Nanoparticle synthesis device and nanoparticle synthesis method using same

US11577214B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11577214-B2
Application numberUS-201916958622-A
CountryUS
Kind codeB2
Filing dateJul 16, 2019
Priority dateJul 23, 2018
Publication dateFeb 14, 2023
Grant dateFeb 14, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention provides a nanoparticle synthesis device capable of improving productivity of nanoparticles by increasing the size of a reaction region of laser pyrolysis of a source gas.

First claim

Opening claim text (preview).

The invention claimed is: 1. A nanoparticle synthesis device comprising: a reaction chamber; a source gas injection unit provided at one side of the reaction chamber and configured to supply a source gas into the reaction chamber; a laser beam incident unit provided at the other side of the reaction chamber and configured to allow laser beams to be incident on the source gas injected into the reaction chamber; and a laser beam collision unit provided at a side opposite to the side at which the laser beams are incident in the reaction chamber and configured to allow the laser beams from the laser beam incident unit to collide, wherein an outer circumferential surface of the laser beam collision unit and an inner circumferential surface of the reaction chamber are spaced apart from each other such that a separation space is formed therebetween, wherein the source gas flows in the reaction chamber in the direction in which the laser beams are incident. 2. The nanoparticle synthesis device of claim 1 , wherein at least one part of the reaction chamber enables a pyrolysis reaction of the source gas caused by the laser beams to be observed from outside. 3. The nanoparticle synthesis device of claim 1 , wherein the laser beam collision unit is provided with a coating layer formed on at least a part of a surface thereof configured to absorb or reflect the incident laser beams. 4. The nanoparticle synthesis device of claim 1 , wherein multiple cooling fins are provided on an outer circumferential surface of at least a part of the reaction chamber. 5. A nanoparticle synthesis method using the nanoparticle synthesis device according to claim 1 , the method comprising: supplying a source gas into the reaction chamber; irradiating the supplied source gas with laser beams; and growing nanoparticles by inducing a pyrolysis reaction of the source gas by the incident laser beams, wherein the source gas flows in the reaction chamber in the direction in which the laser beams are incident. 6. The nanoparticle synthesis method of claim 5 , wherein the laser beam is a CO 2 continuous-wave laser beam. 7. The nanoparticle synthesis method of claim 5 , wherein the source gas includes a reactant gas and a carrier gas.

Assignees

Inventors

Classifications

  • Controlling the temperature of the process · CPC title

  • Gas · CPC title

  • B01J19/121Primary

    Coherent waves, e.g. laser beams (lasers per se H01S3/00) · CPC title

  • Feeding or evacuating the reactor · CPC title

  • by decomposition of monosilane · CPC title

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What does patent US11577214B2 cover?
The present invention provides a nanoparticle synthesis device capable of improving productivity of nanoparticles by increasing the size of a reaction region of laser pyrolysis of a source gas.
Who is the assignee on this patent?
Lg Chemical Ltd, Knu Industry Cooperation Found
What technology area does this patent fall under?
Primary CPC classification B01J19/121. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Feb 14 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).