Particle beam apparatus

US11534629B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11534629-B2
Application numberUS-202117204192-A
CountryUS
Kind codeB2
Filing dateMar 17, 2021
Priority dateMar 18, 2020
Publication dateDec 27, 2022
Grant dateDec 27, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A particle beam apparatus includes: an electromagnet to which each ion beam from a plurality of ion sources having different ion species is capable of being introduced, and from which one of the ion beams is capable of selectively exiting to a device on a downstream side by switching a magnetic field intensity, in which the electromagnet is capable of deflecting the one of the ion beam to be exited to the device on the downstream side toward the device on the downstream side, and is capable of reducing exit of a different type of beam mixed in the ion beam to the device on the downstream side, the different type of beam being different from the one of the ion beam.

First claim

Opening claim text (preview).

What is claimed is: 1. A particle beam apparatus comprising: an electromagnet to which each ion beam from a plurality of ion sources having different ion species is capable of being introduced, and from which one of the ion beams is capable of selectively exiting to a device on a downstream side by switching a magnetic field intensity; and a current measuring device into which one of the ion beams introduced into the electromagnet is incident, and which is capable of measuring a beam current of the ion beam, wherein the electromagnet is capable of deflecting the one of the ion beams to be exited to the device on the downstream side toward the device on the downstream side, and is capable of reducing exit of a different type of beam mixed in the ion beam to the device on the downstream side, the different type of beam being different from the one of the ion beams, and one of the ion beams different from the ion beam that is directed to the device on the downstream side is incident into the current measuring device. 2. The particle beam apparatus according to claim 1 , wherein the plurality of ion sources include a first ion source and a second ion source, the electromagnet is disposed to be interposed between the first ion source and the second ion source, and the first ion source and the second ion source respectively emit a first ion beam and a second ion beam in directions facing each other, and the first ion beam and the second ion beam are introduced into the electromagnet. 3. The particle beam apparatus according to claim 2 , wherein a beam exit nozzle of the first ion source and a beam exit nozzle of the second ion source are directly connected to a casing of the electromagnet. 4. The particle beam apparatus according to claim 2 , wherein the electromagnet includes a first magnetic pole and a second magnetic pole having the same shape and facing each other at an interval, and a casing that accommodates the first magnetic pole and the second magnetic pole and has an evacuated inside, and an electric current is supplied to a coil of the first magnetic pole and a coil of the second magnetic pole, whereby a magnetic field is formed in a gap between the first magnetic pole and the second magnetic pole. 5. The particle beam apparatus according to claim 4 , wherein each of the first magnetic pole and the second magnetic pole has a substantially hexagonal shape when viewed from a direction in which the first magnetic pole and the second magnetic pole face each other, and has four edges corresponding to four sides among six sides of the substantially hexagonal shape, and the four edges include a first edge inclined with respect to a direction perpendicular to a direction in which the first ion source and the second ion source face each other when viewed from the direction in which the first magnetic pole and the second magnetic pole face each other, a second edge inclined with respect to a direction perpendicular to the direction in which the first ion source and the second ion source face each other when viewed from the direction in which the first magnetic pole and the second magnetic pole face each other, a third edge extending in the direction in which the first ion source and the second ion source face each other, and a fourth edge extending in the direction in which the first ion source and the second ion source face each other. 6. The particle beam apparatus according to claim 5 , wherein the first ion beam is introduced into the electromagnet diagonally across the first edge, and the second ion beam is introduced into the electromagnet diagonally across the second edge. 7. The particle beam apparatus according to claim 6 , wherein the first ion beam or the second ion beam introduced into the electromagnet exits from the electromagnet across the third edge or the fourth edge. 8. The particle beam apparatus according to claim 1 , wherein the electromagnet is disposed to be interposed between the current measuring device and the device on the downstream side. 9. The particle beam apparatus according to claim 1 , wherein the current measuring device is installed in an interior of the electromagnet. 10. The particle beam apparatus according to claim 9 , wherein the electromagnet includes a first magnetic pole and a second magnetic pole having the same shape and facing each other at an interval, and the current measuring device is disposed to be interposed between the first magnetic pole and the second magnetic pole. 11. The particle beam apparatus according to claim 1 , wherein the device on the downstream side is a beam transport system, and transports the ion beam exited from the electromagnet to a beam acceleration unit. 12. The particle beam apparatus according to claim 11 , wherein the beam transport system includes three electrostatic quadrupole electromagnets that converge the ion beam.

Assignees

Inventors

Classifications

  • Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00 · CPC title

  • Beam current · CPC title

  • Electrical details, e.g. matching or coupling of the coil to the receiver · CPC title

  • for measuring beam parameters · CPC title

  • H05H7/04Primary

    Magnet systems {, e.g. undulators, wigglers (free-electron laser H01S3/0903)}; Energisation thereof · CPC title

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What does patent US11534629B2 cover?
A particle beam apparatus includes: an electromagnet to which each ion beam from a plurality of ion sources having different ion species is capable of being introduced, and from which one of the ion beams is capable of selectively exiting to a device on a downstream side by switching a magnetic field intensity, in which the electromagnet is capable of deflecting the one of the ion beam to be ex…
Who is the assignee on this patent?
Sumitomo Heavy Industries
What technology area does this patent fall under?
Primary CPC classification H05H7/04. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 27 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).