Active ester resin and composition and cured product using the same

US11548977B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11548977-B2
Application numberUS-201816623456-A
CountryUS
Kind codeB2
Filing dateApr 24, 2018
Priority dateJun 21, 2017
Publication dateJan 10, 2023
Grant dateJan 10, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention aims to provide a means by which a cured product to be obtained has a low dielectric loss tangent and higher heat resistance. Specifically, provided is an active ester resin that is a reaction product of a first aromatic compound having two or more phenolic hydroxy groups, a second aromatic compound having a phenolic hydroxy group, and a third aromatic compound having two or more carboxy groups and/or an acid halide thereof or an esterified compound thereof, in which at least one of the first aromatic compound, the second aromatic compound, and the third aromatic compound and/or the acid halide thereof or the esterified compound thereof has an unsaturated bond-containing substituent.

First claim

Opening claim text (preview).

The invention claimed is: 1. An active ester resin that is a reaction product of: a first aromatic compound having two or more phenolic hydroxy groups; a second aromatic compound having only one phenolic hydroxy group; and a third aromatic compound having two or more carboxy groups and/or an acid halide thereof or an esterified compound thereof, wherein at least one of the first aromatic compound, the second aromatic compound, and the third aromatic compound and/or the acid halide thereof or the esterified compound thereof has an unsaturated bond-containing substituent, wherein at least the second aromatic compound has an unsaturated bond-containing substituent, and wherein the unsaturated bond-containing substituent is an alkenyl or alkynyl group of 2 to 30 carbon atoms. 2. The active ester resin according to claim 1 , wherein the first aromatic compound is represented by chemical formula (1): wherein, in chemical formula (1), each Ar 1 is independently a substituted or unsubstituted first aromatic ring group, each Ar 2 is independently a substituted or unsubstituted second aromatic ring group, each X is independently an oxygen atom, a sulfur atom, a substituted or unsubstituted alkylene, a substituted or unsubstituted cycloalkylene, or a substituted or unsubstituted aralkylene, and n is 0 to 10, wherein at least two hydrogen atoms of Ar 1 and Ar 2 are replaced with hydroxy groups. 3. The active ester resin according to claim 2 , wherein each X is a substituted or unsubstituted cycloalkylene having 3 to 20 carbon atoms or a substituted or unsubstituted aralkylene having 8 to 20 carbon atoms. 4. The active ester resin according to claim 1 , wherein the second aromatic compound is a fused ring aromatic compound. 5. A composition, comprising the active ester resin according to claim 1 and an epoxy resin. 6. A cured product obtained by curing the composition according to claim 5 . 7. A printed circuit board obtained using the composition according to claim 5 . 8. A semiconductor sealing material obtained using the composition according to claim 5 . 9. A build-up film obtained using the composition according to claim 5 . 10. A cured product obtained by curing the active ester resin according to claim 1 .

Assignees

Inventors

Classifications

  • Polyesters · CPC title

  • C08G63/19Primary

    Hydroxy compounds containing aromatic rings · CPC title

  • Hydroxy compounds containing aromatic rings · CPC title

  • aromatic · CPC title

  • containing two or more aromatic rings · CPC title

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Frequently asked questions

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What does patent US11548977B2 cover?
The present invention aims to provide a means by which a cured product to be obtained has a low dielectric loss tangent and higher heat resistance. Specifically, provided is an active ester resin that is a reaction product of a first aromatic compound having two or more phenolic hydroxy groups, a second aromatic compound having a phenolic hydroxy group, and a third aromatic compound having two …
Who is the assignee on this patent?
Dainippon Ink & Chemicals
What technology area does this patent fall under?
Primary CPC classification C08G63/19. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 10 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).