Gravitational method for assembling particles

Patent metadata

Field	Value
Publication number	US-11559825-B2
Application number	US-201816753637-A
Country	US
Kind code	B2
Filing date	Oct 5, 2018
Priority date	Oct 5, 2017
Publication date	Jan 24, 2023
Grant date	Jan 24, 2023

Abstract

A method for assembling particles on a microstructured surface of a sample. The method includes a step of covering the surface of the sample with a colloidal suspension with a so-called covering temperature range. The method includes a step of sedimentation of particles contained in the colloidal suspension such that particles settle towards the surface of the sample, the sedimentation step being carried out within a so-called sedimentation temperature range.

First claim

The invention claimed is:

1. A method for assembling particles on a microstructured surface of a sample, said method comprising:
a step of covering the surface of the sample with a colloidal suspension, the covering step being carried out within a temperature range called covering temperature range;
a step of sedimentation of particles contained in the colloidal suspension so that particles sediment in the direction of the surface of the sample and at least a portion of the sedimenting particles enter at least partially into the microstructured surface, the sedimentation step being carried out within a temperature range called sedimentation temperature range; and
a condensation step of expelling the air bubbles from the microstructures by dissolving the bubbles in water and condensing the aerated water from the air bubbles, the condensation step is implemented prior to and/or, at least partially, simultaneously with the sedimentation step, a lower limit of the sedimentation temperature range is greater than an upper limit of a condensation temperature range.

2. The method according to claim 1 , wherein said condensation step is implemented:
subsequently to the covering step; and
prior to and/or concomitantly with the sedimentation step,

the condensation step being carried out within a temperature range called condensation temperature range, an upper limit of the condensation temperature range being less than a lower limit of the covering temperature range.

3. The method according to claim 2 , in which the condensation step is implemented prior to the sedimentation step and in which a lower limit of the sedimentation temperature range is greater than an upper limit of the condensation temperature range.

4. The method according to claim 2 , in which the lower limit of the condensation temperature range is less than 20° C.

5. The method according to claim 1 , comprising a step of trapping particles in the microstructures of the sample, the trapping step being carried out:
concomitantly with or subsequently to the sedimentation step, and
within a temperature range called trapping temperature range.

6. The method according to claim 5 , in which a lower limit of the trapping temperature range being greater than an upper limit of the covering temperature range.

7. The method according to claim 5 , in which the trapping step is implemented subsequently to the sedimentation step and in which a lower limit of the trapping temperature range is greater than an upper limit of the sedimentation temperature range.

8. The method according to claim 5 , in which the lower limit of the trapping temperature range is greater than 25° C.

9. The method according to claim 1 , comprising a step of removing the colloidal suspension from the microstructured surface of the sample, according to a movement that is substantially tangential with respect to said microstructured surface, so as to remove an excess of particles present on the surface of the sample, the removal step being implemented subsequently to the sedimentation step and/or the trapping step.

10. The method according to claim 9 , in which, during the step of removing the colloidal suspension, a receding contact angle formed between the colloidal suspension and the microstructured surface of the sample is comprised between 10° and 80°.

11. The method according to claim 9 , in which a linear velocity of removal of the colloidal suspension is comprised between 0.05 and 50 cm/min.

12. The method according to claim 1 , in which the covering step is carried out using a suspension a dispersing phase of which comprises:
at least partly water.

13. The method according to claim 12 , in which the covering step is carried out using a suspension the dispersing phase of which comprises a mixture of solvents.

14. The method according to claim 1 , in which the sedimentation step is carried out using a colloidal suspension under a sedimentation regime, the effects of gravitation on at least a portion of the particles contained in the colloidal suspension being greater than the thermal agitation effects on said at least a portion of the particles contained in the colloidal suspension.

15. The method according to claim 1 , in which a size distribution of the particles contained in the colloidal suspension is such that a maximum Feret diameter D fm of each particle contained in the colloidal suspension is such that:

D
fm

≥

2.5
⁢

⁢

10

-
3

⁢

(

k
B

⁢
T
⁢

⁢

μ
2

πρΔ
ρ
2

⁢

g
2

)

1
⁢

/

⁢
7

,

with
k B : the Boltzmann constant,
T: a temperature of the particles contained in the suspension corresponding to the lower limit of the sedimentation temperature range,
μ: dynamic viscosity of the dispersing phase at the temperature T,
Δρ: difference between a mass density of the particles contained in the colloidal suspension and a mass density of the dispersing phase,
ρ: mass density of the dispersed phase at the temperature T, and
g: the gravitational constant.

16. The method according to claim 1 , in which a size distribution of the particles contained in the colloidal suspension can be such that:
a maximum Feret diameter D fm of each particle contained in the colloidal suspension is greater than 100 nm, and/or
a maximum Feret diameter D fm of each particle contained in the colloidal suspension is less than 100 μm.

17. The method according to claim 1 , in which at least a portion of the steps are implemented in a microfluidic device comprising, a chamber arranged to receive the colloidal suspension, one of the walls of which comprises, at least partially, the microstructured surface of the sample.

18. The method according to claim 1 , in which the step of covering the surface of the microstructured sample with the colloidal suspension is carried out by introducing the colloidal

Assignees

• Centre Nat Rech Scient
• Univ Grenoble Alpes
• Smart Force Tech

Inventors

• Peyrade David
• Leonard Anthony
• Cordeiro Julien
• LECARME Olivier

Classifications

• B05D1/18 Primary

  performed by dipping · CPC title

• B05D1/00

  Processes for applying liquids or other fluent materials (B05D5/00, B05D7/00 take precedence) · CPC title

• B05D2401/32

  applied as powders · CPC title