Electron beam column for three-dimensional printing device, three-dimensional printing device, and three-dimensional printing method

Patent metadata

Field	Value
Publication number	US-11458561-B2
Application number	US-201716344359-A
Country	US
Kind code	B2
Filing date	Jan 12, 2017
Priority date	Jan 12, 2017
Publication date	Oct 4, 2022
Grant date	Oct 4, 2022

Abstract

To provide a three-dimensional printing device that irradiates approximately the same ranges on the surface of a powder layer simultaneously with a plurality of electron beams having different beam shapes. An electron beam column 200 of the three-dimensional printing device 100 includes a plurality of electron sources 20 including electron sources having anisotropically-shaped beam generating units, and beam shape deforming elements 30 that deform the beam shapes of electron beams output from the electron sources 20 on a surface 63 of a powder layer 62 . A deflector 50 included in the electron beam column 200 deflects an electron beam output from each of the plurality of electron sources 20 by a distance larger than the beam space between electron beams before passing through the deflector 50.

First claim

What is claimed is:

1. An electron beam column for a three-dimensional layering device comprising:
a first electron source that has an anisotropically-shaped first electron emitting surface, and outputs a first electron beam accelerated to a first predetermined acceleration voltage;
a second electron source that has an anisotropically-shaped second electron emitting surface, and outputs a second electron beam accelerated to a second predetermined acceleration voltage;
a first beam shape deforming element that deforms a cross-sectional shape of the first electron beam;
a second beam shape deforming element that deforms a cross-sectional shape of the second electron beam;
an electromagnetic lens that converges the first electron beam and the second electron beam; and
a deflector that adjusts irradiation positions of the first electron beam and the second electron beam, wherein
the first electron source and the second electron source are oriented such that a longitudinal direction of the first electron emitting surface of the first electron source is orthogonal to a longitudinal direction of the second electron emitting surface of the second electron source, and
a powder layer is irradiated with the first electron beam and the second electron beam simultaneously.

2. The electron beam column for the three-dimensional layering device according to claim 1 , wherein
at least one of the first beam deforming element and the second beam deforming element:
diverges an opening angle of a corresponding one of the first electron beam and the second electron beam in the lateral direction of a corresponding one of the first electron emitting surface and the second electron emitting surface, and converges the opening angle in the longitudinal direction of the corresponding one of the first electron emitting surface and the second electron emitting surface; or
converges the opening angle in the lateral direction of the corresponding one of the first electron emitting surface and the second electron emitting surface, and diverges the opening angle in the longitudinal direction of the corresponding one of the first electron emitting surface and the second electron emitting surface.

3. The electron beam column for the three-dimensional layering device according to claim 1 , wherein the first electron beam and the second electron beam are deflected by a common deflector.

4. The electron beam column for the three-dimensional layering device according to claim 1 , wherein the first electron beam and the second electron beam are deflected by different deflectors.

5. The electron beam column for the three-dimensional layering device according to claim 1 , wherein
a deflectable range of the deflector is set such that the upper limit of the deflection distance of each of the first electron beam and the second electron beam relative to its position when it is not being deflected, measured at the powder layer being irradiated, is larger than the space between the first electron beam and the second electron beam when the first electron beam and the second electron beam are not deflected.

6. The electron beam column for the three-dimensional layering device according to claim 1 , wherein
the first beam deforming element and the second beam deforming element each have multipole elements arranged at multiple stages along an advancing direction of a corresponding one of the first electron beam and the second electron beam, and
each of the multipole elements of each of the first beam deforming element and the second beam deforming element is formed of an electrostatic quadrupole element, a direction along which a pair of pole elements of the electrostatic quadrupole element is arranged coincides with a longitudinal direction of a corresponding one of the first electron emitting surface and the second electron emitting surface, and a direction along which the other pair of pole elements of the electrostatic quadrupole element is arranged coincides with a lateral direction of the corresponding one of the first electron emitting surface and the second electron emitting surface.

Assignees

• Advantest Corp

Inventors

• Hamaguchi Shinichi
• Sugatani Shinji
• Takahashi Masayuki
• Takizawa Masahiro

Classifications

• B22F12/49

  Scanners · CPC title

• B22F12/45

  Two or more · CPC title

• B22F12/44

  characterised by the configuration of the radiation means · CPC title

• B22F10/36

  of energy beam parameters · CPC title

• B22F10/20

  Direct sintering or melting · CPC title