Switching valve, valve apparatus, holding apparatus, lithography apparatus, and method of manufacturing article

Patent metadata

Field	Value
Publication number	US-11466787-B2
Application number	US-202017109361-A
Country	US
Kind code	B2
Filing date	Dec 2, 2020
Priority date	Dec 20, 2019
Publication date	Oct 11, 2022
Grant date	Oct 11, 2022

Abstract

The present invention provides a switching valve comprising: a housing including a first port, a second port, and a third port; a valve element configured to be movable in the housing so as to selectively allow one of the first port and the second port to communicate with the third port in accordance with a pressure difference between the first port and the second port; and a pressing member configured to press the valve element toward a side of the first port.

First claim

What is claimed is:

1. A valve apparatus configured to assist in changing a pressure in a first space, the valve apparatus comprising:
a non-return valve; and
a switching valve comprising:
a housing including a first port, a second port, and a third port;
a valve element configured to be movable in the housing so as to selectively allow one of the first port or the second port to communicate with the third port in accordance with a pressure difference between the first port and the second port; and
a pressing member configured to press the valve element toward a side of the first port,

wherein the first port and the third port of the switching valve communicate with the first space,
wherein the second port of the switching valve communicates with a second space isolated from the first space, and
wherein the non-return valve is arranged in a flow passage between the first space and the third port so as to allow a flow of gas from the first space to the third port but prevent the flow of gas from the third port to the first space.

2. The valve apparatus according to claim 1 , further comprising a throttling member provided in a flow passage between the first space and the non-return valve and configured to restrict the flow rate of gas.

3. The valve apparatus according to claim 1 , wherein a pressure in the first space is changed between a first pressure value smaller than a pressure in the second space and a second pressure value larger than a total value of a pressing force of the pressing member and the pressure in the second space.

4. The valve apparatus according to claim 1 , wherein the pressure in the second space is an atmospheric pressure.

5. A holding apparatus that holds an object, the holding apparatus comprising:
a holding member including a first space, which is a closed space by arranging the object;
a controller configured to control holding and releasing of the object by the holding member by changing a pressure in the first space; and
a valve apparatus including a non-return valve and a switching valve, and configured to assist in changing the pressure in the first space by the controller,
wherein the switching valve comprises:
a housing including a first port, a second port, and a third port;
a valve element configured to be movable in the housing so as to selectively allow one of the first port or the second port to communicate with the third port in accordance with a pressure difference between the first port and the second port; and
a pressing member configured to press the valve element toward a side of the first port,

wherein the first port and the third port of the switching valve communicate with the first space,
wherein the second port of the switching valve communicates with a second space isolated from the first space, and
wherein the non-return valve is arranged in a flow passage between the first space and the third port so as to allow a flow of gas from the first space to the third port but prevent the flow of gas from the third port to the first space.

6. A lithography apparatus that forms a pattern on a substrate, the lithography apparatus comprising:
a holding apparatus configured to hold the substrate and comprising:
a holding member including a first space, which is a closed space by arranging the object;
a controller configured to control holding and releasing of the object by the holding member by changing a pressure in the first space; and
a valve apparatus including a non-return valve and a switching valve, and configured to assist in changing the pressure in the first space by the controller,
wherein the switching valve comprises:
a housing including a first port, a second port, and a third port;
a valve element configured to be movable in the housing so as to selectively allow one of the first port or the second port to communicate with the third port in accordance with a pressure difference between the first port and the second port; and
a pressing member configured to press the valve element toward a side of the first port,

wherein the first port and the third port of the switching valve communicate with the first space,
wherein the second port of the switching valve communicates with a second space isolated from the first space, and
wherein the non-return valve is arranged in a flow passage between the first space and the third port so as to allow a flow of gas from the first space to the third port but prevent the flow of gas from the third port to the first space.

7. A method of manufacturing an article, the method comprising:
forming a pattern on a substrate using a lithography apparatus that comprises a holding apparatus configured to hold the substrate;
processing the substrate, on which the pattern has been formed, to manufacture the article,
wherein the holding apparatus comprises:
a holding member including a first space, which is a closed space by arranging the object;
a controller configured to control holding and releasing of the object by the holding member by changing a pressure in the first space; and
a valve apparatus including a non-return valve and a switching valve, and configured to assist in changing the pressure in the first space by the controller,
wherein the switching valve comprises:
a housing including a first port, a second port, and a third port;
a valve element configured to be movable in the housing so as to selectively allow one of the first port or the second port to communicate with the third port in accordance with a pressure difference between the first port and the second port; and
a pressing member configured to press the valve element toward a side of the first port,

wherein the first port and the third port of the switching valve communicate with the first space,
wherein the second port of the switching valve communicates with a second space isolated from the first space, and
wherein the non-return valve is arranged in a flow passage between the first space and the third port so as to allow a flow of gas from the first space to the third port but prevent the flow of gas from the third port to the first space.

Assignees

• Canon Kk

Inventors

• Shiomura Yusuke

Classifications

• H10P72/78

  using vacuum or suction, e.g. Bernoulli chucks · CPC title

• F16K27/04

  of sliding valves · CPC title

• F15B2211/3052

  Shuttle valves · CPC title

• F16K11/06

  comprising only sliding valves {, i.e. sliding closure elements} · CPC title

• F15B13/028

  Shuttle valves · CPC title