Microwave-based thermal coupling chemical looping gasification method employing two sources, and device for same

US11504691B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11504691-B2
Application numberUS-201716613920-A
CountryUS
Kind codeB2
Filing dateDec 7, 2017
Priority dateMay 18, 2017
Publication dateNov 22, 2022
Grant dateNov 22, 2022

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Abstract

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A microwave-based thermal coupling chemical looping gasification method and device. The device includes: a microwave radiation cavity; a loading recess of a microwave absorbing material; and a quartz pipe reaction cavity between the microwave radiation cavity and the loading recess of a microwave absorbing material. A microwave generator consisting of magnetrons is provided at a central portion of the microwave radiation cavity and below the loading recess. An infrared temperature-measuring probe group is arranged at two ends of the magnetrons. Two ends of the microwave radiation cavity are connected to a first and second three-way valves, in communication with the ambient atmosphere and a protection gas charging device. A protection gas cooling device and a protection gas circulating fan are sequentially connected in series on a pipeline between the valves.

First claim

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The invention claimed is: 1. A microwave-based thermal coupling chemical looping gasification device employing two sources, the device comprising the following components: a microwave radiation cavity; a loading recess of a microwave absorbing material filled with the microwave absorbing material; a quartz pipe reaction cavity between the microwave radiation cavity and the loading recess of the microwave absorbing material; the quartz pipe reaction cavity is driven to rotate by a motor; a first microwave generator consisting of a first magnetron, the first microwave generator is provided on a first outer side of the quartz pipe reaction cavity and located in the microwave radiation cavity; a second microwave generator consisting of a second magnetron, the second microwave generator is provided on a second outer side of the quartz pipe reaction cavity; and an infrared temperature-measuring probe group arranged at two ends of the first magnetron; wherein the loading recess is provided on the second outer side of the quartz pipe reaction cavity and located between the quartz pipe reaction cavity and the second microwave generator; two ends of the microwave radiation cavity are connected to a first three-way valve and a second three-way valve, respectively; the first three-way valve has a port A in communication with the ambient atmosphere; the second three-way valve has a port B in communication with a protection gas charging device for the microwave radiation cavity; the second three-way valve has a port A in communication with a port B of the first three-way valve via a pipeline; and a protection gas cooling device and a protection gas circulating fan are sequentially connected in series on the pipeline. 2. The microwave-based thermal coupling chemical looping gasification device employing two sources according to claim 1 , wherein a microwave suppressor is disposed at each of the two ports of the quartz pipe reaction cavity; the first three-way valve is configured to turn to a first position of the first three-way valve, such that the microwave radiation cavity is in communication with the ambient atmosphere; the second three-way valve is configured to turn to a first position of the second three-way valve, such that the protection gas charging device for the microwave radiation cavity is in communication with the microwave radiation cavity to charge the microwave radiation cavity; the second three-way valve is configured to turn to a second position of the second three-way valve, and the first three-way valve is configured to turn to a second position of the first three-way valve, such that the microwave radiation cavity, the protection gas circulating fan, and the protection gas cooling device form a closed loop. 3. The microwave-based thermal coupling chemical looping gasification device employing two sources according to claim 2 , wherein a detector is disposed on the connecting pipeline between the first three-way valve and the microwave radiation cavity, the detector being configured to detect a pressure of gas and a concentration of oxygen. 4. The microwave-based thermal coupling chemical looping gasification device employing two sources according to claim 3 , wherein the microwave radiation cavity is also provided with a radiation cavity lock. 5. A microwave-based thermal coupling chemical looping gasification method employing the two sources, the method, implemented by using the microwave-based thermal coupling chemical looping gasification device employing the two sources according to claim 4 , comprises the following steps: Step 1: materials are placed in the middle of the quartz pipe reaction cavity, and a first end and a second end of the quartz pipe reaction cavity are made in communication with an inert carrier gas and a product collection device, respectively; first the air in the quartz pipe reaction cavity is removed by pre-purging, and then the carrier gas supply is maintained throughout the gasification process until the end of the reaction; Step 2: the first three-way valve is turned to the first position to make the microwave radiation cavity in communication with the ambient atmosphere, and meanwhile the second three-way valve is turned to the first position to make the microwave radiation cavity in communication with the protection gas charging device for the microwave radiation cavity; the microwave radiation cavity is charged, and attention is paid to the oxygen level and the internal protection gas pressure displayed by the detector; when the oxygen concentration is less than 0.1%, the second three-way valve is turned to the second position and the first three-way valve is turned to the second position, such that the microwave radiation cavity, the detector, the protection gas circulating fan g and the protection gas cooling device form the closed loop; the protection gas circulating fan and the protection gas cooling device are started to circulate the inert gas in the closed loop; it is necessary to maintain a positive pressure of the microwave radiation cavity throughout the reaction process; if the detector shows that the pressure is less than 1 atm, the protection gas charging device for the microwave radiation cavity is started to supplement the protection gas; Step 3: the motor is started to maintain the quartz pipe reaction cavity in a slow rotation state; then the first magnetron and second magnetron are started, with input power and frequency of the first magnetron and second magnetron controlled through a computer; the surface temperature of the materials is monitored by the infrared temperature-measuring probe group, and the temperature data are collected and stored by the computer; the temperature in the loading recess of the microwave absorbing material is monitored by a patch thermocouple, and the temperature data are also collected and stored by the computer. 6. The microwave-based thermal coupling chemical looping gasification method employing the two sources according to claim 5 , the method further comprising an end step: at the end of the reaction, the first magnetron and second magnetron are turned off, the positive pressure of the microwave radiation cavity is released, the radiation cavity lock is opened, and the quartz pipe reaction cavity is taken out for cleaning.

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What does patent US11504691B2 cover?
A microwave-based thermal coupling chemical looping gasification method and device. The device includes: a microwave radiation cavity; a loading recess of a microwave absorbing material; and a quartz pipe reaction cavity between the microwave radiation cavity and the loading recess of a microwave absorbing material. A microwave generator consisting of magnetrons is provided at a central portion…
Who is the assignee on this patent?
Univ South China Tech
What technology area does this patent fall under?
Primary CPC classification B01J19/126. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Nov 22 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).