Object in a lithographic apparatus

Patent metadata

Field	Value
Publication number	US-11550234-B2
Application number	US-201917279133-A
Country	US
Kind code	B2
Filing date	Sep 25, 2019
Priority date	Oct 1, 2018
Publication date	Jan 10, 2023
Grant date	Jan 10, 2023

Abstract

An object, such as a sensor for an immersion lithographic apparatus, has an outer layer which comes in contact with immersion liquid and wherein the outer layer has a composition including a rare earth element. There is also provided an immersion lithographic apparatus having such an object and a method for manufacturing such an object.

First claim

The invention claimed is:

1. An immersion lithographic apparatus comprising:
an object, the object comprising:
a substrate and an outer layer,
wherein the outer layer has a composition comprising a rare earth element and an inorganic and/or organosilicon polymer, the composition, in use, coming in direct contact with immersion liquid of the immersion lithographic apparatus.

2. The immersion lithographic apparatus of claim 1 , wherein the polymer has a Si—O—Si—O backbone.

3. The immersion lithographic apparatus of claim 1 , wherein the polymer has one or more selected from: methyl, ethyl, propyl, phenyl, vinyl.

4. The immersion lithographic apparatus of claim 1 , wherein the rare earth element is at least partially oxidized, nitridized, borodized, carbonized or silicized.

5. The immersion lithographic apparatus of claim 1 , wherein the object further comprises an intermediate layer between the substrate and the outer layer.

6. The immersion lithographic apparatus of claim 5 , wherein the intermediate layer comprises one or more selected from: SiO 2 , SiO 2 -x.

7. The immersion lithographic apparatus of claim 1 , wherein the outer layer has a concentration gradient of rare earth element through the layer thickness which increases as a distance from the substrate increases.

8. The immersion lithographic apparatus of claim 1 , wherein the rare earth element is present in an outer surface of the outer layer at the concentration (atomic percent) of 0.1 atomic % to 50 atomic %.

9. The immersion lithographic apparatus of claim 1 , wherein the object comprises at least one patterned layer, comprising a pattern of through holes and/or steps formed therein, formed on the substrate and wherein the outer layer is formed over at least part of the patterned layer.

10. The immersion lithographic apparatus of claim 1 , wherein the object further comprises a radiation blocking layer formed on the substrate under the outer layer.

11. The immersion lithographic apparatus of claim 10 , wherein the radiation blocking layer comprises TiN.

12. The immersion lithographic apparatus of claim 1 , wherein the outer layer is transmissive to deep ultraviolet radiation, with a transmission of the outer layer being at least 50%.

13. The immersion lithographic apparatus of claim 1 , wherein the object is a sensor.

14. The immersion lithographic apparatus of claim 1 , wherein the rare earth element is one or more selected from: cerium (Ce), lanthanum (La), yttrium(Y), dysprosium (Dy), erbium (Er), holmium (Ho), samarium (Sm), thulium (Tm).

15. An object for a lithographic apparatus, the object comprising:
a substrate and an outer layer,
wherein water makes a receding contact angle of at least 75° with the outer layer, and
wherein the outer layer has a composition comprising a rare earth element, the composition, in use, coming in direct contact with the water.

16. The object of claim 15 , wherein the composition further comprises an inorganic and/or organosilicon polymer.

17. The object of claim 15 , wherein the rare earth element is at least partially oxidized, nitridized, borodized, carbonized or silicized.

18. A method of coating a substrate, the method comprising:
providing a substrate; and
depositing on the substrate an outer layer which has a composition comprising a rare earth element by at least one selected from:
(a) sputtering, wherein at least one sputtering target material comprises the rare earth element,
(b) PVD and/or CVD and/or ALD, wherein a precursor gas and/or a reactive gas comprises the rare earth element,
(c) plasma induced (co)polymerization, and/or
(d) ion implantation, where an ion source is a metal vapor arc source, and the vapor at least partly comprises the rare earth element,
wherein the composition, in use, comes in direct contact with liquid and water is able to make a receding contact angle of at least 75° with the outer layer.

19. The method of claim 18 , wherein the deposition of the composition comprising the rare earth element is preceded or alternates with deposition of either: (a) an inorganic/organosilicon polymer or (b) SiO 2 or SiO 2-x , such that the composition comprises the polymer or SiO 2 .

20. A method of coating a substrate, the method comprising:
providing a substrate;
exposing the substrate to an oxidising atmosphere containing a compound of a rare earth element in volatile form and an inorganic/organosilicon polymer precursor so as to deposit an outer layer on the substrate, which comprises co-polymerized and/or covalently bonded inorganic monomer and a rare earth element.

Assignees

• Asml Netherlands Bv

Inventors

• Nikipelov Andrey
• Beckers Johan Franciscus Maria

Classifications

• C23C14/08

  Oxides (C23C14/10 takes precedence) · CPC title

• C23C16/401

  containing silicon · CPC title

• G03F7/7085

  Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title

• C23C28/00

  Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D · CPC title

• G03F7/7095 Primary

  Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient · CPC title