Electrosurgical systems and methods

US11529182B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11529182-B2
Application numberUS-202016775633-A
CountryUS
Kind codeB2
Filing dateJan 29, 2020
Priority dateMar 7, 2013
Publication dateDec 20, 2022
Grant dateDec 20, 2022

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

System and methods of an electrosurgical controller having multiple modes of operation that are configured for treatment of a specific targeted tissue type and the electrosurgical effect desired where the treatment and effect are provided by a single controller and an electrosurgical probe. The electrosurgical controller includes an integrated fluid control apparatus or pump where activation of the controller allows for selective energy delivery and corresponding fluid volume flow rates. The electrosurgical probe includes a fluid transport lumen and is in communication with the controller and the pump for operation of the probe in the various user selected modes with accompanying energy delivery and fluid control directed to the desired treatment and surgical effect.

First claim

Opening claim text (preview).

What is claimed is: 1. An electrosurgical controller comprising: a processor; a memory coupled to the processor; a voltage generator operatively coupled to the processor, the voltage generator comprising an active terminal; an aspiration control mechanism, for controlling an aspiration flow rate of fluid through an aspiration conduit operatively coupled thereto, the aspiration control mechanism operatively coupled to the processor; wherein the memory stores a program that, when executed by the processor, causes the processor to: implement a first mode of ablation by setting, via the aspiration control mechanism, the aspiration flow rate at a first rate and by setting a first predetermined energy provided by the voltage generator; and implement a second mode of ablation by setting, via the aspiration control mechanism, the aspiration flow rate at a second flow rate and by setting a second predetermined energy provided by the voltage generator, the second flow rate different than the first flow rate, and the second predetermined energy different than the first predetermined energy. 2. The electrosurgical controller of claim 1 wherein the program, during each mode of ablation, further causes the processor to: adjust the aspiration flow rate, via the aspiration control mechanism, responsive to changes in a parameter indicative of impedance of an electrode circuit; and adjust energy provided by the generator responsive to changes in the parameter indicative of impedance of the electrode circuit. 3. The electrosurgical controller of claim 1 wherein the program, during the first mode of ablation, further causes the processor to: adjust the aspiration flow rate, via the aspiration control mechanism, to maintain the parameter indicative of impedance of an electrode circuit within a high target electrode circuit impedance configured to form a stable plasma thus reducing plasma collapse. 4. The electrosurgical controller of claim 3 wherein the program, during the second mode of ablation, further causes the processor to: adjust the aspiration flow rate, via the aspiration control mechanism, to maintain the parameter indicative of impedance of the electrode circuit within a lower target electrode circuit impedance than during the first mode, the lower target electrode circuit impedance configured to allow plasma collapse. 5. The electrosurgical controller of claim 3 wherein when the processor adjusts the aspiration flow rate, the program further causes the processor to at least one selected from the group consisting of: momentarily stop the aspiration flow rate; and momentarily decrease the aspiration flow rate. 6. The electrosurgical controller of claim 1 wherein the first mode of ablation and the second mode of ablation are each selected from the group consisting of: a low mode for use ablating cartilage; a medium mode for use ablating fibro-cartilage; a high mode for ablating soft tissue; and a vacuum mode for removal of free floating tissue. 7. The electrosurgical controller of claim 1 wherein the program further causes the processor to implement a third mode of ablation by setting a third predetermined aspiration control mechanism setting and by setting a third predetermined energy provided by the voltage generator, the third aspiration control mechanism setting different than the first and second aspiration control mechanism settings, and the third predetermined energy different than the first and second predetermined energy. 8. The electrosurgical controller of claim 7 wherein first, second and third modes of ablation are each selected from the group consisting of: a low mode for use ablating cartilage; a medium mode for use ablating fibro-cartilage; a high mode for ablating soft tissue; and a vacuum mode for removal of free floating tissue. 9. A system comprising: an electrosurgical controller comprising a processor; a memory coupled to the processor; a voltage generator operatively coupled to the processor, the voltage generator comprising an active terminal; a variable aspiration control system for controlling an aspiration flow rate through an aspiration conduit operatively coupled thereto, the variable aspiration control system operatively coupled to the processor; an electrosurgical wand comprising an elongate shaft that defines a proximal end and a distal end; a first active electrode disposed on the distal end of the elongate shaft; wherein the memory stores a program that, when executed by the processor, causes the processor to implement at least two modes of ablation during an electrosurgical procedure, the implementing with the first active electrode of the electrosurgical wand; wherein when the program implements the at least two modes, the program causes the processor to: control impedance of an electrode circuit during a first mode of ablation of an electrosurgical procedure; and then control impedance of the electrode circuit during a second mode of ablation of the electrosurgical procedure, the impedance of the electrode circuit during the second mode different than the impedance of the electrode circuit during the first mode. 10. The system of claim 9 wherein when the processor controls the impedance of the electrode circuit during the first mode of ablation, the program causes the processor to: control flow of fluid into an aperture on the distal end of the electrosurgical wand, the aperture proximate to the first active electrode; and control energy delivered to the first active electrode by the electrosurgical controller. 11. The system of claim 10 wherein when the processor controls the impedance of the electrode circuit during the second mode of ablation, the program causes the processor to: control flow of fluid into the aperture, the flow of fluid in the second mode different than the flow of fluid in the first mode; and control energy delivered to the first active electrode, the energy delivered to the first active electrode in the second mode different than the energy delivered to the first active electrode in the first mode. 12. The system of claim 10 wherein when the processor controls the flow of fluid into the aperture, the program causes the processor to control a means for controlling the variable aspiration control system. 13. The system of claim 10 wherein when the processor controls the impedance of the electrode circuit during the first mode of ablation the program causes the processor to: vary the aspiration flow rate, via the variable aspiration control system, to maintain the impedance of the electrode circuit within a high target electrode circuit impedance range configured to form a stable plasma at the first active electrode and thus reducing plasma collapse. 14. The electrosurgical controller of claim 13 when the processor controls the impedance of the electrode circuit during the first mode of ablation the program causes the processor to: vary the aspiration flow rate, via the variable aspiration control system, to maintain the impedance of the electrode circuit within a lower target electrode circuit impedance range than during the first mode of ablation, the lower target electrode circuit impedance configured to form an unstable plasma at the first active electrode. 15. The system of claim 9 wherein the program, during each mode of ablation, further causes the processor to: adjust a rate of aspiration responsive to changes in a parameter indicative of impedance of the electrode circuit; and adjust energy provided by the generator responsive to changes in the parameter indicative of impedance of the electrode circuit.

Assignees

Inventors

Classifications

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11529182B2 cover?
System and methods of an electrosurgical controller having multiple modes of operation that are configured for treatment of a specific targeted tissue type and the electrosurgical effect desired where the treatment and effect are provided by a single controller and an electrosurgical probe. The electrosurgical controller includes an integrated fluid control apparatus or pump where activation of…
Who is the assignee on this patent?
Arthrocare Corp
What technology area does this patent fall under?
Primary CPC classification A61B18/10. Mapped technology areas include Human Necessities.
When was this patent published?
Publication date Tue Dec 20 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).