Coated cutting tool and method

Patent metadata

Field	Value
Publication number	US-11440102-B2
Application number	US-201616063825-A
Country	US
Kind code	B2
Filing date	Dec 20, 2016
Priority date	Dec 22, 2015
Publication date	Sep 13, 2022
Grant date	Sep 13, 2022

Abstract

A coated cutting tool includes a substrate and a coating, wherein the coating has a PVD layer being a compound of the formula Ti1-xSixCaNbOc, wherein 0.10<x≤0.30, 0≤a≤0.75, 0.25≤b≤1, 0≤c≤0.2, and a+b+c=1. The PVD layer is a NaCl structure solid solution. The disclosure further relates to a method for producing the PVD layer by cathodic arc evaporation using a pulsed bias voltage of from about −40 to about −450 V to the substrate and using a duty cycle of less than about 12% and a pulsed bias frequency of less than about 10 kHz.

First claim

The invention claimed is:

1. A coated cutting tool comprising a substrate and a coating, wherein the coating includes a PVD layer being a compound of the formula Ti 1-x Si x C a N b O c , wherein 0.10<x≤0.30, 0≤a≤0.75, 0.25≤b≤1, 0≤c≤0.2, and a+b+c=1, wherein the PVD layer is a NaCl structure solid solution and wherein the PVD layer has a FWHM (Full Width at Half Maximum) value for the cubic ( 111 ) peak in X-ray diffraction being ≤0.35 degrees (2theta).

2. The coated cutting tool according to claim 1 , wherein in the formula Ti 1-x Si x C a N b O c , 0.12≤x≤0.25.

3. The coated cutting tool according to claim 1 , wherein the FWHM value for the cubic ( 111 ) peak in X-ray diffraction is ≤0.25 degrees (2theta).

4. The coated cutting tool according to claim 1 , wherein the PVD layer has a residual stress being >−3 GPa.

5. The coated cutting tool according to claim 1 , wherein the PVD layer includes faceted crystal grains on its surface.

6. The coated cutting tool according to claim 1 , wherein a thickness of the PVD layer is from about 0.5 to about 20 μm.

7. The coated cutting tool according to claim 1 , wherein the PVD layer is an arc evaporation deposited layer.

8. A method for producing a coating on a substrate, the coating including a PVD layer deposited by cathodic arc evaporation, the PVD layer being a compound of the formula Ti 1-x Si x C a N b O c , wherein 0.10<x≤0.30, 0≤a≤0.75, 0.25≤b≤1, 0≤c≤0.2, and a+b+c=1, and wherein the PVD layer is a NaCl structure solid solution and wherein the PVD layer has a FWHM (Full Width at Half Maximum) value for the cubic ( 111 ) peak in X-ray diffraction being ≤0.35 degrees (2theta), the PVD layer being deposited by applying a pulsed bias voltage of from about −40 to about −450 V to the substrate and using a duty cycle of less than about 12% and a pulsed bias frequency of less than about 10 kHz.

9. The method according to claim 8 , wherein the duty cycle is from about 2 to about 10%.

10. The method according to claim 8 , wherein the pulsed bias frequency is from about 0.1 to about 8 kHz.

11. The method according to claim 8 , wherein the pulsed bias voltage is from about −50 to about −350 V.

Assignees

• Sandvik Intellectual Property

Inventors

• Johnson Lars

Classifications

• C23C14/08

  Oxides (C23C14/10 takes precedence) · CPC title

• C23C14/0664

  Carbonitrides · CPC title

• C23C30/00

  Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process (C23C26/00, C23C28/00 take precedence) · CPC title

• C23C30/005 Primary

  on hard metal substrates · CPC title

• B23B27/14 Primary

  Cutting tools of which the bits or tips {or cutting inserts} are of special material · CPC title