Harmonic light-generating metasurface

Patent metadata

Field	Value
Publication number	US-11500265-B2
Application number	US-201917281814-A
Country	US
Kind code	B2
Filing date	Oct 1, 2019
Priority date	Oct 1, 2018
Publication date	Nov 15, 2022
Grant date	Nov 15, 2022

Abstract

A harmonic light-generating metasurface includes a base substrate and a plurality of structures, that include nonlinear material, that are disposed in a pattern on a surface of the base substrate. Each structure of the plurality of structures individually supports a magnetic dipole mode. An electromagnetic field enhancement of the magnetic dipole mode induces generation of a harmonic signal by the plurality of structures. Alternatively, a harmonic light-generating metasurface, includes a base substrate, a supporting substrate that includes a nonlinear material, and a plurality of paired structures disposed in a pattern on a surface of the supporting substrate. Each paired structure, of the plurality of paired structures, collectively supports a toroidal dipole mode. An electromagnetic field enhancement of the toroidal dipole mode penetrates the supporting substrate to induce generation of a harmonic signal by the supporting substrate.

First claim

What is claimed is:

1. A harmonic light-generating metasurface, comprising:
a base substrate;
a supporting substrate comprising a nonlinear material; and
a plurality of paired structures disposed in a pattern on a surface of the supporting substrate, wherein
each paired structure, of the plurality of paired structures, collectively supports a toroidal dipole mode, and
an electromagnetic field enhancement of the toroidal dipole mode penetrates the supporting substrate to induce generation of a harmonic signal by the supporting substrate.

2. The harmonic light-generating metasurface of claim 1 , wherein the pattern controls an emission profile of the harmonic signal generated by the plurality of paired structures.

3. The harmonic light-generating metasurface of claim 1 , wherein the pattern is rectilinear.

4. The harmonic light-generating metasurface of claim 1 , wherein the pattern is polar and comprises polar coordinate axes.

5. The harmonic light-generating metasurface of claim 1 , wherein the nonlinear material is a wide-bandgap semiconductor.

6. The harmonic light-generating metasurface of claim 5 , wherein the wide-bandgap semiconductor is indium tin oxide (ITO).

7. The harmonic light-generating metasurface of claim 1 , wherein the plurality of paired structures comprise a plasmonic material.

8. The harmonic light-generating metasurface of claim 1 , wherein the plurality of paired structures are covered by an oxide film disposed on the surface of the supporting substrate.

9. The harmonic light-generating metasurface of claim 1 , wherein
the toroidal dipole mode interacts with a second mode of the structure to generate a higher-order multi-pole mode, and
the combined toroidal dipole mode electromagnetic fields and high-order multi-pole mode electromagnetic fields penetrate the supporting substrate to induce generation of the harmonic signal.

10. A harmonic light-generating optical system, comprising:
a pump laser; and
the harmonic light-generating metasurface of claim 1 .

11. The harmonic light-generating optical system according to claim 10 , wherein an ambient atmosphere of the system has access to a first optical path of the pump laser and a second optical path of a harmonic signal generated by the harmonic light-generating metasurface.

12. A method of manufacturing a harmonic light-generating metasurface, the method comprising:
disposing a supporting substrate comprising a nonlinear material on a base substrate; and
patterning a plurality of paired structures on a surface of the supporting substrate, wherein
each paired structure, of the plurality of paired structures, collectively supports a toroidal dipole mode, and
an electromagnetic field enhancement of the toroidal dipole mode penetrates the supporting substrate to induce generation of a harmonic signal by the supporting substrate.

13. The method according to claim 12 , wherein patterning the plurality of paired structures comprises:
disposing a resist film on the surface of the supporting substrate;
pattering the resist film using electron beam lithography;
developing the resist film into a mask with a developer;
disposing a plasmonic material into and onto the mask;
lifting-off the mask with a second developer to leave the pattern of a plurality of paired structures of the plasmonic material directly on the surface of the supporting substrate.

14. The method according to claim 12 , wherein patterning the film comprises stamping the plurality of paired structure onto the surface of the supporting substrate.

15. The method according to claim 12 , wherein the pattern of the plurality of paired structures controls an emission profile of the harmonic signal.

16. The method according to claim 12 , further comprising disposing an oxide film on the surface of the supporting substrate to cover the plurality of paired structures.

17. The method according to claim 12 , wherein
the toroidal dipole mode interacts with a second mode of the structure to generate a higher-order multi-pole resonance, and
the combined toroidal dipole mode electromagnetic fields and high-order multi-pole electromagnetic fields penetrate the supporting substrate to induce generation of the third harmonic signal by the supporting substrate.

18. The method according to claim 12 , wherein the nonlinear material is a wide-bandgap semiconductor.

19. The method according to claim 18 , wherein the wide-bandgap semiconductor is indium tin oxide (ITO).

20. The method according to claim 12 , wherein the plurality of paired structures comprise a plasmonic material.

Assignees

• Univ Rice William M
• Academia Sinica
• William Marsh Rice Univeristy

Inventors

• Semmlinger Michael
• Tseng Ming-Lun
• Yang Jian
• Zhang Ming
• Tsai Din Ping
• Dong Liangliang
• Ahmadivand Arash
• Nordlander Peter
• Halas Naomi Jean

Classifications

• G02F1/354

  Third or higher harmonic generation · CPC title

• G02F1/37 Primary

  for second-harmonic generation {(G02F1/3532 takes precedence)} · CPC title

• G02F2202/30

  Metamaterials · CPC title

• G02F1/353 Primary

  Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams · CPC title