Substrate integrated waveguide transition including a metallic layer portion having an open portion that is aligned offset from a centerline

US11539107B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11539107-B2
Application numberUS-202017135268-A
CountryUS
Kind codeB2
Filing dateDec 28, 2020
Priority dateDec 28, 2020
Publication dateDec 27, 2022
Grant dateDec 27, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

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Example embodiments relate to substrate integrated waveguide (SIW) transitions. An example SIW may include a dielectric substrate having a top surface and a bottom surface and a first metallic layer portion coupled to the top surface of the dielectric substrate that includes a single-ended termination, an impedance transformer, and a metallic rectangular patch located within an open portion in the first metallic layer portion such that the open portion forms a non-conductive loop around the metallic rectangular patch. The SIW also includes a second metallic layer portion coupled to the bottom surface of the dielectric substrate and metallic via-holes electrically coupling the first metallic layer to the second metallic layer. The SIW may be implemented in a radar unit to couple antennas to a printed circuit board (PCB). In some examples, the SIW may be implemented with only a non-conductive opening that lacks the metallic rectangular patch.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus comprising: a dielectric substrate having a top surface and a bottom surface; a first metallic layer portion coupled to the top surface of the dielectric substrate, wherein the first metallic layer portion comprises: a single-ended termination, an impedance transformer, and a metallic rectangular patch located within an open portion in the first metallic layer portion such that the open portion forms a non-conductive loop around the metallic rectangular patch, wherein a centerline extends through a center of the single-ended termination and a center of the impedance transformer, and wherein the open portion is aligned offset relative to the centerline; a second metallic layer portion coupled to the bottom surface of the dielectric substrate; and a set of metallic via-holes electrically coupling the first metallic layer portion to the second metallic layer portion. 2. The apparatus of claim 1 , wherein the top surface and the bottom surface of the dielectric substrate include a printed circuit board (PCB) laminate, and wherein the first metallic layer portion is coupled to the PCB laminate. 3. The apparatus of claim 1 , wherein the first metallic layer portion is coupled to a first half of the top surface of the dielectric substrate with only the impedance transformer and the single-ended termination coupled to a second half of the top surface of the dielectric substrate. 4. The apparatus of claim 1 , wherein the single-ended termination is configured to couple to a transmission line on a PCB. 5. The apparatus of claim 4 , wherein the single-ended termination is configured to couple a first signal from the PCB into a waveguide via a combination of the metallic rectangular patch and the non-conductive loop, and wherein the single-ended termination is configured to couple a second signal from the waveguide to the PCB via the combination of the metallic rectangular patch and the non-conductive loop. 6. The apparatus of claim 1 , wherein the impedance transformer includes a tapered transition configuration. 7. The apparatus of claim 1 , wherein the first metallic layer portion is configured to couple to a waveguide such that electromagnetic energy is able to propagate between the metallic rectangular patch and the waveguide. 8. The apparatus of claim 1 , wherein the set of metallic via-holes comprises: a pair of parallel lines of metallic via-holes extending in parallel relative to a length of the metallic rectangular patch such that the metallic rectangular patch is located between the pair of parallel lines of metallic via-holes; and a baseline of metallic via-holes extending between ends of the pair of parallel lines of metallic via-holes and in parallel relative to a width of the metallic rectangular patch. 9. The apparatus of claim 8 , wherein the pair of parallel lines of metallic via-holes are equal in length, and wherein a length of each parallel line of metallic via-holes is greater than a given length of the baseline of metallic via-holes. 10. A method comprising: conducting electromagnetic energy via a transmission line on a printed circuit board (PCB); coupling the electromagnetic energy into a waveguide via an SIW transition, wherein the SIW transition comprises: a dielectric substrate having a top surface and a bottom surface; a first metallic layer portion coupled to the top surface of the dielectric substrate, wherein the first metallic layer portion comprises: (i) a single-ended termination, (ii) an impedance transformer, and (iii) a metallic rectangular patch located within an open portion in the first metallic layer portion such that the open portion forms a non-conductive loop around the metallic rectangular patch, wherein a centerline extends through a center of the single-ended termination and a center of the impedance transformer, and wherein the open portion is aligned offset relative to the centerline; a second metallic layer portion coupled to the bottom surface of the dielectric substrate; and a set of metallic via-holes electrically coupling the first metallic layer portion to the second metallic layer portion; and transmitting the electromagnetic energy as signals via one or more antennas coupled to the waveguide. 11. The method of claim 10 , further comprising: receiving one or more signals from the one or more antennas coupled to the waveguide; and coupling electromagnetic energy corresponding to the one or more signals from the waveguide and to the PCB via the SIW transition. 12. A system comprising: a waveguide; a substrate integrated waveguide (SIW) transition coupled to the waveguide, wherein the SIW transition comprises: a dielectric substrate having a top surface and a bottom surface; a first metallic layer portion coupled to the top surface of the dielectric substrate, wherein the first metallic layer portion comprises: a single-ended termination, an impedance transformer, and a metallic rectangular patch located within an open portion in the first metallic layer portion such that the open portion forms a non-conductive loop around the metallic rectangular patch, wherein a centerline extends through a center of the single-ended termination and a center of the impedance transformer, and wherein the open portion is aligned offset relative to the centerline; a second metallic layer portion coupled to the bottom surface of the dielectric substrate; and a set of metallic via-holes electrically coupling the first metallic layer portion to the second metallic layer portion. 13. The system of claim 12 , wherein the first metallic layer portion is coupled to a first half of the top surface of the dielectric substrate with only the impedance transformer and the single-ended termination coupled to a second half of the top surface of the dielectric substrate. 14. The system of claim 12 , further comprising: a printed circuit board (PCB) having a transmission line; and wherein the single-ended termination is configured to couple to the transmission line on the PCB. 15. The system of claim 14 , wherein the single-ended termination is configured to couple a first signal from the PCB into the waveguide via the SIW transition, and wherein the single-ended termination is configured to couple a second signal from the waveguide to the PCB via the SIW transition. 16. The system of claim 12 , wherein the top surface and the bottom surface of the dielectric substrate include a printed circuit board (PCB) laminate, and wherein the first metallic layer portion is coupled to the PCB laminate. 17. The system of claim 12 , wherein the set of metallic via-holes comprises: a pair of parallel lines of metallic via-holes extending in parallel relative to a length of the metallic rectangular patch such that the metallic rectangular patch is located between the pair of parallel lines of metallic via-holes; and a baseline of metallic via-holes extending between ends of the pair of parallel lines of metallic via-holes and in parallel relative to a width of the metallic rectangular patch. 18. The system of claim 17 , wherein the pair of parallel lines of metallic via-holes are equal in length, and wherein the length of the parallel lines of metallic via-holes is greater than a given length of the baseline of metallic via-holes.

Assignees

Inventors

Classifications

  • H01P5/107Primary

    Hollow-waveguide/strip-line transitions · CPC title

  • Printed shielding conductors for shielding around or between signal conductors, e.g. coplanar or coaxial printed shielding conductors · CPC title

  • Dielectric details, e.g. changing the dielectric material around a transmission line · CPC title

  • Multilayer dielectric · CPC title

  • Dielectric or adhesive layers comprising a plurality of layers, e.g. in a multilayer structure · CPC title

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Frequently asked questions

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What does patent US11539107B2 cover?
Example embodiments relate to substrate integrated waveguide (SIW) transitions. An example SIW may include a dielectric substrate having a top surface and a bottom surface and a first metallic layer portion coupled to the top surface of the dielectric substrate that includes a single-ended termination, an impedance transformer, and a metallic rectangular patch located within an open portion in …
Who is the assignee on this patent?
Waymo Llc
What technology area does this patent fall under?
Primary CPC classification H01P5/107. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 27 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).