Cut resistant fabric

US11560648B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11560648-B2
Application numberUS-202117249543-A
CountryUS
Kind codeB2
Filing dateMar 4, 2021
Priority dateFeb 3, 2021
Publication dateJan 24, 2023
Grant dateJan 24, 2023

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  1. Title

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  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A cut resistant fabric and a method of manufacturing a cut resistant fiber is disclosed herein. The fabric comprises a Ultra High Molecular Weight Polyethylene (UHMWPE) material and a sheet shaped wollastonite filler. The sheet shaped wollastonite filler is treated with a coupling agent and mixed with the UHMWPE material. A thickness of the sheet shaped wollastonite filler is less than 10 micrometers (μm). The method comprises providing the sheet shaped wollastonite filler having a thickness of less than 10 μm and treating the sheet shaped wollastonite filler with a coupling agent at a first predefined temperature to obtain a uniform solution. The method further comprises mixing the uniform solution with a fiber solution comprising UHMWPE resin at a second predefined temperature.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for preparing a cut resistant fiber, comprising: providing a sheet shaped wollastonite filler having a thickness of less than 10 micrometers (μm); treating the sheet shaped wollastonite filler with a coupling agent at a first predefined temperature to obtain a uniform solution; and mixing the uniform solution with a fiber solution comprising Ultra-High Molecular Weight Polyethylene (UHMWPE) resin at a second predefined temperature. 2. The method of claim 1 , wherein obtaining the uniform solution comprises: mixing a dispersing agent with the sheet shaped wollastonite filler to obtain a mixture of the disperse agent and the sheet shaped wollastonite filler; and adding the mixture of the dispersing agent and the sheet shaped wollastonite filler to a white oil, wherein the white oil is a fiber spinning solvent. 3. The method of claim 1 , wherein the sheet shaped wollastonite filler has a length less than 100 μm, and a width less than 50 μm. 4. The method of claim 1 , wherein the first predefined temperature is 80° Celsius (C) and the second predefined temperature is 140° C. 5. The method of claim 1 , wherein the coupling agent comprises at least one of gamma-Aminopropyltriethoxysilane (KH550), and polyorganosiloxane (Penta-1006).

Assignees

Inventors

Classifications

  • Silicon-containing compounds · CPC title

  • high-strength or high-molecular-weight polyethylene, e.g. ultra-high molecular weight polyethylene [UHMWPE] · CPC title

  • Gloves · CPC title

  • D03D1/0041Primary

    Cut or abrasion resistant · CPC title

  • with silicon-containing compounds · CPC title

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Frequently asked questions

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What does patent US11560648B2 cover?
A cut resistant fabric and a method of manufacturing a cut resistant fiber is disclosed herein. The fabric comprises a Ultra High Molecular Weight Polyethylene (UHMWPE) material and a sheet shaped wollastonite filler. The sheet shaped wollastonite filler is treated with a coupling agent and mixed with the UHMWPE material. A thickness of the sheet shaped wollastonite filler is less than 10 micro…
Who is the assignee on this patent?
Honeywell Int Inc
What technology area does this patent fall under?
Primary CPC classification D03D1/0041. Mapped technology areas include Textiles & Paper.
When was this patent published?
Publication date Tue Jan 24 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).