one or more clamping ends being configured to engage one or more complementary receiving ends disposed in at least one of the base and the cover.

2. The device of claim 1 , further comprising one or more seals associated with the base, the one or more seals being configured to prevent device leakage when a pressure-supplying fluid is supplied to the one or more apertures.

3. The device of claim 1 , wherein the cover is substantially transparent to allow for observation of a sample disposed in the receiving chamber when a pressure-supplying fluid is being applied to the one or more apertures of the base.

4. The device of claim 1 , wherein a height of the device when the cover is coupled to the base to tightly clamp a sample disposed in the receiving chamber is between approximately two millimeters and five millimeters.

5. The device of claim 1 , wherein a diameter of the device when the cover is coupled to the base to tightly clamp a sample disposed in the receiving chamber is between approximately 20 millimeters and 32 millimeters.

6. The device of claim 1 , wherein an observation angle of the device when the cover is coupled to the base to tightly clamp a sample disposed in the receiving chamber is approximately 70 degrees or less.

7. The device of claim 1 , wherein the one or more washers comprises a plurality of washers, and the one or more openings of a first washer of the plurality of washers and the one or more openings of a second washer of the plurality of washers have an elliptical ratio that is different than 1:1.

8. The device of claim 1 , wherein the one or more washers comprises a plurality of washers that are configured to create one or more complex strain paths for a sample disposed in the receiving chamber.

9. The device of claim 1 , wherein the base is configured to be mounted to a scanning electron microscope.

10. The device of claim 1 , wherein the device is configured to be separately mounted from a pressure system that is configured to apply a pressure-receiving fluid to the one or more apertures of the base.

11. A kit, comprising:
one or more bases, each base having a floor and one or more walls that extend above the floor to form a receiving chamber for receiving a sample, the floor having one or more apertures extending therethrough for receiving a pressure-supplying fluid;
one or more covers, each cover having a configuration that is complementary to at least a portion of the one or more bases such that the cover and the one or more bases can be coupled together to tightly clamp a sample disposed in the receiving chamber, the cover having an opening extending therethrough; and
a plurality of washers configured to be disposed between each base of the one or more bases and each cover of the one or more covers when the respective base and the respective cover are coupled together, each washer of the plurality of washers having one or more openings extending therethrough that are configured to create one or more complex strain paths for a sample disposed in the receiving chamber by changing at least one of a shape and a size of the opening formed in the cover, wherein each washer of the plurality of washers further comprises one or more clamping ends extending radially outward from a main body of the washer, the one or more clamping ends being configured to engage one or more complementary receiving ends disposed in at least one of the base and the cover.

12. The kit of claim 11 , further comprising a plurality of seals configured to be associated with the one or more bases, the plurality of seals being configured to prevent device leakage when a pressure-supplying fluid is supplied to the one or more apertures.

13. The kit of claim 11 , wherein at least one cover of the one or more covers is substantially transparent to allow for observation of a sample disposed in the receiving chamber of the one or more bases when a pressure-supplying fluid is being applied to the one or more apertures of the one or more bases.

14. The kit of claim 11 , wherein a combined height of a base of the one or more bases and a cover of the one or more covers when coupled together to tightly clamp a sample disposed in the receiving chamber of the base is between approximately two millimeters and five millimeters.

15. The kit of claim 11 , wherein a diameter of a cover of the one or more covers is between approximately 20 millimeters and 32 millimeters.

16. The kit of claim 11 , wherein an observation angle of a device resulting from coupling a base of the one or more bases and a cover of the one or more covers to tightly clamp a sample disposed in the receiving chamber of the base is approximately 70 degrees or less.

17. The kit of claim 11 , wherein the one or more openings of a first washer of the plurality of washers and the one or more openings of a second washer of the plurality of washers have an elliptical ratio that is different than 1:1.

18. A method of analyzing a metallic structure, comprising:
disposing a metallic structure in a holder;
coupling the holder to a testing apparatus;
applying a fluid pressure from a fluid pressure system to the holder to cause the metallic structure disposed therein to deform in a manner prescribed by a configuration of the holder; and
observing features of the metallic structure by looking through a side surface of the holder,
wherein the fluid pressure system is separately disposed from each of the holder and the testing apparatus such that each can be disassociated from the other for use elsewhere.

19. The method of claim 18 , further comprising:
decoupling the holder from the testing apparatus;
coupling the holder to a second testing apparatus; and
operating the second testing apparatus to effect the metallic structure.

20. The method of claim 18 , further comprising:
selecting at least one washer and disposing the selected at least one washer in the holder to derive a desired configuration of the holder, the desired configuration of the holder being configured to achieve a desired metallic structure deformation.

Assignees

• Massachusetts Inst Technology

Inventors

• Plancher Emeric
• Tasan Cemal Cem
• Vonk Nicolaas Hendrikus
• Qu Ke

Classifications

• G01N3/04

  Chucks · CPC title

• G01N3/10 Primary

  generated by pneumatic or hydraulic pressure (G01N3/18 takes precedence) · CPC title

• G01N2203/0647

  Image analysis · CPC title

• B21D26/021 Primary

  Deforming sheet bodies · CPC title

• G01N3/28

  Investigating ductility, e.g. suitability of sheet metal for deep-drawing or spinning · CPC title