Non-metal member with colored surface and method of coloring non-metal surface
US-2021115550-A1 · Apr 22, 2021 · US
US11520091B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11520091-B2 |
| Application number | US-201916684016-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 14, 2019 |
| Priority date | Mar 27, 2019 |
| Publication date | Dec 6, 2022 |
| Grant date | Dec 6, 2022 |
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Provided is a coloring pattern structure. The coloring pattern structure includes: a substrate; a light-transmitting dielectric layer formed on at least one surface of the substrate; and a composite material layer disposed on an upper surface of the light-transmitting dielectric layer and formed of a metal and a first material not having a thermodynamic solid solubility in the metal, wherein the metal included in the composite material layer has a pattern coated only on portions of the upper surface of the light-transmitting dielectric layer, and the first material is coated on the remaining area where the metal is not coated.
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What is claimed is: 1. A coloring pattern structure comprising: a substrate made of a metallic material; a light-transmitting dielectric layer disposed on at least one surface of the substrate; and a composite material layer disposed on an upper surface of the light-transmitting dielectric layer and comprising a metal and a first material not having a thermodynamic solid solubility in the metal, wherein the metal included in the composite material layer has a pattern coated only on portions of the upper surface of the light-transmitting dielectric layer, and the first material is coated on the remaining area where the metal is not coated. 2. The coloring pattern structure of claim 1 , wherein the metal comprises one of silver (Ag), aluminum (Al), gold (Au), cobalt (Co), copper (Cu), nickel (Ni), palladium (Pd), platinum (Pt), and rhenium (Re). 3. The coloring pattern structure of claim 1 , wherein the first material comprises one of carbon (C), silicon (Si), germanium (Ge), and an Si—Ge alloy. 4. The coloring pattern structure of claim 1 , wherein the substrate comprises a pure metal selected from iron (Fe), aluminum (Al), copper (Cu), nickel (Ni), magnesium (Mg), zinc (Zn), titanium (Ti), chromium (Cr), silver (Ag), gold (Au), platinum (Pt), and palladium (Pd) or any alloy thereof. 5. The coloring pattern structure of claim 1 , wherein the light-transmitting dielectric layer comprises one of TiO 2 , Al 2 O 3 , MgO, SiO 2 , Si 3 N 4 , and indium tin oxide (ITO). 6. The coloring pattern structure of claim 1 , wherein the light-transmitting dielectric layer has a thickness of about 5 nm to about 300 nm. 7. A coloring pattern structure comprising: a substrate made of a metallic material; a light-transmitting dielectric layer disposed on at least one surface of the substrate; and a metal pattern disposed on an upper surface of the light-transmitting dielectric layer, wherein the metal pattern includes metal coated on portions of the light-transmitting dielectric layer. 8. The coloring pattern structure of claim 7 , wherein the metal comprises one of silver (Ag), aluminum (Al), gold (Au), cobalt (Co), copper (Cu), nickel (Ni), palladium (Pd), platinum (Pt), and rhenium (Re). 9. The coloring pattern structure of claim 7 , wherein the substrate comprises a pure metal selected from iron (Fe), aluminum (Al), copper (Cu), nickel (Ni), magnesium (Mg), zinc (Zn), titanium (Ti), chromium (Cr), silver (Ag), gold (Au), platinum (Pt), and palladium (Pd) or any alloy thereof. 10. The coloring pattern structure of claim 7 , wherein the light-transmitting dielectric layer comprises one of TiO 2 , Al 2 O 3 , MgO, SiO 2 , Si 3 N 4 , and indium tin oxide (ITO). 11. The coloring pattern structure of claim 7 , wherein the light-transmitting dielectric layer has a thickness of about 5 nm to about 200 nm. 12. A method of manufacturing a coloring pattern structure, the method comprising: forming a light-transmitting dielectric layer on at least one surface of a substrate, the substrate being made of a metallic material; and forming a composite material layer including a metal and a first material not having a thermodynamic solid solubility in the metal on an upper surface of the light-transmitting dielectric layer, wherein the metal included in the composite material layer has a pattern coated only on portions of the upper surface of the light-transmitting dielectric layer, and the first material is coated on the remaining area where the metal is not coated. 13. The method of claim 12 , wherein the pattern of the metal is formed by selectively removing the first material from the composite material layer, to remain the metal. 14. The method of claim 12 , wherein the forming of the composite material layer comprises co-depositing the metal and the first material on one surface of the light-transmitting dielectric layer. 15. The method of claim 14 , wherein the co-depositing is performed by separately preparing deposition sources of the metal and the first material respectively, and depositing the metal and the first material on the upper surface of the light-transmitting dielectric layer from each of the deposition sources. 16. The method of claim 14 , wherein the co-depositing is performed by using a mixture or alloy of the metal and the first material as a single deposition source. 17. The method of claim 12 , wherein when the first material comprises carbon, the metal comprises one of silver (Ag), aluminum (Al), gold (Au), cobalt (Co), copper (Cu), nickel (Ni), palladium (Pd), platinum (Pt), rhenium (Re), and zinc (Zn). 18. The method of claim 12 , wherein when the first material comprises one of silicon (Si), germanium (Ge), and an Si—Ge alloy, the metal comprises one of silver (Ag), gold (Au), aluminum (Al), and zinc (Zn). 19. The method of claim 12 , wherein the pattern of the metal has a shape in which a plurality of metal nanoparticles spaced apart from each other are distributed. 20. The method of claim 12 , wherein the pattern of the metal has a channel shape extending with a plurality of widths and lengths.
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