Photonic gas sensor and method for producing a photonic gas sensor

US11530987B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11530987-B2
Application numberUS-201816763923-A
CountryUS
Kind codeB2
Filing dateNov 23, 2018
Priority dateNov 23, 2017
Publication dateDec 20, 2022
Grant dateDec 20, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A photonic gas sensor and a method for producing a photonic gas sensor are disclosed. In an embodiment a photonic gas sensor includes a component housing with at least one cavity, a radiation-emitting semiconductor chip arranged in the cavity and configured to transmit electromagnetic radiation in a first wavelength range, a radiation-detecting semiconductor chip arranged in the cavity and configured to detect electromagnetic radiation in a second wavelength range and an active sensor element having a fluorescent dye configured to emit electromagnetic radiation in the second wavelength range upon being excited by electromagnetic radiation in the first wavelength range, wherein an intensity of the emitted electromagnetic radiation in the second wavelength range changes reversibly in presence of a gas to be detected.

First claim

Opening claim text (preview).

The invention claimed is: 1. A photonic gas sensor comprising: a component housing with a first cavity and a second cavity separated from each other; a radiation-emitting semiconductor chip arranged in the first cavity and configured to transmit electromagnetic radiation in a first wavelength range; a radiation-detecting semiconductor chip arranged in the second cavity and configured to detect electromagnetic radiation in a second wavelength range; an active sensor element formed as a sensitive casting in the first cavity and having a fluorescent dye configured to emit electromagnetic radiation in the second wavelength range upon being excited by the electromagnetic radiation in the first wavelength range; and a waveguide layer configured to direct the electromagnetic radiation in the second wavelength range to the radiation-detecting semiconductor chip, wherein an intensity of the emitted electromagnetic radiation in the second wavelength range changes reversibly in presence of a gas to be detected. 2. The photonic gas sensor of claim 1 , wherein the active sensor element comprises a polymer matrix in which the fluorescent dye is embedded and which is permeable to the gas to be detected. 3. The photonic gas sensor of claim 2 , wherein the sensitive casting embeds at least the radiation-emitting semiconductor chip. 4. The photonic gas sensor of claim 1 , wherein the active sensor element is formed as a sensitive layer, a main extension plane of the sensitive layer being located parallel to a radiation emission surface of the radiation-emitting semiconductor chip and/or parallel to a radiation entry surface of the radiation-detecting semiconductor chip. 5. The photonic gas sensor of claim 4 , wherein the sensitive layer comprises a polymer matrix in which the fluorescent dye is embedded, and wherein the sensitive layer is attached to a transparent carrier element. 6. The photonic gas sensor of claim 1 , further comprising a filter configured to filter out the electromagnetic radiation of the first wavelength range. 7. The photonic gas sensor of claim 6 , wherein the filter is formed as a filtering layer and is attached to a radiation entry surface of the radiation-detecting semiconductor chip. 8. The photonic gas sensor of claim 1 , wherein the active sensor element is formed as a sensitive layer and a filter element as a filtering layer, and wherein the filtering layer is arranged between a radiation entry surface of the radiation-detecting semiconductor chip and the sensitive layer. 9. The photonic gas sensor of claim 8 , wherein the filter element is formed as a filtering casting in which the radiation-detecting semiconductor chip is embedded. 10. The photonic gas sensor of claim 1 , further comprising a covering element configured to be absorbent or reflective at least for the electromagnetic radiation in the first wavelength range. 11. The photonic gas sensor of claim 10 , wherein the covering element is arranged between an outer surface of the photonic gas sensor and the active sensor element. 12. The photonic gas sensor of claim 1 , wherein the waveguide layer has a transparent casting compound into which a plurality of scattering particles is incorporated. 13. The photonic gas sensor of claim 1 , wherein the waveguide layer comprises glass. 14. The photonic gas sensor of claim 1 , wherein, on a main surface facing a radiation emission surface of the radiation-emitting semiconductor chip and/or a radiation entry surface of the radiation-detecting semiconductor chip, the waveguide layer has coupling structures configured to increase coupling and/or decoupling of electromagnetic radiation into or out of the waveguide layer. 15. The photonic gas sensor of claim 1 , wherein the fluorescent dye comprises a fluorescein, a rhodamine, a cyanine, a coumarin, a fluorescent polymer, a fluorescent metal-ion complex or nanoparticles. 16. A method for producing the photonic gas sensor of claim 1 , the method comprising: arranging the radiation-emitting semiconductor chip and the radiation-detecting semiconductor chip on a mounting surface of a substrate; mounting a frame on the substrate so that the substrate and the frame form the component housing with the first and second cavities; and arranging an active sensitive layer on the frame as the active sensor element. 17. The method of claim 16 , wherein the substrate is based on a ceramic or is a printed circuit board. 18. The photonic gas sensor of claim 1 , wherein the waveguide layer comprises epoxy resin. 19. The photonic gas sensor of claim 1 , wherein the waveguide layer comprises polymethyl methacrylate.

Assignees

Inventors

Classifications

  • CO or CO2 · CPC title

  • Measuring fluorescence of fluorescent products of reactions or of fluorochrome labelled reactive substances, e.g. measuring quenching effects, using measuring "optrodes" (in vivo A61B5/00; immunoassay G01N33/53) · CPC title

  • Ammonia · CPC title

  • Portable; cableless; compact; hand-held · CPC title

  • for investigating presence of specific gases or aerosols (G01N31/221, G01N31/222 take precedence; actuation of fire alarm by presence of smoke or gases G08B17/10) · CPC title

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What does patent US11530987B2 cover?
A photonic gas sensor and a method for producing a photonic gas sensor are disclosed. In an embodiment a photonic gas sensor includes a component housing with at least one cavity, a radiation-emitting semiconductor chip arranged in the cavity and configured to transmit electromagnetic radiation in a first wavelength range, a radiation-detecting semiconductor chip arranged in the cavity and conf…
Who is the assignee on this patent?
Osram Oled Gmbh
What technology area does this patent fall under?
Primary CPC classification G01N21/6428. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Dec 20 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).