Made-to-stock patterned transparent conductive layer

Patent metadata

Field	Value
Publication number	US-11460748-B2
Application number	US-201916715873-A
Country	US
Kind code	B2
Filing date	Dec 16, 2019
Priority date	Dec 28, 2018
Publication date	Oct 4, 2022
Grant date	Oct 4, 2022

Abstract

An electrochemical device and method of forming said device is disclosed. The method can include providing a substrate and stack overlying the substrate. The stack can include a first transparent conductive layer over the substrate, a cathodic electrochemical layer over the first transparent conductive layer, an anodic electrochemical layer over the electrochromic layer, and a second transparent conductive layer overlying the anodic electrochemical layer. The method can include depositing an insulating layer over the stack and determining a first pattern for the second transparent conductive layer. The first pattern can include a first region and a second region. The first region and the second region can be the same material. The method can include patterning the first region of the second transparent conductive layer without removing the material from the first region. The first region can have a first resistivity and the second region can have a second resistivity.

First claim

What is claimed is:

1. A method of forming an electrochemical device, the method comprising:
providing a substrate and a stack overlying the substrate, the stack comprising:
a first transparent conductive layer over the substrate;
a second transparent conductive layer over the substrate;
a cathodic electrochemical layer between the first transparent conductive layer and the second transparent conductive layer; and
an anodic electrochemical layer between the first transparent conductive layer and the second transparent conductive layer;

determining a first pattern for the second transparent conductive layer, wherein the first pattern comprises a first region and a second region, wherein the first region and the second region comprise the same material; and
patterning the first region of the second transparent conductive layer without removing the material from the first region, wherein after patterning the first region, the first region comprises a first resistivity and the second region comprises a second resistivity, and wherein patterning the second transparent conductive layer to form the first resistivity and the second resistivity is patterned through the insulating layer.

2. The method of claim 1 , wherein patterning the second transparent conductive layer to form the first resistivity and the second resistivity is patterned through the substrate, the first transparent conductive layer, the cathodic electrochemical layer, and the anodic electrochemical layer.

3. The method of claim 1 , wherein patterning the second transparent conductive layer comprises using a short pulse laser having a wavelength between 400 nm and 700 nm.

4. The method of claim 3 , wherein the short pulse laser has a wavelength between 500 nm and 550 nm.

5. The method of claim 3 , wherein the short pulse laser fires for a duration of between 50 femtoseconds and 1 second.

6. The method of claim 1 , wherein the first resistivity is greater than the second resistivity.

7. The method of claim 1 , wherein the first resistivity is between 15 Ω/sq to 100 Ω/sq.

8. The method of claim 1 , wherein the substrate comprises a material selected from the group consisting of glass, sapphire, aluminum oxynitride, spinel, polyacrylic compound, polyalkene, polycarbonate, polyester, polyether, polyethylene, polyimide, polysulfone, polysulfide, polyurethane, polyvinylacetate, another suitable transparent polymer, co-polymer of the foregoing, float glass, borosilicate glass, and any combination thereof.

9. The method of claim 1 , wherein the stack further comprises an ion conducting layer between the cathodic electrochemical layer and the anodic electrochemical layer.

10. The method of claim 9 , wherein the ion-conducting layer comprises a material selected from the group consisting of lithium, sodium, hydrogen, deuterium, potassium, calcium, barium, strontium, magnesium, oxidized lithium, Li 2 WO 4 , tungsten, nickel, lithium carbonate, lithium hydroxide, lithium peroxide, and any combination thereof.

11. The method of claim 1 , wherein the cathodic electrochemical layer comprises an electrochromic material.

12. The method of claim 11 , wherein the electrochromic material comprises a material selected from the group consisting of WO 3 , V 2 O 5 , MoO 3 , Nb 2 O 5 , TiO 2 , CuO, Ni 2 O 3 , NiO, Ir 2 O 3 , Cr 2 O 3 , Co 2 O 3 , Mn 2 O 3 , mixed oxides (e.g., W—Mo oxide, W—V oxide), lithium, aluminum, zirconium, phosphorus, nitrogen, fluorine, chlorine, bromine, iodine, astatine, boron, a borate with or without lithium, a tantalum oxide with or without lithium, a lanthanide-based material with or without lithium, another lithium-based ceramic material, or any combination thereof.

13. The method of claim 1 , wherein the first transparent conductive layer comprises indium oxide, indium tin oxide, doped indium oxide, tin oxide, doped tin oxide, zinc oxide, doped zinc oxide, ruthenium oxide, doped ruthenium oxide, silver, gold, copper, aluminum, and any combination thereof.

14. The method of claim 1 , wherein the second transparent conductive layer comprises a material selected from the group consisting of indium oxide, indium tin oxide, doped indium oxide, tin oxide, doped tin oxide, zinc oxide, doped zinc oxide, ruthenium oxide, doped ruthenium oxide and any combination thereof.

15. The method of claim 1 , wherein the anodic electrochemical layer comprises a material selected from the group consisting of an inorganic metal oxide electrochemically active material, such as WO 3 , V 2 O 5 , MoO 3 , Nb 2 O 5 , TiO 2 , CuO, Ir 2 O 3 , Cr 2 O 3 , Co 2 O 3 , Mn 2 O 3 , Ta 2 O 5 , ZrO 2 , HfO 2 , Sb 2 O 3 , a lanthanide-based material with or without lithium, another lithium-based ceramic material, a nickel oxide (NiO, Ni 2 O 3 , or combination of the two), and Li, nitrogen, Na, H, or another ion, any halogen, and any combination thereof.

16. A method of forming an electrochemical device, the method comprising:
providing a substrate and a stack overlying the substrate, the stack comprising:
a first transparent conductive layer over the substrate;
a second transparent conductive layer over the substrate;
a cathodic electrochemical layer between the first transparent conductive layer and the second transparent conductive layer; and
an anodic electrochemical layer between the first transparent conductive layer and the second transparent conductive layer;

determining a first pattern for the second transparent conductive layer, wherein the first pattern comprises a first region and a second region, wherein the first region and the second region comprise the same material; and
patterning the first region of the second transparent conductive layer without removing the material from the first region, wherein after patterning the first region, the first region comprises a first resistivity and the second region comprises a second resistivity, wherein patterning the second transparent conductive layer to form the first resistivity and the second resistivity is patterned after forming the stack.

Assignees

• Sage Electrochromics Inc

Inventors

• Wang Yigang
• Giron Jean-Christophe
• Greer Bryan D
• Sarrach Sebastian Marius
• Doublein Thomas

Classifications

• G02F2001/1552

  Inner electrode, e.g. the electrochromic layer being sandwiched between the inner electrode and the support substrate · CPC title

• G02F1/163 Primary

  Operation of electrochromic cells, e.g. electrodeposition cells; Circuit arrangements therefor · CPC title

• G02F2201/122

  having a particular pattern · CPC title

• G02F1/155 Primary

  Electrodes · CPC title

• G02F1/157

  Structural association of cells with optical devices, e.g. reflectors or illuminating devices · CPC title