Light guide substrate and method of manufacturing the same, opposite substrate and liquid crystal display apparatus

Patent metadata

Field	Value
Publication number	US-11513277-B2
Application number	US-201917044268-A
Country	US
Kind code	B2
Filing date	Sep 3, 2019
Priority date	Sep 3, 2019
Publication date	Nov 29, 2022
Grant date	Nov 29, 2022

Abstract

A method of manufacturing a light guide substrate includes: providing a first base substrate; forming an interface protection layer on a side of the first base substrate; forming a grating structure layer at the side of the first base substrate where the interface protection layer has been formed; removing portions of the grating structure layer corresponding to the non-light extraction opening regions, so as to obtain a plurality of light extraction grating units in one-to-one correspondence with the plurality of light extraction opening regions; and removing portions of the interface protection layer corresponding to the non-light extraction opening regions. The first base substrate includes a plurality of light extraction opening regions and non-light extraction opening regions other than the plurality of light extraction opening regions.

First claim

What is claimed is:

1. A method of manufacturing a light guide substrate, comprising:
providing a first base substrate; wherein the first base substrate includes a plurality of light extraction opening regions and non-light extraction opening regions other than the plurality of light extraction opening regions;
forming an interface protection layer on a side of the first base substrate;
patterning the interface protection layer and removing portions of the interface protection layer corresponding to the plurality of light extraction opening regions;
forming a grating structure layer at the side of the first base substrate where the interface protection layer has been formed;
removing portions of the grating structure layer corresponding to the non-light extraction opening regions, so as to obtain a plurality of light extraction grating units in one-to-one correspondence with the plurality of light extraction opening regions; and
removing portions of the interface protection layer corresponding to the non-light extraction opening regions.

2. The method of manufacturing the light guide substrate according to claim 1 , wherein in the patterning the interface protection layer, and removing portions of the interface protection layer corresponding to the plurality of light extraction opening regions, and the removing portions of the interface protection layer corresponding to the non-light extraction opening regions, a wet etching process is used to remove corresponding portions of the interface protection layer.

3. The method of manufacturing the light guide substrate according to claim 1 , wherein a material of the interface protection layer is metal, metal alloy or metal oxide.

4. The method of manufacturing the light guide substrate according to claim 1 , wherein in the removing portions of the grating structure layer corresponding to the non-light extraction opening regions, when the portions of the grating structure layer corresponding to the non-light extraction opening regions are completely removed, in the portions of the interface protection layer corresponding to the non-light extraction opening regions, a thickness of a part thereof that is not covered by the grating structure layer is greater than or equal to 0.

5. The method of manufacturing the light guide substrate according to claim 4 , wherein an etching process is used to remove the portions of the grating structure layer corresponding to the non-light extraction opening regions; and
in the removing portions of the grating structure layer corresponding to the non-light extraction opening regions, etching selectivity of etching a material of the grating structure layer to etching a material of the interface protection layer is greater than or equal to 10.

6. The method of manufacturing the light guide substrate according to claim 4 , wherein in the removing portions of the grating structure layer corresponding to the non-light extraction opening regions, a dry etching process is used to remove corresponding portion of the grating structure layer.

7. The method of manufacturing the light guide substrate according to claim 1 , wherein the removing portions of the grating structure layer corresponding to the non-light extraction opening regions includes:
forming a protective adhesive layer on a side of portions of the grating structure layer corresponding to the light extraction opening regions away from the first base substrate, so that the protective adhesive layer covers the portions of the grating structure layer corresponding to the light extraction opening regions;
removing the portions of the grating structure layer corresponding to the non-light extraction opening regions; and
removing the protective adhesive layer.

8. A light guide substrate, wherein the light guide substrate is manufactured by the method according to claim 1 , the light guide substrate comprises:
the first base substrate, wherein the first base substrate includes the plurality of light extraction opening regions and non-light extraction opening regions other than the plurality of light extraction opening regions; and
the plurality of light extraction grating units disposed at the side of the first base substrate.

9. The light guide substrate according to claim 8 , further comprising:
a planarization layer covering the plurality of light extraction grating units;
a first buffer layer disposed on a side of the planarization layer away from the first base substrate; and
a second buffer layer disposed on a side of the first buffer layer away from the first base substrate;
wherein a material of the first buffer layer is different from a material of the second buffer layer.

10. The light guide substrate according to claim 9 , wherein a refractive index of the first buffer layer is between a refractive index of the planarization layer and a refractive index of the second buffer layer; or
the material of the first buffer layer is oxide, the material of the second buffer layer is nitride, and the material of the first buffer layer and the material of the second buffer layer include a same element.

11. The light guide substrate according to claim 10 , wherein the material of the first buffer layer is silicon oxide, and the material of the second buffer layer is silicon nitride.

12. The light guide substrate according to claim 11 , wherein a thickness of the first buffer layer is 0.3 μm, a thickness of the second buffer layer is 0.1 μm, and a thickness of the planarization layer is 0.825 μm.

13. The light guide substrate according to claim 9 , further comprising a pixel driving structure disposed on a side of the second buffer layer away from the first base substrate, and the pixel driving structure including a plurality of thin film transistors;
a pixel electrode layer disposed on a side of the pixel driving structure away from the first base substrate; and
a common electrode layer disposed on a side of the pixel electrode layer away from the first base substrate;
wherein a density of the second buffer layer is higher than a density of the planarization layer, and the density of the second buffer layer is higher than a density of the first buffer layer.

14. A liquid crystal display apparatus, comprising:
the light guide substrate according to claim 8 ; and
an opposite substrate disposed opposite to the light guide substrate;
wherein the opposite substrate includes:
a second base substrate;
a black matrix layer disposed at a side of the second base substrate proximate to the light guide substrate;
wherein the black matrix layer has a plurality of openings, and orthographic projections of a plurality of light extraction grating units on the first base substrate are within a range of an orthographic projection of the black matrix layer on the first base substrate; and
a liquid crystal layer disposed between the light guide substrate and the opposite substrate;
wherein the liquid crystal layer is configured such that, under action of an electric field, light exiting from the light guide substrate reaches the black matrix layer; or, the light exiting from the light guide substrate reaches light exit regions formed by the plurality of openings of the black matrix layer.

15. The liquid crystal display apparatus according to claim 14 , wherein the opposite substrate further includes:
an organic transmission layer disposed on a side of the black matrix layer away from the second base substrate; and
a third buffer layer disposed at a side of the black matrix layer proximate to the second base substrate;
wherein a direction of an internal stress of the third buffe

Assignees

• Boe Technology Group Co Ltd
• Beijing Boe Technology Dev Co Ltd

Inventors

• Tan Jifeng
• Meng Xiandong
• Zhao Wenqing
• Chen Xiaochuan

Classifications

• G02F2201/30

  grating · CPC title

• G02B6/0065

  Manufacturing aspects; Material aspects · CPC title

• G02B6/0038 Primary

  Linear indentations or grooves, e.g. arc-shaped grooves or meandering grooves, extending over the full length or width of the light guide · CPC title

• G02F1/133512

  Light shielding layers, e.g. black matrix (G02F1/136209 takes precedence) · CPC title

• G02F1/133615 Primary

  Edge-illuminating devices, i.e. illuminating from the side · CPC title