Coating for refractory alloy part

US11542586B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11542586-B2
Application numberUS-201917265835-A
CountryUS
Kind codeB2
Filing dateAug 7, 2019
Priority dateAug 7, 2018
Publication dateJan 3, 2023
Grant dateJan 3, 2023

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A process for coating a part by chemical vapor diffusion is provided and includes placing a powder mixture in a chamber, immersing the part partially in the powder mixture, and applying a heat treatment to the part. The powder mixture includes a first component and a second component forming a gaseous compound during the heat treatment so as to allow deposition of the second component on the part. The part includes a metal refractory allow and the second component forms a solid diffusion alloy by solid diffusion with a metal species of the refractory metal alloy to generate a coating. The solid diffusion allow generates a passivating oxide layer when subjected to oxidizing conditions.

First claim

Opening claim text (preview).

The invention claimed is: 1. A process comprising: coating a part by chemical vapor diffusion; placing a powder mixture in a chamber, the powder mixture comprising at least one first component, at least one second component and an inert component; the powder mixture including a mass proportion comprised between 6 and 8% of the first component and between 8 and 12% of the second component; the first component comprising at least one halide species selected from NH4Cl, NH4F, AlCl3, CrCl2; the second component comprising at least one species selected from silicon, aluminum, iron, copper, cobalt, nickel, lanthanum, germanium, zirconium, chromium, titanium, hafnium, rhenium and a mixture thereof; immersing the part at least partially in the powder mixture, the part comprising a metal refractory alloy, the metal refractory alloy comprising molybdenum; and heat treating the part, the first component and the second component forming a gaseous compound during the heat treating step so as to allow deposition of the second component on the part; the second component forming a solid diffusion alloy by solid diffusion with at least one metal species of the metal refractory alloy so as to generate a coating; the solid diffusion alloy generating a passivating oxide layer when subjected to oxidizing conditions; wherein the process produces a coating on the part, the coating comprising a plurality of superimposed layers; the superimposed layers comprising: a first layer having a thickness comprised between 0.1 μm and 30 μm, a molar fraction of the second component in the first layer being comprised between 0 and 50%, a second layer covering the first layer and having a thickness comprised between 1 μm and 50 μm, the second layer having a molar fraction of the second component less than 2%; a third layer covering the second layer and having a thickness comprised between 0.5 μm and 50 μm, the third layer having a molar fraction of the second component comprised between 60 and 70%. 2. The process as claimed in claim 1 , wherein the powder mixture includes a mass proportion comprised between 1 and 20% of the second component and a mass proportion comprised between 1 and 10% of the first component based on the total mass of the powder mixture. 3. The process as claimed in claim 1 , wherein: the second component is a mixture of a silicon powder and an aluminum powder, and the first component is ammonium chloride. 4. The process as claimed in claim 1 , wherein the powder mixture further includes a mass proportion comprised between 80 and 86% of an inert component. 5. The process as claimed in claim 4 , wherein the powder mixture comprises between 82 and 84% by mass of inert component. 6. The process as claimed in claim 4 wherein the inert component is an alumina powder. 7. The process as claimed in claim 1 , wherein the powder mixture comprises: a mass proportion comprised between 6 and 8% of the first component, a mass proportion comprised between 8 and 12% of the second component, the second component being a mixture of aluminum and silicon powder, and a mass proportion of inert component comprised between 80% and 86%, the inert component comprising one refractory mineral oxide powder or a combination of refractory mineral oxide powders.

Assignees

Inventors

Classifications

  • only coatings of metal elements only · CPC title

  • only coatings {only including layers} of metallic material · CPC title

  • C23C10/34Primary

    Embedding in a powder mixture, i.e. pack cementation · CPC title

  • using solids, e.g. powders, pastes · CPC title

  • including at least one metal alloy layer · CPC title

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What does patent US11542586B2 cover?
A process for coating a part by chemical vapor diffusion is provided and includes placing a powder mixture in a chamber, immersing the part partially in the powder mixture, and applying a heat treatment to the part. The powder mixture includes a first component and a second component forming a gaseous compound during the heat treatment so as to allow deposition of the second component on the pa…
Who is the assignee on this patent?
Commissariat Energie Atomique, Safran
What technology area does this patent fall under?
Primary CPC classification C23C10/34. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 03 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).