Cleaning liquid composition and method for cleaning polymerization apparatus using same

US11549084B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11549084-B2
Application numberUS-201816638848-A
CountryUS
Kind codeB2
Filing dateAug 29, 2018
Priority dateOct 31, 2017
Publication dateJan 10, 2023
Grant dateJan 10, 2023

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Abstract

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A cleaning liquid composition is provided. More particularly, a cleaning liquid composition includes a transition metal compound represented by Chemical Formula 1 (see the detailed description of the present invention); and a hydrocarbon-based solvent, and a cleaning method of a polymerization apparatus using the same.

First claim

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The invention claimed is: 1. A cleaning liquid composition comprising: a transition metal compound represented by Chemical Formula 1 below; and a hydrocarbon-based solvent, wherein the hydrocarbon-based solvent is an aliphatic hydrocarbon solvent, an aromatic hydrocarbon solvent or a combination thereof: in Chemical Formula 1, M is ruthenium or osmium, R 1 and R 2 are each independently a hydrogen atom or a substituent represented by Chemical Formula 2 below, at least one of R 1 or R 2 is a substituent represented by Chemical Formula 2 below, X 1 and X 2 are each independently a halogen atom, and Ph is a phenyl group, in Chemical Formula 2, R 3 and R 4 are each independently a C1-C10 alkyl group; or R 3 and R 4 are linked with each other to form a saturated or unsaturated 5-membered ring, wherein the cleaning liquid composition comprises at least one first aromatic vinyl-based monomer and at least one or more vinyl-based monomers selected from the group consisting of a C2-C10 olefin monomer, a conjugated diene-based monomer, and a second aromatic vinyl-based monomer. 2. The cleaning liquid composition of claim 1 , wherein M is ruthenium or osmium, R 1 and R 2 are each independently the substituent represented by Chemical Formula 2, and X 1 and X 2 are Cl or Br, and R 3 and R 4 are each independently a C1-C5 alkyl group; or R 3 and R 4 are linked with each other to form a saturated or unsaturated 5-membered ring. 3. The cleaning liquid composition of claim 1 , wherein M is ruthenium, R 1 and R 2 are each independently the substituent represented by Chemical Formula 2, and X 1 and X 2 are Cl, and R 3 and R 4 are linked with each other to form a saturated or unsaturated 5-membered ring. 4. The cleaning liquid composition of claim 1 , wherein the transition metal compound represented by Chemical Formula 1 is a transition metal compound represented by Chemical Formula 3 below: in Chemical Formula 3, M is ruthenium or osmium, R 1 and R 2 are each independently a hydrogen atom or a substituent represented by Chemical Formula 2 below, at least one of R 1 or R 2 is a substituent represented by Chemical Formula 2 below, and Ph is a phenyl group, in Chemical Formula 2, R 3 and R 4 are each independently a C1-C10 alkyl group; or R 3 and R 4 are linked with each other to form a saturated or unsaturated 5-membered ring. 5. The cleaning liquid composition of claim 4 , wherein the transition metal compound represented by Chemical Formula 3 is one of transition metal compounds represented by Chemical Formulas 3-1 to 3-8 below: in Chemical Formulas 3-1 to 3-8, M is ruthenium, Ph is a phenyl group, Me is a methyl group, Et is an ethyl group, Pr is a propyl group, and Bu is a butyl group. 6. The cleaning liquid composition of claim 1 , wherein the cleaning liquid composition includes two or more of the transition metal compounds represented by Chemical Formula 1. 7. The cleaning liquid composition of claim 1 , wherein the hydrocarbon-based solvent is an aromatic hydrocarbon solvent. 8. The cleaning liquid composition of claim 1 , wherein an amount of the transition metal compound represented by Chemical Formula 1 is 0.1% by weight to 10% by weight based on a total amount of the cleaning liquid composition. 9. A cleaning method of a polymerization apparatus comprising: swelling a diene-based polymer in a polymerization apparatus with a hydrocarbon-based solvent; and adding and stirring the cleaning liquid composition of claim 1 in the presence of the diene-based polymer), thereby oligomerizing the diene-based polymer. 10. The cleaning method of claim 9 , wherein the diene-based polymer is one selected from the group consisting of a butadiene rubber, an isoprene rubber, a styrene-butadiene rubber, and a styrene-butadiene-styrene block copolymer. 11. The cleaning method of claim 9 , wherein the swelling is performed at 50° C. to 100° C. 12. The cleaning method of claim 9 , wherein the stirring is performed for 1 to 24 hours.

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What does patent US11549084B2 cover?
A cleaning liquid composition is provided. More particularly, a cleaning liquid composition includes a transition metal compound represented by Chemical Formula 1 (see the detailed description of the present invention); and a hydrocarbon-based solvent, and a cleaning method of a polymerization apparatus using the same.
Who is the assignee on this patent?
Lg Chemical Ltd
What technology area does this patent fall under?
Primary CPC classification C11D7/3281. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 10 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).