Nasal swab apparatus and method for applying a cleaning solution
US-2024216562-A1 · Jul 4, 2024 · US
US11478562B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11478562-B2 |
| Application number | US-202015930283-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 12, 2020 |
| Priority date | May 13, 2019 |
| Publication date | Oct 25, 2022 |
| Grant date | Oct 25, 2022 |
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A technique is provided whereby hydrogen peroxide introduced into a working chamber containing a resin component is reduced to a low concentration in a shorter time than before. The present invention resides in a method of maintaining a sterile environment of a working chamber that contains a resin component, and includes a step (a) of introducing hydrogen peroxide into the working chamber, a step (b) of introducing air into the working chamber through a filter after completion of the step (a), a step (c) of generating ozone by irradiating the air with ultraviolet having a peak wavelength of from 160 nm to less than 200 nm upstream of the filter or inside the working chamber and introducing the ozone into the working chamber, and a step (d) of decomposing the ozone introduced into the working chamber into oxygen radicals.
Opening claim text (preview).
What is claimed is: 1. A method of maintaining a sterile environment of a working chamber that contains a resin component, comprising: a step (a) of introducing hydrogen peroxide into the working chamber; a step (b) of introducing clean air for aeration into the working chamber through a filter to push out the hydrogen peroxide inside the working chamber to an exhaust system after completion of the step (a); a step (c) of generating ozone by irradiating the clean air with ultraviolet having a peak wavelength of from 160 nm to less than 200 nm upstream of the filter or inside the working chamber and introducing the ozone into the working chamber; a step (d) of decomposing the ozone introduced into the working chamber into oxygen radicals; and a step (e) of decomposing the hydrogen peroxide remaining adhered to the resin component by the oxygen radicals, wherein the step (d) includes a step (d 1 ) of emitting visible light of a wavelength of 450 nm to 800 nm into the working chamber ( 20 ). 2. A method of maintaining a sterile environment of a working chamber that contains a resin component, comprising: a step (a) of introducing hydrogen peroxide into the working chamber; a step (b) of introducing clean air for aeration into the working chamber through a filter to push out the hydrogen peroxide inside the working chamber to an exhaust system after completion of the step (a); a step (c) of generating ozone by irradiating the clean air with ultraviolet having a peak wavelength of from 160 nm to less than 200 nm upstream of the filter or inside the working chamber and introducing the ozone into the working chamber; a step (d) of decomposing the ozone introduced into the working chamber into oxygen radicals; and a step (e) of decomposing the hydrogen peroxide remaining adhered to the resin component by the oxygen radicals, wherein the step (d) includes a step (d 2 ) of emitting infrared light of a wavelength of 1500 nm to 3000 nm into the working chamber ( 20 ). 3. A method of maintaining a sterile environment of a working chamber that contains a resin component, comprising: a step (a) of introducing hydrogen peroxide into the working chamber; a step (b) of introducing clean air for aeration into the working chamber through a filter to push out the hydrogen peroxide inside the working chamber to an exhaust system after completion of the step (a); a step (c) of generating ozone by irradiating the clean air with ultraviolet having a peak wavelength of from 160 nm to less than 200 nm upstream of the filter or inside the working chamber and introducing the ozone into the working chamber; a step (d) of decomposing the ozone introduced into the working chamber into oxygen radicals; and a step (e) of decomposing the hydrogen peroxide remaining adhered to the resin component by the oxygen radicals, wherein the step (d) includes a step (d 3 ) of emitting ultraviolet of a wavelength of 190 nm to 320 nm from an ultraviolet light source disposed inside the working chamber ( 20 ). 4. The method of maintaining a sterile environment of a working chamber according to claim 1 , wherein the step (c) is started later than the start of the step (b). 5. The method of maintaining a sterile environment of a working chamber according to claim 2 , wherein the step (c) is started later than the start of the step (b). 6. The method of maintaining a sterile environment of a working chamber according to claim 3 , wherein the step (c) is started later than the start of the step (b). 7. The method of maintaining a sterile environment of a working chamber according to claim 4 , wherein the step (c) includes a time period in which introduction of the air into the working chamber is stopped. 8. The method of maintaining a sterile environment of a working chamber according to claim 5 , wherein the step (c) includes a time period in which introduction of the air into the working chamber is stopped. 9. The method of maintaining a sterile environment of a working chamber according to claim 6 , wherein the step (c) includes a time period in which introduction of the air into the working chamber is stopped.
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