Metal particle-containing composition and electrically conductive adhesive film

US11466181B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11466181-B2
Application numberUS-202117359372-A
CountryUS
Kind codeB2
Filing dateJun 25, 2021
Priority dateMar 15, 2019
Publication dateOct 11, 2022
Grant dateOct 11, 2022

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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The present disclosure relates to a metal particle-containing composition contains at least one thermosetting resin (R), a hardening agent (H), and at least three types of metal particles (P) different from one another. The metal particles (P) contain a solder alloy particle (P1) containing a tin alloy containing at least one metal (A), wherein the metal (A) is a metal that forms a eutectic crystal with tin at a eutectic temperature of 200° C. or lower, at least one metal particle (P2) containing a metal (B) having a melting point exceeding 420° C. in a bulk, the metal particle (P2) having a melting point higher than a solidus temperature of the solder alloy particle (P1), and at least one metal particle (P3) containing a metal (C) that forms an intermetallic compound with a metal contained in the solder alloy particle (P1).

First claim

Opening claim text (preview).

What is claimed is: 1. A metal particle-containing composition comprising: at least one thermosetting resin (R); a hardening agent (H); and at least three types of metal particles (P) different from one another, wherein the metal particles (P) contain: a solder alloy particle (P1) containing a tin alloy containing at least one metal (A), wherein the metal (A) is a metal that forms a eutectic crystal with tin at a eutectic temperature of 200° C. or lower; at least one metal particle (P2) containing a metal (B) having a melting point exceeding 420° C. in a bulk, the metal particle (P2) having a melting point higher than a solidus temperature of the solder alloy particle (P1); at least one metal particle (P3) containing a metal (C) that forms an intermetallic compound with the metal (A) contained in the solder alloy particle (P1); the thermosetting resin (R) is a maleic acid imide resin; the hardening agent (H) is a radical generating agent; the metal (C) is nickel; and a particle diameter (d50) of primary particles of the metal particle (P3) is 1 μm or less. 2. The metal particle-containing composition according to claim 1 , wherein the metal (A) is at least any one of bismuth, silver, zinc, and indium. 3. The metal particle-containing composition according to claim 1 , wherein the metal (B) is at least any one of copper, silver, and gold. 4. The metal particle-containing composition according to claim 1 wherein a particle diameter (d50) of primary particles of the solder alloy particle (P1) is more than 500 nm and 50 μm or less. 5. The metal particle-containing composition according to claim 1 , wherein a particle diameter (d50) of primary particles of the metal particle (P2) is more than 1 nm and 50 μm or less. 6. The metal particle-containing composition according to claim 1 , wherein a particle diameter (d50) of primary particles of the metal particle (P3) is more than 10 nm. 7. The metal particle-containing composition according to claim 1 , wherein a content of the solder alloy particle (P1) contained in the metal particle-containing composition is 50 to 95% by mass based on a total content of the metal particles (P). 8. The metal particle-containing composition according to claim 1 , wherein a content of the metal particle (P2) contained in the metal particle-containing composition is 2.5 to 30% by mass based on a total content of the metal particles (P). 9. The metal particle-containing composition according to claim 1 , wherein a content of the metal particle (P3) contained in the metal particle-containing composition is 2.5 to 20% by mass based on a total content of the metal particles (P). 10. The metal particle-containing composition according to claim 1 , further comprising a flux having one or more phosphor or sulfur atoms in a molecular structure, the phosphor or sulfur atoms being capable of bonding to an oxygen atom without generation of water. 11. The metal particle-containing composition according to claim 10 , wherein the flux contains at least one of an organic phosphine represented by the following formula (6), a sulfide-based compound represented by the following formula (7), and a thiol-based compound represented by the following (8); provided that R in the following formulas (6), (7), and (8) each independently represent an organic group and are optionally the same with or different from one another, 12. The metal particle-containing composition according to claim 11 , wherein the organic phosphine contains 4-(diphenylphosphino)styrene. 13. The metal particle-containing composition according to claim 11 , wherein the sulfide-based compound contains at least one of bis(hydroxyphenyl)sulfide, bis(4-acryloylthiophenyl)sulfide, 2-methylthiophenothiazine, bis(2-methacry oylthioethyl)sulfide, and bis(4-methacloylthiopheny 1)sulfide. 14. The metal particle-containing composition according to claim 11 , wherein the thiol-based compound contains at least one of 2-dibutylamino-4,6-dimercapto-s-triazine, 2,4,6-trimercapto-s-triazine, 2-pyridinethiol, 2-pyridinemethanethiol, and 3-pyridinemethanethiol. 15. An electrically conductive adhesive film formed by the metal particle-containing composition according to claim 1 .

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What does patent US11466181B2 cover?
The present disclosure relates to a metal particle-containing composition contains at least one thermosetting resin (R), a hardening agent (H), and at least three types of metal particles (P) different from one another. The metal particles (P) contain a solder alloy particle (P1) containing a tin alloy containing at least one metal (A), wherein the metal (A) is a metal that forms a eutectic cry…
Who is the assignee on this patent?
Furukawa Electric Co Ltd
What technology area does this patent fall under?
Primary CPC classification C22C13/02. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 11 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).