Multilayered graphene and methods of making the same

US11545309B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11545309-B2
Application numberUS-202117169655-A
CountryUS
Kind codeB2
Filing dateFeb 8, 2021
Priority dateSep 6, 2017
Publication dateJan 3, 2023
Grant dateJan 3, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

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The present invention relates in part to a method of fabricating graphene structures from graphene oxide by reducing the graphene oxide on a patterned substrate. The invention also relates in part to graphene structures produced using said method and electrodes and capacitors comprising said graphene structures.

First claim

Opening claim text (preview).

We claim: 1. A method of fabricating graphene, the method comprising: providing a patterned transparent substrate, said patterned substrate comprising structures, protrusions or indentations; depositing graphene oxide on the patterned substrate; and reducing the graphene oxide to graphene. 2. The method of claim 1 , wherein the patterned substrate comprises one or more plastic materials. 3. The method of claim 1 , wherein the patterned substrate comprises structures having a shape selected from cylinders, triangle-based pyramids, square-based pyramids, half spheres, rectangular prisms, triangular prisms, pentagonal prisms, hexagonal prisms, cones, and combinations thereof. 4. The method of claim 1 , wherein the patterned has structures and the width of the structures is between 10 nm and 5 μm. 5. The method of claim 1 , wherein the patterned substrate has structures and the distance between the structures is between 50 nm and 500 nm. 6. The method of claim 1 , wherein the patterned substrate has structures and the distance between the structures is between 0.1 μm and 10 μm. 7. The method of claim 1 , further comprising the step of ultrasonicating the graphene oxide prior to deposition. 8. The method of claim 1 , wherein the step of depositing graphene oxide comprises a technique selected from the group containing spin coating, drop casting, pad printing, doctor blading, casting, screen printing, ink-jet printing, roll coating, and brush coating. 9. The method of claim 1 , wherein the step of reducing the graphene oxide to graphene comprises treating the graphene oxide with a high intensity light. 10. The method of claim 9 , wherein the high intensity light is generated with a xenon flash. 11. A graphene structure produced using a method comprising the steps of: providing a patterned substrate, said patterned substrate comprising protrusions or indentations; depositing graphene oxide on the patterned substrate; and reducing the graphene oxide to graphene, wherein the graphene structure comprises multiple layers, and the average distance between layers is greater than 0.8 μm. 12. The graphene structure of claim 11 ; wherein the average distance between layers is greater than 1.6 μm. 13. The graphene structure of claim 11 ; wherein the graphene structure comprises carbon and oxygen; and the oxygen content of the graphene structure is less than 25 at. %. 14. An electrode comprising the graphene structure of claim 11 . 15. The electrode of claim 14 , wherein the specific capacitance of the electrode is greater than 300 F g −1 . 16. A capacitor comprising at least one electrode of claim 14 . 17. A sandwich-style capacitor comprising at least one electrode of claim 14 . 18. The electrode of claim 14 , wherein the energy density of the electrode is greater than 0.300 W·h·cm −3 and wherein the power density of the electrode is greater than 300 W·cm −3 . 19. A method of fabricating graphene, the method comprising: providing a patterned substrate, said patterned substrate comprising structures protrusions or indentations; depositing graphene oxide on the patterned substrate; and reducing the graphene oxide to graphene; wherein the patterned substrate comprises structures having a shape selected from cylinders, triangle-based pyramids, square-based pyramids, half spheres, rectangular prisms, triangular prisms, pentagonal prisms, hexagonal prisms, cones, and combinations thereof.

Assignees

Inventors

Classifications

  • H01G11/36Primary

    Nanostructures, e.g. nanofibres, nanotubes or fullerenes · CPC title

  • Elements · CPC title

  • Purity · CPC title

  • Carbon-based · CPC title

  • specially adapted for electrodes (carbonisation or activation of carbon for the manufacture of electrodes H01G11/34) · CPC title

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What does patent US11545309B2 cover?
The present invention relates in part to a method of fabricating graphene structures from graphene oxide by reducing the graphene oxide on a patterned substrate. The invention also relates in part to graphene structures produced using said method and electrodes and capacitors comprising said graphene structures.
Who is the assignee on this patent?
Gartia Manas Ranjan, Chaichi Ardalan, Univ Louisiana State
What technology area does this patent fall under?
Primary CPC classification H01G11/36. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 03 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 11 related publications on this page (citations in our corpus or others sharing the same primary CPC).