Pinhole mitigation for optical devices
US-2017003566-A1 · Jan 5, 2017 · US
US11567384B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11567384-B2 |
| Application number | US-201816192876-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 16, 2018 |
| Priority date | Nov 20, 2017 |
| Publication date | Jan 31, 2023 |
| Grant date | Jan 31, 2023 |
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A non-light-emitting, variable transmission device can include a first substrate, a first transparent conductive layer, an electrochromic layer, a second transparent conductive layer, a second substrate; and an interlayer disposed between the first substrate and the second substrate. The non-light-emitting, variable transmission device is configured such that a failure of the non-light-emitting, variable transmission device is less likely than another non-light-emitting, variable transmission device in which the interlayer directly contacts the second transparent conductive layer and has a moisture content of at least 0.08 wt %. In an embodiment, the interlayer has a moisture content of at most 0.05 wt %. In another embodiment, the non-light emitting, variable transmission device further includes a barrier layer disposed between the second transparent conductive layer and the interlayer, wherein the barrier layer extends at least partly through the second transparent conductive layer or seals off a passageway.
Opening claim text (preview).
What is claimed is: 1. A non-light-emitting, variable transmission device comprising: a first substrate; a first transparent conductive layer overlying the first substrate; an electrochromic layer overlying the first transparent conductive layer; a second transparent conductive layer overlying the electrochromic layer; a second substrate; a barrier layer between the first substrate and the second substrate in contact with the second transparent conductive layer, wherein the barrier layer is disposed between the second transparent conductive laver and the interlayer, and the barrier layer extends at least partly through the second transparent conductive layer; and an interlayer disposed between the barrier layer and the second substrate, wherein the interlayer has a moisture content of at least 0.08 wt % and wherein the interlayer extends at least partly through the electrochromic layer. 2. The non-light emitting, variable transmission device of claim 1 , wherein: the interlayer has a moisture content of at most 0.05 wt %. 3. A non-light-emitting, variable transmission device comprising: a first substrate; a first transparent conductive layer overlying the first substrate; an electrochromic layer overlying the first transparent conductive layer; a second transparent conductive layer overlying the electrochromic layer; a second substrate; a barrier layer in contact with the second transparent conductive layer; and an interlayer disposed between the barrier layer and the second substrate, wherein the interlayer extends at least partly through the electrochromic layer, wherein: the interlayer has a moisture content of at most 0.05 wt %; and the barrier layer is disposed between the second transparent conductive layer and the interlayer, and the barrier layer extends at least partly through the second transparent conductive layer or overlies a passageway that extends at least partly through the second transparent conductive layer. 4. The non-light emitting, variable transmission device of claim 3 , further comprising an electrochromic stack, wherein the electrochromic stack comprises: a first electrode layer that includes the electrochromic layer or an ion storage layer; an ion conductor layer; a second electrode layer that includes the other of the electrochromic layer or the ion storage layer, wherein: the ion conductor layer is disposed between the first and second electrode layers; the first transparent conductor layer is closer to the first electrode than to the second electrode; and the second transparent conductor layer is closer to the second electrode than to the first electrode. 5. The non-light emitting, variable transmission device of claim 4 , wherein the interlayer contacts the first transparent conductive layer. 6. The non-light-emitting, variable transmission device of claim 3 , wherein the interlayer does not contact the first transparent conductor layer or the electrochromic layer. 7. The non-light-emitting, variable transmission device of claim 3 , wherein the barrier layer includes an oxide, a nitride, or an oxynitride. 8. A process of fabricating a non-light-emitting, variable transmission device, the process comprising: forming a first transparent conductive layer overlying a first substrate; forming an electrochromic layer overlying the first transparent conductive layer; forming a second transparent conductive layer overlying the electrochromic layer; detecting a particle that is deposited below the second transparent conductive layer, wherein the particle is a contaminate, ejecting a particle that lies below the second transparent conductive layer, leaving a passageway that extends at least through the second transparent conductive layer; and joining the first substrate and a second substrate using an interlayer disposed between the second conductive layer and the second substrate, wherein the interlayer extends at least partly through the electrochromic layer, wherein: the interlayer has a moisture content of at most 0.05 wt %; and the process further comprises forming a barrier layer that extends at least partly through the second transparent conductive layer and is disposed between the second transparent conductive layer and the interlayer, wherein joining the first and second substrates is performed after forming the barrier layer. 9. The process of claim 8 , wherein after forming the second transparent conductive layer and before joining the first and second substrates, a void or a passageway extends at least through the second transparent conductive layer. 10. The process of claim 8 , wherein forming an electrochromic stack comprises: depositing a layer of the electrochromic stack over the particle, wherein the particle has been detected over the substrate. 11. The process of claim 10 , wherein the first transparent conductive layer is exposed along a portion of the passageway. 12. The process of claim 8 , wherein forming the barrier layer is performed such that a portion of the barrier layer is formed within or seals off the passageway. 13. The process of claim 8 , further comprising an electrochromic stack, wherein the electrochromic stack comprises: a first electrode layer that includes the electrochromic layer or an ion storage layer; an ion conductor layer; a second electrode layer that includes the other of the electrochromic layer or the ion storage layer, wherein: the ion conductor layer is disposed between the first and second electrode layers; the first transparent conductor layer is closer to the first electrode than to the second electrode; and the second transparent conductor layer is closer to the second electrode than to the first electrode. 14. The process of claim 8 , wherein the interlayer contacts the first transparent conductive layer. 15. The process of claim 8 , wherein the interlayer does not contact the first transparent conductor layer or the electrochromic layer. 16. The process of claim 15 , wherein the barrier layer includes an oxide, a nitride, or an oxynitride. 17. The process of claim 15 , wherein the barrier layer includes alternating films of an inorganic material and an organic material.
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