Monomers, polymers and photoresist compositions

Patent metadata

Field	Value
Publication number	US-11480878-B2
Application number	US-201615253845-A
Country	US
Kind code	B2
Filing date	Aug 31, 2016
Priority date	Aug 31, 2016
Publication date	Oct 25, 2022
Grant date	Oct 25, 2022

Abstract

In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I):Photoresists that comprises such polymers also are provided.

First claim

What is claimed is:

1. A polymer comprising a structure of the following Formula (I):

wherein:
X and X′ are the same or different linker;
R is a non-hydrogen substituent; and
A and B are each independently hydrogen or fluorine;
R′ and R″ are each independently hydrogen or a non-hydrogen substituent,
with at least one of R′ and R″ being a non-hydrogen substituent other than a halogen or a halogen-substituted group.

2. A polymer of claim 1 wherein R′ and R″ are each independently hydrogen, fluorine, halogenated alkyl, non-halogenated alkyl, or heteroalkyl.

3. A polymer of claim 1 wherein X and X′ are different.

4. A polymer of claim 1 wherein X and X′ are the same.

5. A polymer of claim 1 wherein at least one of X and X′ is —CH 2 —.

6. A polymer of claim 1 comprising a structure of the following Formula (IIB)

wherein in Formula (IIB):
X, X′ and X″ are each the same or different linker;
A, B and C are each independently hydrogen or fluorine; and
R′, R″ and R′″ are each independently hydrogen or a non-hydrogen substituent.

7. A polymer of claim 1 wherein the polymer comprises acrylate units.

8. A polymer of claim 1 wherein the polymer comprises units obtained by polymerization of one or more monomers of the following Formula (III):

wherein in Formula (III):
Y is optionally substituted alkyl;
X and X′ are the same or different linker;
R is a non-hydrogen substituent;
A and B are each independently hydrogen or fluorine; and
R′ and R″ are each independently hydrogen or a non-hydrogen substituent,
with at least one of R′ and R″ being a non-hydrogen substituent other than a halogen or a halogen-substituted group.

9. A polymer of claim 1 wherein at least one of A and B is fluorine.

10. A photoresist composition comprising a photoactive component and a polymer of claim 1 .

11. A photoresist composition of claim 10 further comprising a second distinct polymer.

12. A method of processing a photoresist composition, comprising:
applying a layer of a photoresist composition of claim 10 on a substrate;
exposing the photoresist composition layer to activating radiation; and
developing the exposed photoresist composition to provide a photoresist relief image.

13. The method of claim 12 wherein the photoresist composition layer is immersion exposed.

14. A photoresist composition comprising
a photoactive component and a polymer of claim 6 .

15. A polymer comprising a polymerized monomer of one of the following structures:

16. A polymer of claim 6 wherein the polymer comprising a polymerized monomer of one of the following structures:

17. A photoresist composition comprising a photoactive component and a polymer of claim 15 .

18. A photoresist composition comprising a photoactive component and a polymer of claim 17 .

Assignees

• Rohm & Haas Elect Materials Korea Ltd

Inventors

• Ryu Eui Hyun
• Jang Min Kyung
• Kim Jung Woo
• Choi Kwang-Mo
• Jeon Hyun
• Lee Woo-Hyung
• Kim Myung-Yeol

Classifications

• C07C69/54 Primary

  Acrylic acid esters; Methacrylic acid esters · CPC title

• G03F7/038

  Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title

• C07C69/65

  of unsaturated acids · CPC title

• G03F7/11

  having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} · CPC title

• G03F7/2041

  in the presence of a fluid, e.g. immersion; using fluid cooling means · CPC title