Highly homogeneous glass-ceramic component

US11465933B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11465933-B2
Application numberUS-201615243078-A
CountryUS
Kind codeB2
Filing dateAug 22, 2016
Priority dateFeb 21, 2014
Publication dateOct 11, 2022
Grant dateOct 11, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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A glass-ceramic component is provided that has a low average coefficient of thermal expansion (CTE) and a high CTE homogeneity. The use of such a component and a process for producing such a component are also provided.

First claim

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What is claimed is: 1. A low thermal expansion glass-ceramic component that has an application temperature that lies within a range of −60° to 100° C., and comprises at the application temperature, a coefficient of thermal expansion (CTE) in an interval of 0±15 ppb/° K, and a total spatial variation of CTE over the entire glass-ceramic component of at most 3 ppb/K, wherein the component has a mass of at least 500 kg. 2. The glass-ceramic component according to claim 1 , wherein the interval is 0±10 ppb/K. 3. The glass-ceramic component according to claim 1 , wherein the application temperature is selected from the group consisting of 22° C., 30° C., 40° C., 60° C., 80° C., and 100° C. 4. The glass-ceramic component according to claim 1 , further comprising a temperature interval that satisfies a CTE tolerance of 0±10 ppb/K and has at least an extent of 10 K. 5. The glass-ceramic component according to claim 1 , wherein the component has a rectangular shape with at least one surface having a surface area of at least 1 m 2 . 6. The glass-ceramic component according to claim 1 , wherein the component comprises an LAS glass-ceramic with the following composition (in % by weight based on oxide): SiO 2 50-70, Al 2 O 3 17-32, P 2 O 5  3-12, Li 2 O 2-5, Na 2 O 0-2, K 2 O 0-2, MgO 0-2, CaO 0-4, BaO 0-5, SrO 0-2, ZnO 0-4, TiO 2 1-5, and ZrO 2 0-5. 7. The glass-ceramic component according to claim 1 , wherein the component comprises a glass-ceramic with an OH content of at least 0.06 mol/l. 8. The glass-ceramic component according to claim 1 , wherein the component is a component for use in a field selected from the group consisting of astronomy, metrology, LCD lithography, microlithography, and precision measurement technology. 9. The glass-ceramic component according to claim 1 , wherein the total spatial variation of CTE over the entire glass-ceramic component is at most 5 ppb/K in a temperature range from 0° C. to less than 15° C. 10. The glass-ceramic component according to claim 9 , wherein the temperature range further comprises from greater than 30° C. to 50° C. 11. The glass-ceramic component according to claim 10 , wherein the temperature range further comprises from 15° C. to 30° C. 12. The glass-ceramic component according to claim 1 , wherein the total spatial variation of CTE over the entire glass-ceramic component is at most 5 ppb/K in a temperature range from 0° C. to 50° C. 13. The glass-ceramic component according to claim 1 , wherein the low thermal expansion glass-ceramic component is produced in a batch and at least 1% by weight to at most 10% by weight water is added to the batch. 14. An astronomical mirror comprising a low thermal expansion glass-ceramic component, that has an application temperature that lies within a range of −60° to 100° C., and comprises, at the application temperature, a coefficient of thermal expansion (CTE) in an interval of 0±15 ppb/K, and a total spatial variation of CTE over the entire glass-ceramic component of at most 3 ppb/K, wherein the glass-ceramic component has a diameter of at least 3 m. 15. An extreme ultraviolet lithography device comprising a low thermal expansion glass-ceramic component, that has an application temperature that lies within a range of −60° to 100° C., and, at the application temperature has a coefficient of thermal expansion (CTE) in an interval of 0±15 ppb/K, and a total spatial variation of CTE over the entire glass-ceramic component of at most 3 ppb/K, wherein the component has an edge length, in the case of a rectangular shape, or a diameter, in the case of a round shape, of at least 0.5 m. 16. The device according to claim 15 , wherein the extreme ultraviolet lithography device is a mask or a mirror. 17. A low thermal expansion glass-ceramic component that has an application temperature that lies within a range of −60° to 100° C., and comprises, at the application temperature, a coefficient of thermal expansion (CTE) in an interval of 0±15 ppb/K, and a total spatial variation of CTE over the entire glass-ceramic component of at most 3 ppb/K, wherein the glass-ceramic component has an edge length, in the case of a rectangular shape, or a diameter, in the case of a round shape, of at least 0.5 m. 18. The glass-ceramic component according to claim 17 , wherein the component comprises an LAS glass-ceramic with the following composition (in % by weight based on oxide): SiO 2 50-70, Al 2 O 3 17-32, P 2 O 5  3-12, Li 2 O 2-5, Na 2 O 0-2, K 2 O 0-2, MgO 0-2, CaO 0-4, BaO 0-5, SrO 0-2, ZnO 0-4, TiO 2 1-5, and ZrO 2 0-5.

Assignees

Inventors

Classifications

  • Glasses, glazes or enamels with special properties · CPC title

  • Thermal crystallisation, e.g. for crystallising glass bodies into glass-ceramic articles {(C03B27/012 takes precedence)} · CPC title

  • with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation · CPC title

  • Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof · CPC title

  • containing SiO2, Al2O3, Li2O as main constituents · CPC title

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What does patent US11465933B2 cover?
A glass-ceramic component is provided that has a low average coefficient of thermal expansion (CTE) and a high CTE homogeneity. The use of such a component and a process for producing such a component are also provided.
Who is the assignee on this patent?
Schott Ag
What technology area does this patent fall under?
Primary CPC classification C03C10/0027. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 11 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).