Precursor supply cabinet

US11549702B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11549702-B2
Application numberUS-202017605602-A
CountryUS
Kind codeB2
Filing dateApr 24, 2020
Priority dateApr 25, 2019
Publication dateJan 10, 2023
Grant dateJan 10, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A precursor supply cabinet for accommodating one or more precursor containers having cabinet walls defining an inner cabinet space. The precursor supply cabinet includes a ventilation discharge connection arranged to discharge ventilation gas from the inner cabinet space, one or more ventilation inlet connections, two or more separate gas tight precursor supply chambers for accommodating precursor containers. The gas tight precursor supply chambers are arranged inside the inner cabinet space of the precursor supply cabinet such that the inner cabinet space of the precursor supply cabinet surrounding the separate gas tight precursor supply chambers is ventilated.

First claim

Opening claim text (preview).

The invention claimed is: 1. A precursor supply cabinet for accommodating one or more precursor containers, the precursor supply cabinet having cabinet walls defining an inner cabinet space, wherein the precursor supply cabinet comprises: a ventilation discharge connection arranged to discharge ventilation gas from the inner cabinet space of the precursor supply cabinet; one or more ventilation inlet connections arranged to provide ventilation gas into the inner cabinet space of the precursor supply cabinet; two or more separate gas tight precursor supply chambers for accommodating precursor containers, the two or more gas tight precursor supply chambers being arranged inside the inner cabinet space of the precursor supply cabinet such that the inner cabinet space of the precursor supply cabinet surrounding the two or more separate gas tight precursor supply chambers is ventilated, the two or more separate gas tight precursor supply chambers arranged spaced apart from each other inside the inner cabinet space of the precursor supply cabinet such that one or more flow gaps (A, B) is provided between the two or more separate gas tight precursor supply chambers, wherein: the two or more separate gas tight precursor supply chambers comprises a chamber door aligned with the one or more cabinet doors; or the two or more separate gas tight precursor supply chambers are arranged aligned with the one or more cabinet doors; or each of the two or more separate gas tight precursor supply chambers comprises a chamber door and the precursor supply cabinet comprises a respective separate cabinet door opposite each the two or more separate gas tight precursor supply chambers; or the precursor supply cabinet comprises a separate cabinet door opposite each the two or more separate gas tight precursor supply chambers such that each separate cabinet door is aligned with a respective separate gas tight precursor supply chamber. 2. The precursor supply cabinet according to claim 1 , wherein the precursor supply cabinet comprises two or more separate gas tight precursor supply chambers, and that: at least two of the two or more separate gas tight precursor supply chambers are arranged adjacent to each other inside the inner cabinet space of the precursor supply cabinet, and at a first distance from each other such that a first flow gap (A) is formed between the adjacent gas tight precursor supply chambers; or at least two of the two or more separate gas tight precursor supply chambers are arranged one on top of the other inside the inner cabinet space of the precursor supply cabinet, and at a second distance from each other such that a second flow gap (B) is formed between the adjacent gas tight precursor supply chambers; or at least two of the two or more separate gas tight precursor supply chambers are arranged adjacent to each other inside the inner cabinet space of the precursor supply cabinet, and at a first distance from each other such that a first flow gap (A) is formed between the adjacent gas tight precursor supply chambers, and at least two of the two or more separate gas tight precursor supply chambers are arranged one on top of the other inside the inner cabinet space of the precursor supply cabinet, and at a second distance from each other such that a second flow gap (B) is formed between the adjacent gas tight precursor supply chambers. 3. The precursor supply cabinet according to claim 1 , wherein: the two or more separate gas tight precursor supply chambers are arranged spaced apart from the cabinet walls inside the inner cabinet space of the precursor supply cabinet such that flow gaps (C, D, E, F, G, H) are provided between the two or more separate gas tight precursor supply chambers and the cabinet walls. 4. The precursor supply cabinet according to claim 1 , wherein the ventilation discharge connection comprises: a ventilation outlet provided to the cabinet walls and open to the inner cabinet space of the precursor supply cabinet; and a suction device connected to the ventilation outlet and arranged to discharge ventilation gas from the inner cabinet space of the precursor supply cabinet via the ventilation outlet. 5. The precursor supply cabinet according to claim 4 , wherein the precursor supply cabinet comprises a top cabinet wall and the ventilation outlet is provided to the top cabinet wall. 6. The precursor supply cabinet according to claim 1 , wherein the one or more ventilation inlet connections comprises a ventilation inlet open to the inner cabinet space of the precursor supply cabinet and arranged to provide ventilation gas into the inner cabinet space of the precursor supply cabinet. 7. The precursor supply cabinet according to claim 1 , wherein the one or more ventilation inlet connections comprises a regulator element provided to the ventilation inlet and arranged to adjust the ventilation inlet for adjusting the ventilation gas flow into the inner cabinet space of the precursor supply cabinet via the ventilation inlet. 8. The precursor supply cabinet according to claim 1 , wherein: the precursor supply cabinet comprises one or more cabinet doors, and the one or more ventilation inlet connections are arranged to the one or more cabinet doors. 9. The precursor supply cabinet according to claim 1 , wherein the precursor supply cabinet comprises a gas tight lead-through connection extending inside the inner cabinet space of the precursor supply cabinet between the precursor supply chamber and the cabinet walls of the precursor supply cabinet. 10. The precursor supply cabinet according to claim 9 , wherein the separate gas tight precursor supply chamber is arranged spaced apart from one cabinet wall inside the inner cabinet space of the precursor supply cabinet such that the flow gap (H) is provided between the separate gas tight precursor supply chamber and the one cabinet wall, and the gas tight lead-through connection is arranged to extend inside the inner cabinet space of the precursor supply cabinet between the precursor supply chamber and the one cabinet wall across the flow gap (H) between the separate gas tight precursor supply chamber and the one cabinet wall. 11. The precursor supply cabinet according to claim 1 , wherein: at least one of the flow gaps (A, B, C, D, E, F, G, H) comprises a flow guide for adjusting ventilation gas flow; or at least one of the flow gaps (A, B) between the two or more separate gas tight precursor supply chambers comprises a flow guide for adjusting ventilation gas flow between the two or more separate gas tight precursor supply chambers; or at least one of the flow gaps (C, D, E, F, G, H) between the one or more separate gas tight precursor supply chambers and the cabinet walls comprises a flow guide for adjusting ventilation gas flow between the one or more separate gas tight precursor supply chambers and the cabinet walls; or at least one of the flow gaps (A, B) between the two or more separate gas tight precursor supply chambers comprises a flow guide for adjusting ventilation gas flow between the two or more separate gas tight precursor supply chambers and at least one of the flow gaps (C, D, E, F, G, H) between the one or more separate gas tight precursor supply chambers and the cabinet walls comprises a flow guide for adjusting ventilation gas flow between the one or more separate gas tight precursor supply chambers and the cabinet walls. 12. The precursor supply cabinet according to claim 1 , wherein the precursor supply cabinet comprises a gas panel box provided outside the inner cabinet space, the gas panel box comprises: panel box walls defining a panel box inner space; gas connections provided inside the p

Assignees

Inventors

Classifications

  • F24F7/007Primary

    with forced flow (using ducting systems F24F7/06) · CPC title

  • Boxes · CPC title

  • Gas plumbing upstream of the reaction chamber · CPC title

  • Semiconductors · CPC title

  • Details of vessels or of the filling or discharging of vessels · CPC title

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Frequently asked questions

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What does patent US11549702B2 cover?
A precursor supply cabinet for accommodating one or more precursor containers having cabinet walls defining an inner cabinet space. The precursor supply cabinet includes a ventilation discharge connection arranged to discharge ventilation gas from the inner cabinet space, one or more ventilation inlet connections, two or more separate gas tight precursor supply chambers for accommodating precur…
Who is the assignee on this patent?
Beneq Oy
What technology area does this patent fall under?
Primary CPC classification F24F7/007. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Jan 10 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).