Apparatus for treating substrate

Patent metadata

Field	Value
Publication number	US-11557477-B2
Application number	US-202016896535-A
Country	US
Kind code	B2
Filing date	Jun 9, 2020
Priority date	Jun 10, 2019
Publication date	Jan 17, 2023
Grant date	Jan 17, 2023

Abstract

An apparatus for treating a substrate includes a heat treatment chamber having an interior space, a housing that is provided in the interior space and that has a treatment space therein, a gas supply line that supplies, into the treatment space, a hydrophobic gas for hydrophobicizing the substrate, and a decomposition unit that decomposes an alkaline gas leaking from the treatment space to the interior space.

First claim

What is claimed is:

1. An apparatus for treating a substrate, the apparatus comprising:
a heat treatment chamber having an interior space;
a housing provided in the interior space, the housing having a treatment space therein;
a gas supply line configured to supply, into the treatment space, a hydrophobic gas for hydrophobicizing the substrate; and
a decomposition unit configured to decompose an alkaline gas leaking from the treatment space to the interior space,
wherein the housing includes,
a body having an open top side, and
a cover configured to cover the open top side of the body,

wherein the body and the cover are combined with each other to form the treatment space, and
wherein the cover vertically moves to open or close the treatment space.

2. The apparatus of claim 1 , wherein the heat treatment chamber has an entrance/exit opening through which the substrate enters or exits the heat treatment chamber, and
wherein the apparatus further comprises a door configured to open or close the entrance/exit opening.

3. The apparatus of claim 1 , wherein the decomposition unit includes a photo-catalyst.

4. The apparatus of claim 3 , wherein the photo-catalyst is provided in a film form and is configured to surround the housing.

5. The apparatus of claim 3 , wherein the photo-catalyst has a bar shape.

6. The apparatus of claim 5 , wherein the decomposition unit further includes an irradiation member configured to irradiate light to the photo-catalyst.

7. The apparatus of claim 6 , wherein the irradiation member is provided on an inner wall of the heat treatment chamber and the photo-catalyst is provided on one surface of the irradiation member.

8. The apparatus of claim 3 , wherein the photo-catalyst is disposed on a path along which the alkaline gas leaks from the treatment space to the interior space.

9. The apparatus of claim 3 , wherein the photo-catalyst is provided on an inner wall of the heat treatment chamber.

10. The apparatus of claim 9 , wherein the photo-catalyst has a shape surrounding an entrance/exit opening.

11. The apparatus of claim 3 , wherein the photo-catalyst contains titanium dioxide (TiO 2 ).

12. The apparatus of claim 1 , wherein the alkaline gas is ammonia gas.

13. An apparatus for treating a substrate, the apparatus comprising:
a heat treatment chamber having an interior space;
a housing provided in the interior space, the housing having a treatment space therein;
a gas supply line configured to supply, into the treatment space, a hydrophobic gas for hydrophobizing the substrate, and
a decomposition unit configured to decompose an alkaline gas leaking from the treatment space to the interior space,
wherein the decomposition unit includes a photo-catalyst, and
wherein the photo-catalyst has a ring shape.

14. The apparatus of claim 13 , wherein the photo-catalyst is coupled to a support member.

15. The apparatus of claim 14 , wherein the photo-catalyst is provided so as to be detachable from the support member.

16. An apparatus for treating a substrate, the apparatus comprising:
a heat treatment chamber having an interior space;
a housing provided in the interior space, the housing having a treatment space therein;
a gas supply line configured to supply, into the treatment space, a hydrophobic gas for hydrophobicizing the substrate; and
a decomposition unit configured to decompose an alkaline gas leaking from the treatment space to the interior space,
wherein the decomposition unit includes a photo-catalyst, and
wherein the photo-catalyst has a cylindrical shape that is open at a top and a bottom.

17. The apparatus of claim 16 , wherein the photo-catalyst has a lager radius than the housing.

Assignees

• Semes Co Ltd

Inventors

• Park Min Jung
• Seo Kyungjin
• Jung Younghun

Classifications

• H10P72/0436

  mainly by radiation · CPC title

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P76/405 Primary

  characterised by their composition, e.g. multilayer masks · CPC title

• G03F7/38

  Treatment before imagewise removal, e.g. prebaking {(G03F7/265 takes precedence)} · CPC title

• G03F7/20

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title