System and method for ablation assisted nanostructure formation for graded index surfaces for optics

US11525945B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11525945-B2
Application numberUS-201816016105-A
CountryUS
Kind codeB2
Filing dateJun 22, 2018
Priority dateJun 22, 2018
Publication dateDec 13, 2022
Grant dateDec 13, 2022

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A system and method is disclosed for forming a graded index (GRIN) on a substrate. In one implementation the method may involve applying a metal layer to the substrate. A fluence profile of optical energy applied to the metal layer may be controlled to substantially ablate the metal layer to create a vaporized metal layer. The fluence profile may be further controlled to control a size of metal nanoparticles created from the vaporized metal layer as the vaporized metal layer condenses and forms metal nanoparticles, the metal nanoparticles being deposited back on the substrate to form a GRIN surface on the substrate.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for forming a graded index (GRIN) on a substrate, the method comprising: applying a metal layer to an upper surface of the substrate; applying a laser beam with ultrashort predetermined duration pulses to the metal layer under an ambient condition; controlling a fluence profile of the laser beam to ablate the metal layer to create a vaporized metal layer as a condensing cloud above the upper surface of the substrate, and wherein controlling the fluence profile includes controlling both a power and a spatial shape of the laser beam; and as the condensing cloud condenses and forms metal nanoparticles, further controlling the fluence profile of the laser beam to controllably modify a size of the metal nanoparticles and a distribution of the metal nanoparticles over different portions of the upper surface of the substrate, the metal nanoparticles being deposited back on the upper surface of the substrate; and forming a GRIN surface on the substrate, where the GRIN surface formed includes a spatially varying, controlled pattern of the metal nanoparticles on the substrate. 2. The method of claim 1 , wherein the metal layer is fully ablated by the laser beam. 3. The method of claim 1 , wherein the metal nanoparticles form the GRIN surface on a freeform optic. 4. The method of claim 1 , wherein the predetermined duration of the pulses is in a nanosecond range. 5. The method of claim 1 , wherein the predetermined duration of the pulses is in a picosecond range. 6. The method of claim 1 , wherein the predetermined duration of the pulses is in a femtosecond range. 7. The method of claim 1 , wherein the fluence profile is controlled within a range of 0.2 J/cm 2 to 0.4 J/cm 2 . 8. The method of claim 1 , wherein the applying a metal layer comprises applying a metal layer having a thickness of about 20 nm. 9. A method for forming a graded index (GRIN) on a substrate having a metal layer, the method comprising: placing a metal layer on an upper layer of a substrate; applying a laser beam generated by a laser with ultrashort duration pulses to the metal layer under an ambient condition, thus exposing the upper surface of the substrate; controlling a fluence profile of the laser beam to ablate the metal layer to create a vaporized metal layer cloud above the upper surface of the substrate, wherein the controlling the fluence profile includes controlling both a power of the laser beam and a shape of the laser beam, which creates the vaporized metal layer cloud with a controllably varying nanoparticle dimension and distribution over the metal layer on the substrate; further controlling the power of the laser beam and the shape of the laser beam to modify a size and a distribution of metal nanoparticles created from the vaporized metal layer as the vaporized metal layer condenses and forms metal nanoparticles over the metal layer; and using the metal nanoparticles to spatially pattern, in a predetermined manner, the upper surface of the substrate as the metal nanoparticles are deposited back on the upper surface of the substrate; and forming a GRIN surface on the upper surface of the substrate. 10. The method of claim 9 , wherein the laser beam has pulses within a nanosecond range. 11. The method of claim 9 , wherein the laser beam has pulses within a picosecond range. 12. The method of claim 9 , wherein the laser beam has pulses within a femtosecond range. 13. The method of claim 9 , wherein controlling the fluence profile of the laser beam comprises providing a laser fluence between 0.20 J/cm 2 -0.40 J/cm 2 . 14. The method of claim 9 , wherein the laser fluence profile of the laser beam completely ablates ablate the metal layer. 15. The method of claim 9 , wherein controlling the laser fluence profile of the laser beam comprises applying sufficient energy to fully ablate a 20 nm thick metal layer. 16. A system for forming a graded index (GRIN) on a substrate, the system comprising: a laser configured to generate a laser beam with ultrashort duration pulses and having a controlled fluence profile including a power and a spatial shape of the laser beam; an electronic controller configured to control the laser through control signals transmitted to the laser, the control signals controlling the fluence profile of the laser beam generated by the laser to: control both a power and a beam shape of the laser beam sufficient to initiate melting of a metal layer, under an ambient condition, to ablate the metal layer, and to create a vaporized metal layer as a cloud above an upper surface of the substrate; and to further control the fluence profile of the laser beam to modify a size and a distribution of metal nanoparticles created from the vaporized metal layer when the vaporized metal layer condenses and forms the metal nanoparticles, and such that the metal nanoparticles are deposited back on the upper surface of the substrate in a spatially controlled pattern to form a GRIN surface on the substrate. 17. The system of claim 16 , wherein the laser is configured to generate pulses having a duration in a nanosecond range. 18. The system of claim 16 , wherein the laser is configured to generate an output having a fluence of between about 0.1 J/cm 2 — 1.0 J/cm 2.

Assignees

Inventors

Classifications

  • Increasing rugosity, i.e. roughening · CPC title

  • Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head · CPC title

  • Non-ferrous metals or alloys · CPC title

  • B23K26/362Primary

    Laser etching · CPC title

  • by shaping pulses · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11525945B2 cover?
A system and method is disclosed for forming a graded index (GRIN) on a substrate. In one implementation the method may involve applying a metal layer to the substrate. A fluence profile of optical energy applied to the metal layer may be controlled to substantially ablate the metal layer to create a vaporized metal layer. The fluence profile may be further controlled to control a size of metal…
Who is the assignee on this patent?
L Livermore Nat Security Llc
What technology area does this patent fall under?
Primary CPC classification B23K26/362. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Dec 13 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).