Plasma system and method of mixing plasma and water mist

Patent metadata

Field	Value
Publication number	US-11529591-B2
Application number	US-202016919116-A
Country	US
Kind code	B2
Filing date	Jul 2, 2020
Priority date	Mar 17, 2020
Publication date	Dec 20, 2022
Grant date	Dec 20, 2022

Abstract

A plasma system is provided. The plasma system includes a low-temperature atmospheric-pressure plasma source and a water-mist supplying source. The low-temperature atmospheric-pressure plasma source has a nozzle. The nozzle is configured to eject a plasma. The water-mist supplying source is configured to deliver a water mist to the plasma ejected from the nozzle.

First claim

What is claimed is:

1. A plasma system, comprising:
a low-temperature atmospheric-pressure plasma source having a nozzle configured to eject a plasma; and
a water-mist supplying source configured to deliver a water mist to the plasma ejected from the nozzle.

2. The plasma system of claim 1 , further comprising:
a mixer connected to the low-temperature atmospheric-pressure plasma source at least partially along a straight direction, the mixer having a chamber communicated with the nozzle, the nozzle being configured to eject the plasma along the straight direction, the water-mist supplying source being connected with the mixer and configured to deliver the water mist to the chamber.

3. The plasma system of claim 2 , wherein the mixer comprises:
a top plate having a first opening, the nozzle at least partially penetrates through the first opening;
a base plate having a second opening aligning with the first opening along the straight direction, the chamber communicates between the first opening and the second opening;
a side wall connected between the top plate and the base plate, an inner wall surface of the side wall surrounds and defines the chamber, a projection of the inner wall surface is of a circular shape along the straight direction, the side wall has at least one third opening having an extension direction as projected along the straight direction, the extension direction is deviated from a center surrounded by the projection of the inner wall surface along the straight direction; and
at least one connecting tube disposed outside the side wall and aligned with the third opening, the connecting tube extends along the extension direction and is configured to connect with the water-mist supplying source.

4. The plasma system of claim 2 , wherein the mixer comprises:
a plate body having a fourth opening and at least one fifth opening, the nozzle at least partially penetrates through the fourth opening, the fifth opening has an extension direction, a projection of the extension direction along the straight direction is deviated from the fourth opening;
at least one connecting tube disposed on the plate body and aligned with the fifth opening, the connecting tube extends along the extension direction and is configured to connect with the water-mist supplying source; and
a hollow conical body connected with a side of the plate body away from the connecting tube, an inner wall surface of the hollow conical body defines the chamber, a projection of the inner wall surface is at least partially of a circular shape along the straight direction, an end of the hollow conical body away from the connecting tube defines a sixth opening aligning with the fourth opening along the straight direction, a center surrounded by the projection of the inner wall surface along the straight direction is located between the fourth opening and the sixth opening, the chamber gradually decreases towards the sixth opening.

5. The plasma system of claim 4 , wherein the extension direction is inclined to the plate body.

6. The plasma system of claim 1 , further comprising:
a first working gas supplying source connected with the low-temperature atmospheric-pressure plasma source and configured to supply a first working gas to the low-temperature atmospheric-pressure plasma source for the low-temperature atmospheric-pressure plasma source to produce the plasma.

7. The plasma system of claim 6 , wherein the first working gas is argon, helium, nitrogen, oxygen, hydrogen or air.

8. The plasma system of claim 6 , wherein a range of a flow rate of the first working gas is between 1 standard liter per minute and 30 standard liter per minute.

9. The plasma system of claim 1 , further comprising:
a second working gas supplying source connected with the water-mist supplying source and configured to supply a second working gas to drive the water mist.

10. The plasma system of claim 9 , wherein a range of a flow rate of the second working gas is between 0 standard liter per minute and 30 standard liter per minute.

11. The plasma system of claim 1 , wherein a range of a flow rate of the water mist is between 1 milligram per standard liter per minute and 300 milligram per standard liter per minute.

12. A method of mixing plasma and water mist, comprising:
converting a first working gas to a plasma by a low-temperature atmospheric-pressure plasma source and ejecting the plasma towards an ejection zone of the low-temperature atmospheric-pressure plasma source; and
mixing the plasma ejected with a water mist at the ejection zone.

13. The method of claim 12 , wherein mixing the plasma ejected with the water mist comprises:
injecting the water mist into a chamber;
ejecting the plasma towards the chamber along a straight direction; and
ejecting a mixture of the plasma and the water mist out of the chamber along the straight direction after mixing of the plasma and the water mist inside the chamber.

14. The method of claim 13 , wherein injecting the water mist comprises:
ejecting the water mist inside the chamber in a direction deviated from a center of the chamber on a projection at least partially along the straight direction; and
ejecting the plasma towards the chamber comprises:
ejecting the plasma towards the center of the chamber.

15. The method of claim 13 , wherein a range of a flow rate of the water mist is between 1 milligram per standard liter per minute and 300 milligram per standard liter per minute.

16. The method of claim 13 , wherein injecting the water mist comprises:
driving the water mist to the chamber by a second working gas.

17. The method of claim 16 , wherein a range of a flow rate of the second working gas is between 0 standard liter per minute and 30 standard liter per minute.

18. The method of claim 12 , wherein the first working gas is argon, helium, nitrogen, oxygen, hydrogen or air.

19. The method of claim 12 , wherein a range of a flow rate of the first working gas is between 1 standard liter per minute and 30 standard liter per minute.

Assignees

• Univ National Chiao Tung

Inventors

• Wu Jong-Shinn
• Cheng Yun-Chien
• Lin Tsung-Rong

Classifications

• B01F23/12 Primary

  with vaporisation of a liquid (disinfection, sterilisation or deodorisation of air A61L9/00) · CPC title

• H01J37/3244

  Gas supply means · CPC title

• H01J37/32825 Primary

  Working under atmospheric pressure or higher · CPC title

• H05H1/24

  Generating plasma {(nuclear fusion reactors G21B1/00; gas-filled discharge reactors H01J37/32)} · CPC title

• B01F25/10

  Mixing by creating a vortex flow, e.g. by tangential introduction of flow components · CPC title