Radiation source for emitting terahertz radiation
US-2021215994-A1 · Jul 15, 2021 · US
US11513420B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11513420-B2 |
| Application number | US-201816769161-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 5, 2018 |
| Priority date | Dec 7, 2017 |
| Publication date | Nov 29, 2022 |
| Grant date | Nov 29, 2022 |
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A radiation source for emitting terahertz radiation ( 6 ) is specified, comprising at least two laser light sources emitting laser radiation ( 11, 12 ) of different frequencies, and a photomixer ( 5 ) comprising a photoconductive semiconductor material ( 51 ) and an antenna structure ( 52 ), the photomixer ( 5 ) being configured to emit the laser radiation ( 11, 12 ) of the laser light sources ( 1, 2 ) and emitting terahertz radiation ( 6 ) with at least one beat frequency of the laser light sources, and wherein the at least two laser light sources are surface-emitting semiconductor lasers ( 1, 2 ) which are arranged in a one-dimensional or two-dimensional array on a common carrier ( 10 ).
Opening claim text (preview).
The invention claimed is: 1. A radiation source for emitting terahertz radiation, comprising: at least two laser light sources emitting laser radiation of different frequencies, and a photomixer comprising a photoconductive semiconductor material and an antenna structure, wherein the photomixer is configured to receive the laser radiation of the at least two laser light sources and to emit terahertz radiation with at least one beat frequency of the laser light sources, wherein the at least two laser light sources are surface-emitting semiconductor lasers arranged in a one-dimensional or two-dimensional array on a common carrier, the surface-emitting semiconductor lasers each comprise a laser resonator formed by a first resonator mirror and a second resonator mirror, and wherein the laser resonators have a length difference for adjusting the at least one beat frequency of the emitted laser radiation, and the length difference of the laser resonators of the at least two surface-emitting semiconductor lasers is between 0.1 nanometer (nm) and 6 nm. 2. The radiation source according to claim 1 , wherein the common carrier is a growth substrate on which the surface-emitting semiconductor lasers are grown. 3. The radiation source according to claim 1 , wherein the common carrier is a Gallium Arsenide (GaAs) substrate. 4. The radiation source according to claim 1 , wherein the surface-emitting semiconductor lasers are based on an arsenide compound semiconductor, a phosphide compound semiconductor or an antimonide compound semiconductor. 5. The radiation source according to claim 1 , wherein the surface-emitting semiconductor lasers have wavelengths in the wavelength range between 840 nanometer (nm) and 1600 nm. 6. The radiation source according to claim 1 , wherein the number of surface-emitting semiconductor lasers in the radiation source is exactly two and the radiation source emits terahertz radiation of a single frequency. 7. The radiation source according to claim 1 , wherein the number of surface-emitting semiconductor lasers in the radiation source is at least three and the radiation source emits terahertz radiation of different frequencies. 8. The radiation source according to claim 1 , wherein the terahertz radiation has one or more frequencies in the frequency range between 0.1 terahertz (THz) and 30 THz. 9. The radiation source according to claim 1 , wherein the surface-emitting semiconductor lasers each have a beam-shaping element which is integrated on the one- or two-dimensional array. 10. The radiation source according to claim 1 , wherein the surface-emitting semiconductor lasers each comprise a laser resonator formed by a first resonator mirror and a second resonator mirror, and wherein the laser resonators have a length difference for adjusting the at least one beat frequency of the emitted laser radiation. 11. The radiation source according to claim 10 , wherein the laser resonator of at least one of the surface-emitting semiconductor lasers has a spacer layer for adjusting the length difference. 12. The radiation source according to claim 10 , wherein the length difference of the laser resonators of the at least two surface-emitting semiconductor lasers is between 0.1 nanometer (nm) and 6 nm. 13. The radiation source according to claim 1 , wherein the one-dimensional or two-dimensional array of surface-emitting semiconductor lasers is fixedly connected to the photomixer. 14. The radiation source according to claim 1 , wherein the common carrier of the surface-emitting semiconductor lasers faces the photomixer. 15. The radiation source according to claim 1 , wherein the surface-emitting semiconductor lasers emit the laser radiation through the common carrier.
Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping (H01S5/026, H01S5/18388 take precedence) · CPC title
Mechanically integrated components on mount members or optical micro-benches · CPC title
emitting more than one wavelength · CPC title
Details on the cavity length · CPC title
having a vertical cavity · CPC title
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