Application device with redox initiator system, method of production and use thereof

US11510851B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11510851-B2
Application numberUS-201716337245-A
CountryUS
Kind codeB2
Filing dateOct 2, 2017
Priority dateOct 5, 2016
Publication dateNov 29, 2022
Grant dateNov 29, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The invention relates to an application device with a handle part and an application part, the application part having a surface onto which a redox initiator system is located, the redox initiator system comprising either hydrophilic oxidizing agent(s) and hydrophobic reducing agent (s), or hydrophobic oxidizing agent(s) and hydrophilic reducing agent(s). The invention also relates to a kit comprising the application device, a method of producing the application device and a method or curing a curable composition using the application device.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for producing an application device, comprising a handle part and an application part, the application part having a surface onto which a redox initiator system is located, the redox initiator system comprising a hydrophobic ascorbic acid component as hydrophobic reducing agent, a hydrophilic peroxide component as hydrophilic oxidizing agent, and a hydrophilic transition metal component, the method comprising: (a) applying the hydrophobic ascorbic acid component reducing agent together with a solvent to the surface of the application part of the application device, (b) evaporating the solvent, (c) applying the hydrophilic peroxide component oxidizing agent and the hydrophilic transition metal component together with a solvent to the surface of the application part of the application device, (d) evaporating the solvent, wherein the steps are applied in the order (a), (b), (c), (d) or (c), (d), (a), (b). 2. The method of claim 1 , wherein the log P or log D values of the hydrophilic oxidizing agent and hydrophobic reducing agent differ from each other by a number of at least 2 calculated for a pH of 2.7, wherein P is the octanol-water partition coefficient for neutral components and D is the octanol-water distribution coefficient for components having ionisable groups. 3. The method of claim 1 , the application part further comprising a film forming component. 4. The method of claim 1 , wherein the hydrophilic transition metal component is a hydrophilic copper component selected from copper II acetate, copper II chloride, copper II bromide and mixtures thereof. 5. The method of claim 4 , the components being present in the following amounts with respect to mol: hydrophobic ascorbic acid component: from 1·10 −7 to 5·10 −6 ; hydrophilic peroxide component: from 5·10 −7 to 1·10 −5 ; hydrophilic copper component: from 1·10 −8 to 1·10 −6 . 6. A method for producing an application device, comprising a handle part and an application part, the application part having a surface onto which a redox initiator system is located, the redox initiator system comprising a hydrophilic ascorbic acid component as hydrophilic reducing agent, a hydrophobic peroxide component as hydrophobic oxidizing agent, and a hydrophobic transition metal component; the method comprising: (i) applying the hydrophilic ascorbic acid reducing agent together with a solvent to the surface of the application part of the application device, (ii) evaporating the solvent, (iii) applying the hydrophobic peroxide oxidizing component and the hydrophobic transition metal component together with a solvent to the surface of the application part of the application device, (iv) evaporating the solvent, wherein the steps are applied in the order (i), (ii), (iii), (iv) or (iii), (iv), (i), (ii). 7. The method of claim 6 , wherein the log P or log D values of the hydrophobic oxidizing agent and hydrophilic reducing agent differ from each other by a number of at least 2 calculated for a pH of 2.7, wherein P is the octanol-water partition coefficient for neutral components and D is the octanol-water distribution coefficient for components having ionisable groups. 8. The method of claim 6 , the application part further comprising a film forming component. 9. The method of claim 6 , wherein the hydrophobic transition metal component is a hydrophobic copper component selected from copper 2-ethylhexanoate, copper naphthenate, copper bis(1-phenylpentan-1,3-dione) complex, copper salicylate and mixtures thereof. 10. The method of claim 9 , the components being present in the following amounts with respect to mol: hydrophilic ascorbic acid component: from 1·10 −7 to 5·10 −6 ; hydrophobic peroxide component: from 5·10 −7 to 1·10 −5 ; hydrophobic copper component: from 1·10 −8 to 1·10 −6 .

Assignees

Inventors

Classifications

  • A61K6/61Primary

    Cationic, anionic or redox initiators · CPC title

  • Compositions for temporarily or permanently fixing teeth or palates, e.g. primers for dental adhesives · CPC title

  • A61C3/005Primary

    Brushes for applying dental compositions · CPC title

  • Thermal radical initiators · CPC title

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What does patent US11510851B2 cover?
The invention relates to an application device with a handle part and an application part, the application part having a surface onto which a redox initiator system is located, the redox initiator system comprising either hydrophilic oxidizing agent(s) and hydrophobic reducing agent (s), or hydrophobic oxidizing agent(s) and hydrophilic reducing agent(s). The invention also relates to a kit com…
Who is the assignee on this patent?
3M Innovative Properties Company
What technology area does this patent fall under?
Primary CPC classification A61K6/61. Mapped technology areas include Human Necessities.
When was this patent published?
Publication date Tue Nov 29 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).