Generating synthetic images as training dataset for a machine learning network

US11538171B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11538171-B2
Application numberUS-202117249378-A
CountryUS
Kind codeB2
Filing dateMar 1, 2021
Priority dateApr 26, 2018
Publication dateDec 27, 2022
Grant dateDec 27, 2022

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A method may include identifying a first image for training a deep learning network, wherein the first image includes at least one target object associated with at least one location in the first image, and wherein the first image is associated with a mask image; determining a set of deformations to create a training set of deformed images, wherein the training set is to be used to train the deep learning network; generating the training set of deformed images by applying the set of deformations to the first image; and generating a set of deformed mask images by applying the set of deformations to the mask image, wherein each deformed image of the training set of deformed images is associated with a respective mask image to identify the location of the at least one target object in each deformed image.

First claim

Opening claim text (preview).

What is claimed is: 1. A method, comprising: identifying, by a device, an image, the image including one or more target objects; generating, by the device, one or more deformed images by applying one or more deformations to the image; generating, by the device, one or more deformed mask images by selectively applying the one or more deformations to one or more mask images associated with the image, each deformed mask image, of the one or more deformed mask images, being associated with a deformed image, of the one or more deformed images, to identify at least one location corresponding to an object, of the one or more target objects, in the deformed image; and training, by the device, a model using the one or more deformed images and the one or more deformed mask images. 2. The method of claim 1 , further comprising: randomly or pseudorandomly selecting the one or more deformations; and wherein generating the one or more deformed images comprises: generating the one or more deformed images based on randomly or pseudorandomly selecting the one or more deformations. 3. The method of claim 1 , wherein generating the one or more deformed images by applying the one or more deformations to the image comprises: generating the one or more deformed images by selectively applying a predetermined set of deformations to the image. 4. The method of claim 1 , further comprising: determining the one or more deformations based on a type of the image. 5. The method of claim 4 , wherein determining the one or more deformations based on the type of the image comprises: selecting the one or more deformations from a first set of deformations based on the type of the image being a first type; or selecting the one or more deformations from a second set of deformations based on the type of the image being a second type. 6. The method of claim 1 , wherein the one or more deformations include at least one of: one or more spatial deformations, one or more lighting deformations, one or more background deformations, one or more atmospheric deformations, one or more color deformations, one or more deformations of one or more letters or numbers of the image, an addition of the one or more target objects in the image, a removal of the one or more target objects from the image, an addition of one or more other target objects in the image, or a relocation of the one or more target objects in the image. 7. The method of claim 1 , wherein generating the one or more deformed images by applying the one or more deformations to the image comprises: generating a first deformed image, of the one or more deformed images, by applying a first deformation, of the one or more deformations, to the image; and generating a second deformed image, of the one or more deformed images, by applying a second deformation, of the one or more deformations, to the first deformed image; and wherein training the model using the one or more deformed images comprises: training the model using the second deformed image. 8. A device, comprising: one or more memories; and one or more processors, communicatively coupled to the one or more memories, configured to: identify an image, the image including one or more target objects; generate one or more deformed images by applying one or more deformations to the image; generate one or more deformed mask images by selectively applying the one or more deformations to one or more mask images associated with the image, each deformed mask image, of the one or more deformed mask images, being associated with a deformed image, of the one or more deformed images, to identify at least one location corresponding to an object, of the one or more target objects, in the deformed image; and train a model using the one or more deformed images and the one or more deformed mask images. 9. The device of claim 8 , wherein the one or more processors, when generating the one or more deformed images by applying the one or more deformations to the image, are configured to: generate a particular deformed image, of the one or more deformed images, by selectively applying a deformation, of the one or more deformations, to the image after the image is rotated; and wherein the one or more processors, when generating the one or more deformed mask images by selectively applying the one or more deformations to the one or more mask images, are configured to: generate a particular deformed mask image, of the one or more deformed mask images, by selectively applying the deformation to a mask image, of the one or more mask images, corresponding to the particular deformed image. 10. The device of claim 8 , wherein the one or more processors, when generating the one or more deformed images by applying the one or more deformations to the image, are configured to: generate a particular deformed image, of the one or more deformed images, by selectively applying a deformation, of the one or more deformations, to the image after the image is compressed; and wherein the one or more processors, when generating the one or more deformed mask images by selectively applying the one or more deformations to the one or more mask images, are configured to: generate a particular deformed mask image, of the one or more deformed mask images, by selectively applying the deformation to a mask image, of the one or more mask images, corresponding to the particular deformed image. 11. The device of claim 8 , wherein the one or more processors, when generating the one or more deformed mask images by selectively applying the one or more deformations to the one or more mask images, are configured to: determine that a deformation, of the one or more deformations, is to be applied to a mask image, of the one or more mask images, based on a type of the deformation; and selectively apply the deformation based on determining that the deformation is to be applied. 12. The device of claim 8 , wherein the one or more processors, when generating the one or more deformed mask images by selectively applying the one or more deformations to the one or more mask images, are configured to: determine that a deformation, of the one or more deformations, has no effect on a mask image of the one or more mask images; and determine that the deformation is not to be applied to the mask image based on determining that the deformation has no effect on the mask image. 13. The device of claim 8 , wherein the one or more processors are further configured to: determine the one or more deformations based on a type of the image, wherein the one or more deformations are selected from a first set of deformations based on the type of the image being a first type; or wherein the one or more deformations are selected from a second set of deformations based on the type of the image being a second type. 14. The device of claim 8 , wherein the one or more processors, when generating the one or more deformed images by applying the one or more deformations to the image, are configured to: generate a first deformed image, of the one or more deformed images, by applying a first deformation, of the one or more deformations, to the image; and generate a second deformed image, of the one or more deformed images, by applying a second deformation, of the one or more deformations, to the first deformed image; and wherein the one or more processors, when training the model using the one or more deformed images, are configured to: train the model using the second deformed image. 15. A non-transitory computer-readable medium storing a set of instructions,

Assignees

Inventors

Classifications

  • Non-supervised learning, e.g. competitive learning · CPC title

  • Artificial neural networks [ANN] · CPC title

  • Region-based segmentation · CPC title

  • G06T7/149Primary

    involving deformable models, e.g. active contour models · CPC title

  • Document · CPC title

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What does patent US11538171B2 cover?
A method may include identifying a first image for training a deep learning network, wherein the first image includes at least one target object associated with at least one location in the first image, and wherein the first image is associated with a mask image; determining a set of deformations to create a training set of deformed images, wherein the training set is to be used to train the de…
Who is the assignee on this patent?
Capital One Services Llc
What technology area does this patent fall under?
Primary CPC classification G06T7/149. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Dec 27 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).