Sample support body, production method for sample support body, and sample ionization method

Patent metadata

Field	Value
Publication number	US-11442039-B2
Application number	US-201916967266-A
Country	US
Kind code	B2
Filing date	Jan 8, 2019
Priority date	Feb 9, 2018
Publication date	Sep 13, 2022
Grant date	Sep 13, 2022

Abstract

Provided is a sample support body that includes: a substrate having a first surface and a second surface opposite to each other; and a conductive layer provided on at least the first surface. A plurality of through-holes, which open to the second surface and a third surface of the conductive layer which is located on a side opposite to the substrate, are formed in the substrate and the conductive layer. At least one of the second surface and the third surface is subjected to surface treatment for providing a difference in an affinity with water between a surface close to the second surface and a surface close to the third surface.

First claim

The invention claimed is:

1. A sample support body for ionization of a sample comprising:
a substrate having a first surface and a second surface opposite to each other; and
a conductive layer provided on at least the first surface,
wherein a plurality of through-holes, which open to the second surface and a third surface of the conductive layer which is located on a side opposite to the substrate, are formed in the substrate and the conductive layer, and
at least one of the second surface and the third surface is subjected to surface treatment for providing a difference in an affinity with water between a surface close to the second surface and a surface close to the third surface.

2. The sample support body according to claim 1 , wherein a hydrophobic coating layer is provided on the second surface such that the surface close to the third surface has a higher affinity with water than the surface close to the second surface.

3. The sample support body according to claim 1 , wherein:
surface treatment for improving the affinity with water is performed on the third surface and an inner surface of a portion including an edge of each through-hole which is close to the third surface such that the surface close to the third surface has a higher affinity with water than the surface close to the second surface; and
the surface treatment for improving the affinity with water includes at least one of, providing a hydrophilic coating layer on the third surface and the inner surface of the portion, and performing excimer application or plasma application on the third surface and the inner surface of the portion.

4. The sample support body according to claim 1 , wherein:
surface treatment for improving the affinity with water is performed on the second surface and an inner surface of a portion including an edge of each through-hole which is close to the second surface such that the surface close to the second surface has a higher affinity with water than the surface close to the third surface; and
the surface treatment for improving the affinity with water includes at least one of, providing a hydrophilic coating layer on the second surface and the inner surface of the portion, and performing excimer application or plasma application on the second surface and the inner surface of the portion.

5. The sample support body according to claim 1 , wherein a hydrophobic coating layer is provided on the third surface such that the surface close to the second surface has a higher affinity with water than the surface close to the third surface.

6. The sample support body according to claim 1 , wherein the substrate is formed by anodizing a valve metal or silicon.

7. The sample support body according to claim 1 , wherein widths of the through-holes are 1 nm to 700 nm.

8. The sample support body according to claim 1 , wherein a material of the conductive layer is platinum or gold.

9. A sample support body for ionization of a sample comprising
a substrate which has conductivity and is formed with a plurality of through-holes which open to a first surface and a second surface opposite to each other,
wherein at least one of the first surface and the second surface is subjected to surface treatment for providing a difference in an affinity with water between a surface close to the first surface and a surface close to the second surface,
the surface treatment is
treatment that includes at least one of, providing a hydrophilic coating layer on the first surface and an inner surface of a portion including an edge of each through-hole which is close to the first surface such that a surface close to the first surface has a higher affinity with water than a surface close to the second surface, and performing excimer application or plasma application on the first surface and the inner surface of the portion including the edge of each through-hole which is close to the first surface, or
treatment that includes at least one of, providing a hydrophilic coating layer on the second surface and an inner surface of a portion including an edge of each through-hole which is close to the second surface such that the surface close to the second surface has a higher affinity with water than the surface close to the first surface, and performing excimer application or plasma application on the second surface and the inner surface of the portion including the edge of each through-hole which is close to the second surface.

10. The sample support body according to claim 3 , wherein the hydrophilic coating layer is a layer formed by forming a film of titanium oxide or zinc oxide.

11. The sample support body according to claim 2 , wherein the hydrophobic coating layer is a layer formed by vapor deposition of a metal, or a layer formed of a self-assembled monolayer.

12. A production method for a sample support body for ionization of a sample comprising:
a first process of preparing a substrate having a first surface and a second surface opposite to each other and a conductive layer provided on at least the first surface, wherein a plurality of through-holes, which open to the second surface and a third surface of the conductive layer which is located on a side opposite to the substrate, are formed in the substrate and the conductive layer; and
a second process of performing surface treatment, for providing a difference in an affinity with water between a surface close to the second surface and a surface close to the third surface, on at least one of the second surface and the third surface.

13. The production method according to claim 12 , wherein the second process includes a process of providing a hydrophobic coating layer on the second surface such that the surface close to the third surface has a higher affinity with water than the surface close to the second surface.

14. The production method according to claim 12 , wherein:
the second process includes a process of performing surface treatment for improving the affinity with water on the third surface and an inner surface of a portion including an edge of each through-hole which is close to the third surface such that the surface close to the third surface has a higher affinity with water than the surface close to the second surface; and
the surface treatment for improving the affinity with water includes at least one of, providing a hydrophilic coating layer on the third surface and the inner surface of the portion, and performing excimer application or plasma application on the third surface and the inner surface of the portion.

15. The production method according to claim 12 , wherein:
the second process includes a process of performing surface treatment for improving the affinity with water on the second surface and an inner surface of a portion including an edge of each through-hole which is close to the second surface such that the surface close to the second surface has a higher affinity with water than the surface close to the third surface; and
the surface treatment for improving the affinity with water includes at least one of, providing a hydrophilic coating layer on the second surface and the inner surface of the portion, and performing excimer application or plasma application on the second surface and the inner surface of the portion.

16. The production method according to claim 12 , wherein the second process includes a process of providing a hydrophobic coating layer on the third surface such that the surface close to the second surface has a higher affinity with water than the surface close to the third surface.

17. A production method for a sam

Assignees

• Hamamatsu Photonics Kk

Inventors

• Naito Yasuhide
• Ohmura Takayuki
• Kotani Masahiro

Classifications

• G01N27/62 Primary

  by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode · CPC title

• G01N27/623 Primary

  combined with mass spectrometry · CPC title

• G01N27/628

  and a beam of energy, e.g. laser enhanced ionisation · CPC title

• H01J49/0409 Primary

  Sample holders or containers (containers for retaining a material to be analyzed, B01L3/50, for DNA, C12Q1/6834, for biological materials, G01N33/543) · CPC title