Sample analyzer and analyzing method thereof

US11555779B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11555779-B2
Application numberUS-202016842487-A
CountryUS
Kind codeB2
Filing dateApr 7, 2020
Priority dateApr 9, 2019
Publication dateJan 17, 2023
Grant dateJan 17, 2023

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present disclosure provides a sample analyzer and an analyzing method thereof. The sample analyzer includes a first beam source configured to provide a first energy beam to a sample, a second beam source configured to provide a second energy beam, which is different from the first energy beam, to the sample, a reflected beam sensor disposed between the second beam source and the sample to detect a reflected beam of the second energy beam, which is reflected by one side of the sample, and a transmitted beam sensor disposed adjacent to the other side of the sample to detect a transmitted beam of the second energy beam.

First claim

Opening claim text (preview).

What is claimed is: 1. A sample analyzer comprising: a first beam source configured to provide a first energy beam to a sample; a second beam source configured to provide a second energy beam, which is different from the first energy beam, to the sample; a reflected beam sensor disposed between the second beam source and the sample to detect a reflected beam of the second energy beam, which is reflected by one side of the sample; and a transmitted beam sensor disposed adjacent to the other side of the sample to detect a transmitted beam of the second energy beam, wherein the transmitted beam sensor comprises a radiation sensor, an electron sensor disposed between the sample and the radiation sensor, and a proton sensor disposed between the sample and the electron sensor. 2. The sample analyzer of claim 1 , wherein the second beam source is a multi-energy beam generator. 3. The sample analyzer of claim 2 , wherein the second energy beam is a multi-energy beam comprising an ultraviolet ray, an ion particle, a proton, an electron, and a radiation. 4. The sample analyzer of claim 1 , wherein the transmitted beam sensor further comprises an ion sensor disposed between the sample and the proton sensor.

Assignees

Inventors

Classifications

  • Investigating crystals, e.g. liquid crystals · CPC title

  • using heat to ionise a gas · CPC title

  • A physical transformation being implied in the method, e.g. a phase change · CPC title

  • Coherent sources; lasers · CPC title

  • G01N21/55Primary

    Specular reflectivity · CPC title

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Frequently asked questions

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What does patent US11555779B2 cover?
The present disclosure provides a sample analyzer and an analyzing method thereof. The sample analyzer includes a first beam source configured to provide a first energy beam to a sample, a second beam source configured to provide a second energy beam, which is different from the first energy beam, to the sample, a reflected beam sensor disposed between the second beam source and the sample to d…
Who is the assignee on this patent?
Electronics & Telecommunications Res Inst
What technology area does this patent fall under?
Primary CPC classification G01N21/55. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jan 17 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).