Flexible display substrate and method for manufacturing the same

Patent metadata

Field	Value
Publication number	US-11520231-B2
Application number	US-201816481571-A
Country	US
Kind code	B2
Filing date	Nov 22, 2018
Priority date	Oct 23, 2018
Publication date	Dec 6, 2022
Grant date	Dec 6, 2022

Abstract

A photosensitive resin composition is provided. The photosensitive resin composition is applied in a technical field of flexible display devices. The photosensitive resin composition comprises 5 to 50 parts by weight of an acrylate crosslink monomer, 0.2 to 0.6 parts by weight of an initiator, 5 to 8 parts by weight of a liquid pigment solid substance, 5 to 8 parts by weight of a resin, and 20 to 70 parts by weight of a solvent. The initiator is a radical initiator having a decomposition temperature less than 40° C. The acrylate crosslink monomer comprises a copolymerization two of aromatic group-containing and triol-containing acrylate polymerizable monomers for lowering a temperature of a following color filter preparing process. A method of preparing the photosensitive resin composition and a display device comprising the photosensitive resin composition are also provided.

First claim

What is claimed is:

1. A photosensitive resin composition, comprising:
5 to 50 parts by weight of an acrylate crosslink monomer, 0.2 to 0.6 parts by weight of an initiator, 5 to 8 parts by weight of a pigment solid substance, 5 to 8 parts by weight of a resin, and 20 to 70 parts by weight of a solvent;
wherein the acrylate crosslink monomer comprises a copolymerization of two aromatic group-containing and triol-containing acrylate polymerizable monomers, the two aromatic group-containing and triol-containing acrylate polymerizable monomers are in a form of mutually symmetrical structure, one end of triol of one of the aromatic group-containing and triol-containing acrylate polymerizable monomer is bonded to an aromatic group of the one of the aromatic group-containing and triol-containing acrylate polymerizable monomer, the other end of the triol of the aromatic group-containing and triol-containing acrylate polymerizable monomer is bonded to triol of another aromatic group-containing and triol-containing acrylate polymerizable monomer;
wherein the triol is glycerin, the aromatic group is selected from the group consisting of a benzene ring, a heterocyclic group, and a phenoxy group, and one end of the glycerin is modified to connect an aromatic group, the other end of the glycerin is connected to another acrylate polymerizable monomer molecule symmetrically.

2. The photosensitive resin composition according to claim 1 , wherein the initiator is a radical initiator having a decomposition temperature less than 40° C.

3. The photosensitive resin composition according to claim 1 , wherein the initiator is azobisisoheptanenitrile.

4. The photosensitive resin composition according to claim 1 , wherein the photosensitive resin composition further comprises 5 to 8 parts by weight of a dispersing agent and 0.1 to 0.2 parts by weight of an additive.

5. A photosensitive resin composition, comprising:
5 to 50 parts by weight of an acrylate crosslink monomer, 0.2 to 0.6 parts by weight of an initiator, 5 to 8 parts by weight of a pigment solid substance, 5 to 8 parts by weight of a resin, and 20 to 70 parts by weight of a solvent;
wherein the acrylate crosslink monomer comprises a copolymerization of two aromatic group-containing and triol-containing acrylate polymerizable monomers;
wherein the triol is glycerin, the aromatic group is selected from the group consisting of a benzene ring, a heterocyclic group, and a phenoxy group, and one end of the glycerin is modified to connect an aromatic group, the other end of the glycerin is connected to another acrylate polymerizable monomer molecule symmetrically.

6. The photosensitive resin composition according to claim 5 , wherein the initiator is a radical initiator having a decomposition temperature less than 40° C.

7. The photosensitive resin composition according to claim 5 , wherein the initiator is azobisisoheptanenitrile.

8. The photosensitive resin composition according to claim 5 , wherein the photosensitive resin composition further comprises 5 to 8 parts by weight of a dispersing agent and 0.1 to 0.2 parts by weight of an additive.

9. A method of preparing a photosensitive resin composition, comprising:
providing an acrylate crosslink monomer, wherein the acrylate crosslink monomer comprises a copolymerization of two aromatic group-containing and triol-containing acrylate polymerizable monomers, wherein the triol is glycerin, the aromatic group is selected from the group consisting of a benzene ring, a heterocyclic group, and a phenoxy group, and one end of the glycerin is modified to connect an aromatic group, the other end of the glycerin is connected to another acrylate polymerizable monomer molecule symmetrically;
providing an initiator and mixing the initiator with the acrylate crosslink monomer;
placing the acrylate crosslink monomer containing the initiator in a constant temperature water bath at 40° C. and irradiating the acrylate crosslink monomer containing the initiator with ultraviolet light for at least 6 hours; and
obtaining the photosensitive resin composition by mixing a pigment solid substance, a resin, a solvent, a dispersing agent, and an additive with the acrylate crosslink monomer containing the initiator.

10. The method of preparing the photosensitive resin composition according to claim 9 , wherein the step of providing the acrylate crosslink monomer further comprises:
removing a polymerization inhibitor in the acrylate crosslink monomer by a column chromatography method;
removing dichloromethane in the acrylate crosslink monomerby by a distillation method.

11. The method of preparing the photosensitive resin composition according to claim 9 , wherein the initiator is a radical initiator having a decomposition temperature less than 40° C., and the initiator is azobisisoheptonitrile.

Assignees

• Wuhan China Star Optoelectronics Semiconductor Display Tech Co Ltd

Inventors

• Gong Wenliang

Classifications

• C08F222/1063

  of alcohol terminated polyethers · CPC title

• C08F265/06

  Polymerisation of acrylate or methacrylate esters on to polymers thereof · CPC title

• G03F7/031 Primary

  Organic compounds not covered by group G03F7/029 · CPC title

• C08K5/315

  Compounds containing carbon-to-nitrogen triple bonds · CPC title

• G03F7/027 Primary

  Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F7/075 takes precedence) · CPC title