Zero-profile interbody spacer and coupled plate assembly

US11517444B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11517444-B2
Application numberUS-202016737676-A
CountryUS
Kind codeB2
Filing dateJan 8, 2020
Priority dateNov 7, 2008
Publication dateDec 6, 2022
Grant dateDec 6, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An implant for insertion into the disc space between vertebrae. The implant including a spacer portion, a plate portion coupled to the spacer portion, a plurality of bone fixation elements for engaging the vertebrae and a retention mechanism for preventing the bone fixation elements from postoperatively uncoupling from the implant.

First claim

Opening claim text (preview).

We claim: 1. An intervertebral implant system comprising: an intervertebral implant defining a trailing end and a leading end opposite the trailing end along an insertion direction into an intervertebral disc space defined between first and second vertebrae, the intervertebral implant further defining a top surface configured to contact the first vertebra, and a bottom surface opposite the top surface with respect to a second direction that is perpendicular to the insertion direction, the bottom surface configured to contact the second vertebra, wherein the intervertebral implant further defines first and second bone fixation holes offset from each other along a third direction that is perpendicular to each of the insertion direction and the second direction; an implant inserter instrument configured to removably attach to the implant at a contact region that includes all locations at which the implant inserter instrument contacts the implant when the implant inserter instrument is attached to the implant, wherein 1) an entirety of the contact region is positioned between the first bone fixation hole and the second bone fixation hole with respect to the third direction, and 2) the contact region and the first bone fixation hole are each positioned such that a straight line drawn in the third direction intersects both the contact region and the first bone fixation hole; and a stop configured to abut at least one of the first and second vertebrae so as to prevent further insertion of the implant into the intervertebral disc space in the insertion direction, wherein the first bone fixation hole is configured to receive a first bone fixation element when the implant inserter instrument is attached to the implant, and the second bone fixation hole is configured to receive a second bone fixation element when the implant inserter instrument is attached to the implant, and wherein the contact region defines a maximum width measured in the third direction, the implant defines a minimum width measured from the first bone fixation hole to the second bone fixation hole in the third direction, and the minimum width is greater than the maximum width. 2. The intervertebral implant system of claim 1 , wherein the first and second bone fixation holes are configured to receive the first and second bone fixation elements, respectively, while 1) the implant inserter instrument is attached to the implant, and 2) the stop is in abutment with the at least one of the first and second vertebrae. 3. The intervertebral implant system of claim 1 , wherein the implant inserter instrument comprises a handle portion configured to be rotated so as to threadedly engage a threaded end of the implant inserter instrument with a threaded borehole of the implant. 4. The intervertebral implant system of claim 3 , further comprising a retention mechanism configured to cover at least a portion of the first bone fixation element, thereby preventing back out of the first bone fixation element from the first bone fixation hole. 5. The intervertebral implant system of claim 4 , wherein the retention mechanism is configured to be threadedly mate with the implant in the threaded borehole. 6. The intervertebral implant system of claim 1 , further comprising a retention mechanism configured to cover at least a portion of the first bone fixation element, thereby preventing back out of the first bone fixation element from the first bone fixation hole. 7. The intervertebral implant system of claim 6 , wherein the retention mechanism further covers at least a portion of the second bone fixation element, thereby preventing back out of the second bone fixation element from the second bone fixation hole. 8. The intervertebral implant system of claim 1 , wherein the implant inserter instrument comprises the stop, wherein the abutment of the stop with the one of the first and second vertebrae prevents further insertion of the implant into the intervertebral disc space in the insertion direction. 9. The intervertebral implant system of claim 8 , wherein the stop is further configured to abut the other of the first and second vertebrae, wherein abutment of the stop with the other of the first and second vertebrae prevents further insertion of the implant into the intervertebral disc space in the insertion direction. 10. The intervertebral implant system of claim 1 , wherein the stop is a first stop, and the system further comprises a second stop, wherein the first stop is configured to abut the first vertebra, and the second stop is configured to abut the second vertebra. 11. The intervertebral implant system of claim 1 , wherein the stop extends outboard of one of the top and bottom surfaces with respect to the second direction. 12. The intervertebral implant system of claim 1 , wherein the implant inserter instrument defines a first portion that is configured to abut the implant in a first recess of the implant, and a second portion that is configured to abut the implant in a second recess of the implant. 13. The intervertebral implant system of claim 1 , wherein 1) a trailing surface of the implant at the trailing end defines a first height measured in the second direction, 2) the implant inserter instrument defines a maximum instrument height measured in the second direction when the implant inserter instrument is attached to the implant, and 3) the maximum instrument height is greater than the first height.

Assignees

Inventors

Classifications

  • Osteosynthesis instruments;} Methods or means for implanting or extracting internal {or external} fixation devices {(A61B17/7074 takes precedence) · CPC title

  • Cobalt-based alloys, e.g. Co-Cr alloys or Vitallium · CPC title

  • Coating or prosthesis-covering structure made of a phosphorus-containing compound, e.g. hydroxy(l)apatite · CPC title

  • the additional component being a cover over the screw head · CPC title

  • of spacers · CPC title

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Frequently asked questions

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What does patent US11517444B2 cover?
An implant for insertion into the disc space between vertebrae. The implant including a spacer portion, a plate portion coupled to the spacer portion, a plurality of bone fixation elements for engaging the vertebrae and a retention mechanism for preventing the bone fixation elements from postoperatively uncoupling from the implant.
Who is the assignee on this patent?
Depuy Synthes Products Inc
What technology area does this patent fall under?
Primary CPC classification A61B17/809. Mapped technology areas include Human Necessities.
When was this patent published?
Publication date Tue Dec 06 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).